公开(公告)号：US4480010A

公开(公告)日：1984-10-30

申请号：US497881

申请日：1983-05-25

申请人： Yasutomo Sasanuma ,  Masao Koshi ,  Teruaki Takahashi ,  Shotaro Shimizu ,  Mitsugu Enomoto ,  Youji Yoshikawa

发明人： Yasutomo Sasanuma ,  Masao Koshi ,  Teruaki Takahashi ,  Shotaro Shimizu ,  Mitsugu Enomoto ,  Youji Yoshikawa

IPC分类号： C23C14/32 ,  H01J37/32 ,  B32B15/04

CPC分类号： H01J37/32422 ,  C23C14/32 ,  Y10T428/31678

摘要： By use of an ion plating apparatus having an ionizing means which can be operated independently of the electric potential of a substrate, at the initial and final stages of the process of ion plating, a negative potential relative to that of a vapor source is applied to the substrate in order to facilitate the bombardment effect and at the intermediate stage of the process, the potential of the substrate is left floating while the ionization means is being driven in order to control the bombardment effect. In a preferred example, the apparatus has thermoelectron emitting filaments located near the substrate and a pair of anodes located on the side of the vapor source with respect to the substrate and on the opposite side of the substrate. This process permits producing relatively thick and adherent coatings.

摘要翻译： 通过使用具有电离装置的离子镀装置，其能够独立于衬底的电位而工作，在离子镀处理的初始和最后阶段，将相对于蒸气源的负电位施加到 该衬底以便于轰击效果，并且在该过程的中间阶段，为了控制轰击效应，在驱动电离装置的同时使衬底的电位保持悬空。 在优选实施例中，该装置具有位于基板附近的热电子发射丝线和位于蒸气源侧的一对阳极相对于基底并位于基底的相对侧上。 该方法允许产生相对较厚和粘附的涂层。

公开(公告)号：US5511587A

公开(公告)日：1996-04-30

申请号：US426462

申请日：1995-04-19

申请人： Yukio Miya ,  Shigeru Kizaki ,  Osamu Sugiyama ,  Akiteru Hatayama ,  Yoshitsugu Shibuya ,  Mitsugu Enomoto ,  Koichi Naoi ,  Yuji Fukazawa ,  Takanori Nanya ,  Shotaro Shimizu ,  Hiroshi Tagawa

发明人： Yukio Miya ,  Shigeru Kizaki ,  Osamu Sugiyama ,  Akiteru Hatayama ,  Yoshitsugu Shibuya ,  Mitsugu Enomoto ,  Koichi Naoi ,  Yuji Fukazawa ,  Takanori Nanya ,  Shotaro Shimizu ,  Hiroshi Tagawa

IPC分类号： D03D49/62

CPC分类号： D03D49/62 ,  D03D47/278 ,  Y10T428/24975

摘要： A diamond-like carbon (DLC) film is formed on a portion of a reed blade in a high-speed loom which requires the highest wear resistance. When a stainless steel is used as the base material of the reed blade, the DLC film is formed through an intermediate layer comprising, e.g., a titanium carbide layer. Reed blades coated with a DLC film are arranged at the side portions of the reed where wear progresses quickly, while reed blades coated with hard films requiring a relatively low cost, or non-coated reed blades, are arranged in the central portion of the reed, thereby uniforming the blade wear throughout the entire reed. The reed is suitable to many types of fibers, ranging from natural to synthetic and new material fibers.

摘要翻译： 在需要最高耐磨性的高速织机中的筘片的一部分上形成类金刚石碳（DLC）膜。 当使用不锈钢作为筘片的基材时，DLC膜通过包括例如碳化钛层的中间层形成。 涂有DLC膜的筘片布置在筘的侧面部分，其中磨损进行得很快，而涂覆有需要相对低成本的硬膜的筘片或未涂覆的筘片布置在筘的中心部分 从而使整个芦苇中的刀片磨损均匀化。 芦苇适用于许多类型的纤维，从天然纤维到合成纤维和新材料纤维。

公开(公告)号：US4579639A

公开(公告)日：1986-04-01

申请号：US512499

申请日：1983-07-11

申请人： Mitsugu Enomoto ,  Yoji Yoshikawa ,  Masao Koshi

发明人： Mitsugu Enomoto ,  Yoji Yoshikawa ,  Masao Koshi

IPC分类号： C23C14/32 ,  C23C14/54 ,  H01J37/32

CPC分类号： H01J37/32935 ,  C23C14/544

摘要： A method of sensing the amount of a thin film deposited during an ion plating process, based upon either fixing the value of voltage applied to a plasma-generating probe and measuring the current which flows through the probe into the plasma, this current varying in proportion to the rate of formation of the thin film, or fixing the level of current which flows through the probe into the plasma at a fixed value and measuring the voltage which develops at the probe, this voltage varying in proportion to the rate of formation of the thin film. The results of such measurement can be used to control the thickness of a deposited thin film to a desired value.

摘要翻译： 基于固定施加到等离子体产生探针上的电压的值并测量流过探针的电流进入等离子体的方式，感测在离子镀处理期间沉积的薄膜的量的方法，该电流按比例变化 到薄膜的形成速率，或将流过探针的电流水平固定在等离子体中的固定值，并测量探针产生的电压，该电压与形成的速率成比例地变化 薄膜。 这种测量的结果可用于将沉积的薄膜的厚度控制到期望的值。