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公开(公告)号:US3931789A
公开(公告)日:1976-01-13
申请号:US462504
申请日:1974-04-19
申请人: Mitsuo Kakei , Keijiro Nishida , Tadayoshi Kasahara , Masao Shimabayashi , Ryozo Hiraga , Tomomasa Nakano , Ichiro Komatsubara
发明人: Mitsuo Kakei , Keijiro Nishida , Tadayoshi Kasahara , Masao Shimabayashi , Ryozo Hiraga , Tomomasa Nakano , Ichiro Komatsubara
CPC分类号: C23C14/568 , C23C14/566
摘要: An apparatus for continuously processing articles includes a pre-heating chamber for confining a vacuum therein provided with four openings by which an entrance chamber, two depositing chamber and an exit chamber communicate therewith individually. Each of the openings is provided with a gate valve mounted therein for covering the openings, and particularly the entrance and exit chambers serving to maintain the vacuum in the pre-heating chamber at a predetermined level while feeding unprocessed articles to and removing the processed articles from the pre-heating chamber in such a manner that the vacuum is not affected by the ambient atmosphere. The pre-heating chamber comprises a cylindrical housing in which a water-wheel-like conveyor having means for receiving and holding vacuum deposition jigs carrying articles such as optical elements is intermittently rotated to advance the vacuum deposition jigs through the pre-heating chamber. This feature of the invention facilitates reduction in the heating time per jig. In addition, the automatic inversion of the jig in half revolution of the conveyor serves to facilitate successive applications of a thin film coating on the opposite surfaces of the articles without breaking the vacuum in the processing chambers while insuring that each of the articles is treated identically to produce uniform properties of the thin film coating.
摘要翻译: 用于连续处理制品的装置包括用于限制其中设置有四个开口的真空的预热室,入口室,两个沉积室和出口室通过该开口单独地连通。 每个开口设置有安装在其中的闸阀,用于覆盖开口,特别是用于将预热室中的真空保持在预定水平的入口和出口室,同时将未处理的物品送入并从中除去加工的物品 预热室以这样的方式使得真空不受环境大气的影响。 预热室包括圆筒形壳体,其中具有用于接收和保持携带诸如光学元件的物品的真空沉积夹具的装置的水轮状输送器间歇地旋转以使真空沉积夹具通过预热室。 本发明的该特征有助于减少每个夹具的加热时间。 此外,传送带半圈自动翻转夹具用于有助于在制品的相对表面上连续施加薄膜涂层,而不破坏处理室中的真空,同时确保每个制品被相同地处理 以产生薄膜涂层的均匀性质。