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    Three layer anti-reflection film
    3.
    发明授权
    Three layer anti-reflection film 失效
    三层防反射膜

    公开(公告)号：US3934961A

    公开(公告)日：1976-01-27

    申请号：US399612

    申请日：1973-09-21

    申请人： Susumu Itoh ,  Keijiro Nishida ,  Osamu Kamiya ,  Nobuyuki Sekimura

    发明人： Susumu Itoh ,  Keijiro Nishida ,  Osamu Kamiya ,  Nobuyuki Sekimura

    IPC分类号： G02B1/11 ,  G02B5/28

    CPC分类号： G02B1/115 ,  Y10T428/2495

    摘要： Three-layer anti-reflection coatings consisting of first, second and third layers, respectively positioned from a glass base plate. The optical film thickness of the first layer and the second layer is one-half of a designed wavelength while that of the third layer is one-fourth of the same. And the relationship among the refractive index of each layer is second layer (n.sub.2) glass (n.sub.g) first layer (n.sub.1) third layer (n.sub.3). The first layer is made of a mixture of Al.sub.2 O.sub.3 and ZrO.sub.2.

    摘要翻译： 由第一层，第二层和第三层组成的三层防反射涂层分别从玻璃基板定位。 第一层和第二层的光学膜厚度是设计波长的一半，而第三层的光学膜厚度是其四分之一。 并且各层的折射率之间的关系是第二层（n2）玻璃（ng）第一层（n1）第三层（n3）。 第一层由Al2O3和ZrO2的混合物制成。

    Vapor deposition apparatus
    4.
    发明授权
    Vapor deposition apparatus 失效
    蒸镀装置

    公开(公告)号：US3931789A

    公开(公告)日：1976-01-13

    申请号：US462504

    申请日：1974-04-19

    申请人： Mitsuo Kakei ,  Keijiro Nishida ,  Tadayoshi Kasahara ,  Masao Shimabayashi ,  Ryozo Hiraga ,  Tomomasa Nakano ,  Ichiro Komatsubara

    发明人： Mitsuo Kakei ,  Keijiro Nishida ,  Tadayoshi Kasahara ,  Masao Shimabayashi ,  Ryozo Hiraga ,  Tomomasa Nakano ,  Ichiro Komatsubara

    IPC分类号： C23C14/24 ,  C23C14/56 ,  C23C13/08

    CPC分类号： C23C14/568 ,  C23C14/566

    摘要： An apparatus for continuously processing articles includes a pre-heating chamber for confining a vacuum therein provided with four openings by which an entrance chamber, two depositing chamber and an exit chamber communicate therewith individually. Each of the openings is provided with a gate valve mounted therein for covering the openings, and particularly the entrance and exit chambers serving to maintain the vacuum in the pre-heating chamber at a predetermined level while feeding unprocessed articles to and removing the processed articles from the pre-heating chamber in such a manner that the vacuum is not affected by the ambient atmosphere. The pre-heating chamber comprises a cylindrical housing in which a water-wheel-like conveyor having means for receiving and holding vacuum deposition jigs carrying articles such as optical elements is intermittently rotated to advance the vacuum deposition jigs through the pre-heating chamber. This feature of the invention facilitates reduction in the heating time per jig. In addition, the automatic inversion of the jig in half revolution of the conveyor serves to facilitate successive applications of a thin film coating on the opposite surfaces of the articles without breaking the vacuum in the processing chambers while insuring that each of the articles is treated identically to produce uniform properties of the thin film coating.

    摘要翻译： 用于连续处理制品的装置包括用于限制其中设置有四个开口的真空的预热室，入口室，两个沉积室和出口室通过该开口单独地连通。 每个开口设置有安装在其中的闸阀，用于覆盖开口，特别是用于将预热室中的真空保持在预定水平的入口和出口室，同时将未处理的物品送入并从中除去加工的物品 预热室以这样的方式使得真空不受环境大气的影响。 预热室包括圆筒形壳体，其中具有用于接收和保持携带诸如光学元件的物品的真空沉积夹具的装置的水轮状输送器间歇地旋转以使真空沉积夹具通过预热室。 本发明的该特征有助于减少每个夹具的加热时间。 此外，传送带半圈自动翻转夹具用于有助于在制品的相对表面上连续施加薄膜涂层，而不破坏处理室中的真空，同时确保每个制品被相同地处理 以产生薄膜涂层的均匀性质。

    Vapor deposition apparatus
    5.
    发明授权
    Vapor deposition apparatus 失效
    蒸镀装置

    公开(公告)号：US4226208A

    公开(公告)日：1980-10-07

    申请号：US928435

    申请日：1978-07-27

    申请人： Keijiro Nishida ,  Mitsuo Kakei ,  Osamu Kamiya ,  Nobuyuki Sekimura

    发明人： Keijiro Nishida ,  Mitsuo Kakei ,  Osamu Kamiya ,  Nobuyuki Sekimura

    IPC分类号： C23C14/56 ,  C23C13/08

    CPC分类号： C23C14/56 ,  Y10S414/139

    摘要： An apparatus for vacuum deposition of a thin film onto the surface of a substrate includes a vacuum container formed by a base plate, a cylindrical side wall and a top plate to accommodate at least four movable sealing caps each having a space adapted to confine a batch of substrates on a carrier of dome shape. The caps move around the center of the base plate. When the caps are stopped to cover respective openings provided through the base plate, there are established a pre-heating, a vapor depositing, a cooling and an air locking chamber, and the batch of processed substrates in the air locking chamber is moved to the outside of the apparatus without disturbing the vacuum in the container. Next, the air locking chamber, after having received a new batch of unprocessed substrates at the space of the cap thereof, is sealed from the ambient atmosphere, and all the caps are advanced one step ahead. The controlled atmosphere in the lower section of the vapor depositing chamber remains almost unchanged during this time to insure that uniform, thin-film layers of deposited material are applied to the substrates. Further, to eliminate fluctuation in quality among manufactured lots, there is provided a novel evaporant feeding mechanism.

    摘要翻译： 用于将薄膜真空沉积到基材表面上的装置包括由基板，圆柱形侧壁和顶板形成的真空容器，以容纳至少四个可移动密封盖，每个可移动密封盖具有适于限制批次的空间 的基板在圆顶形状的载体上。 盖子围绕基板的中心移动。 当盖子被停止以覆盖通过基板提供的各个开口时，建立了预热，气相沉积，冷却和空气锁定室，并且将空气锁定室中的批处理的基板移动到 在设备外部，而不会干扰容器中的真空。 接下来，空气锁定室在其盖的空间处接收到新批次的未处理的基板之后，与环境大气密封，并且所有的盖都向前进一步。 在此期间，气相沉积室下部的受控气氛保持几乎不变，以确保均匀的沉积材料的薄膜层被施加到基底上。 此外，为了消除制造批次之间的质量波动，提供了一种新型的蒸发器供给机构。