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1.发明授权公开(公告)号：US09081310B2
公开(公告)日：2015-07-14
申请号：US13604941
申请日：2012-09-06
申请人： Matthias Exler , Ulrich Loering , Toralf Gruner , Holger Walter
发明人： Matthias Exler , Ulrich Loering , Toralf Gruner , Holger Walter
CPC分类号： G03F7/70891 , G03F7/70266 , G03F7/70341
摘要： An optical system of a microlithographic projection exposure apparatus includes a wavefront correction device which has a plurality of fluid outlet apertures. The apertures are arranged so that fluid flows emerging from the outlet apertures enter a space through which projection light propagates during operation of the apparatus. A temperature controller sets the temperature of the fluid flows individually for each fluid flow. The temperature distribution is determined such that optical path length differences caused by the temperature distribution correct wavefront deformations.
摘要翻译： 微光刻投影曝光装置的光学系统包括具有多个流体出口孔的波前校正装置。 孔被布置成使得从出口孔流出的流体流入入射装置操作期间投射光通过该空间传播的空间。 温度控制器为每个流体流量分别设定流体流的温度。 确定温度分布，使得由温度分布导致的光程长度差校正波前变形。
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2.发明申请公开(公告)号：US20130016331A1
公开(公告)日：2013-01-17
申请号：US13604941
申请日：2012-09-06
申请人： Matthias Exler , Ulrich Loering , Toralf Gruner , Holger Walter
发明人： Matthias Exler , Ulrich Loering , Toralf Gruner , Holger Walter
IPC分类号： G03B27/52
CPC分类号： G03F7/70891 , G03F7/70266 , G03F7/70341
摘要： An optical system of a microlithographic projection exposure apparatus includes a wavefront correction device which has a plurality of fluid outlet apertures. The apertures are arranged so that fluid flows emerging from the outlet apertures enter a space through which projection light propagates during operation of the apparatus. A temperature controller sets the temperature of the fluid flows individually for each fluid flow. The temperature distribution is determined such that optical path length differences caused by the temperature distribution correct wavefront deformations.
摘要翻译： 微光刻投影曝光装置的光学系统包括具有多个流体出口孔的波前校正装置。 孔被布置成使得从出口孔流出的流体流入入射装置操作期间投射光通过该空间传播的空间。 温度控制器为每个流体流量分别设定流体流的温度。 确定温度分布，使得由温度分布导致的光程长度差校正波前变形。
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