公开(公告)号：US06576572B2

公开(公告)日：2003-06-10

申请号：US09990791

申请日：2001-11-16

Applicant: Michael David Webster

Inventor： Michael David Webster

IPC: H01L2126

CPC classification number: H01L21/68707 ,  H01L21/67109 ,  H01L21/68728 ,  H01L21/68735 ,  H01L21/68778 ,  H01L21/68785

Abstract: A system, method and apparatus are described for improving critical dimension uniformity in baked substrates. The system, method and apparatus provide for varying the distance between a substrate to be baked and the surface of a hot plate such that an approximately uniform temperature is obtained in the substrate during baking. In one embodiment, the substrate is positioned on a hot plate having a recess generally centered on its top side. The differences in distance between the edges of the substrates contacting the hot plate and the distance between the center region of the substrate and the bottom of the recess enable a generally uniform temperature to be obtained in the substrate.

Abstract translation: 描述了一种系统，方法和装置，用于改善焙烧基材中的临界尺寸均匀性。 该系统，方法和装置提供了改变要烘烤的基材和热板的表面之间的距离，使得在烘烤期间在基材中获得大致均匀的温度。 在一个实施例中，基板定位在热板上，该热板具有通常以其顶侧为中心的凹槽。 接触热板的基板的边缘与基板的中心区域与凹部的底部之间的距离的差异使得能够在基板中获得大致均匀的温度。

公开(公告)号：US06758669B2

公开(公告)日：2004-07-06

申请号：US10073711

申请日：2002-02-11

Applicant: Michael David Webster

Inventor： Michael David Webster

IPC: F27D500

CPC classification number: H01L21/68707 ,  H01L21/67109 ,  H01L21/68728 ,  H01L21/68735 ,  H01L21/68778 ,  H01L21/68785

Abstract: A system, method and apparatus are described for improving critical dimension uniformity in baked substrates. The system, method and apparatus provide for varying the distance between a substrate to be baked and the surface of a hot plate such that an approximately uniform temperature is obtained in the substrate during baking. In one embodiment, the substrate is positioned on a hot plate having a recess generally centered on its top side. The differences in distance between the edges of the substrates contacting the hot plate and the distance between the center region of the substrate and the bottom of the recess enable a generally uniform temperature to be obtained in the substrate.

Abstract translation: 描述了一种系统，方法和装置，用于改善焙烧基材中的临界尺寸均匀性。 该系统，方法和装置提供了改变要烘烤的基材和热板的表面之间的距离，使得在烘烤期间在基材中获得大致均匀的温度。 在一个实施例中，基板定位在热板上，该热板具有通常以其顶侧为中心的凹槽。 接触热板的基板的边缘与基板的中心区域与凹部的底部之间的距离的差异使得能够在基板中获得大致均匀的温度。