Method for grafting a chemical compound to a support substrate
    1.
    发明申请
    Method for grafting a chemical compound to a support substrate 审中-公开
    将化学化合物接枝到支撑基底上的方法

    公开(公告)号:US20060234062A1

    公开(公告)日:2006-10-19

    申请号:US10563112

    申请日:2004-06-12

    Abstract: According to the present invention a method for grafting a chemical compound to a predetermined region of a support substrate (4) is disclosed, comprising: a) irradiating selectively the support substrate with electromagnetic radiation and/or particle radiation in order to both define said predetermined region and to form at least one reactive functional group or a precursor thereof in said predetermined region of the support substrate; b) exposing the irradiated support substrate to said chemical compound or to a precursor thereof. Therefore, only these very few steps are needed to effectively grafting the desired chemical compound, such as an organic compound, to the predetermined regions of the support substrate. Moreover, the irradiation step can be carried out in a vastly flexible manner and allows to generate numerous distinct shapes of the predetermined regions. Further, micro- or nano-scale regions in the support substrate capable of forming reactive functional groups or precursors thereof upon exposure to particle or electromagnetic irradiation can be easily achieved.

    Abstract translation: 根据本发明,公开了一种用于将化学化合物接枝到支撑衬底(4)的预定区域的方法,包括:a)用电磁辐射和/或粒子辐射选择性地照射支撑衬底,以便将所述预定的 并且在所述支撑衬底的所述预定区域中形成至少一个反应性官能团或其前体; b)将照射的支撑基底暴露于所述化合物或其前体。 因此,为了有效地将期望的化合物(例如有机化合物)接枝到支撑基底的预定区域,仅需要这几个步骤。 此外,照射步骤可以以非常灵活的方式进行,并且允许产生许多不同形状的预定区域。 此外,可以容易地实现能够在暴露于粒子或电磁辐射时能够形成反应性官能团或其前体的支持基底中的微尺度或纳米级区域。

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