公开(公告)号：US08711326B2

公开(公告)日：2014-04-29

申请号：US13098830

申请日：2011-05-02

申请人： Ronald Van Der Ham ,  Martinus Hendrikus Antonius Leenders ,  Johannes Catharinus Hubertus Mulkens ,  Richard Moerman ,  Michel Riepen ,  Sergei Shulepov ,  Koen Steffens ,  Jan Willem Cromwijk ,  Johanna Antoinette Maria Sondag-Huethorst ,  Marco Baragona ,  Robertus Leonardus Maria In 'T Groen ,  Ralph Theodorus Hubertus Maessen ,  Jacob Marinus Jan Den Toonder ,  Milica Kovacevic-Milivojevic

发明人： Ronald Van Der Ham ,  Martinus Hendrikus Antonius Leenders ,  Johannes Catharinus Hubertus Mulkens ,  Richard Moerman ,  Michel Riepen ,  Sergei Shulepov ,  Koen Steffens ,  Jan Willem Cromwijk ,  Johanna Antoinette Maria Sondag-Huethorst ,  Marco Baragona ,  Robertus Leonardus Maria In 'T Groen ,  Ralph Theodorus Hubertus Maessen ,  Jacob Marinus Jan Den Toonder ,  Milica Kovacevic-Milivojevic

IPC分类号： G03B27/32 ,  G03B27/52 ,  G03F7/20

CPC分类号： G03F7/70925 ,  G03F7/70 ,  G03F7/70341

摘要： A fluid handling structure to confine immersion liquid in a space between a projection system and a facing surface of a substrate, of a table to support the substrate, or both, is disclosed. The fluid handling structure includes a transponder to dissolve at least some of the gas in a bubble in the immersion liquid or to control a bubble in the immersion liquid so that it avoids entering an optical path of a beam from the projection system.

摘要翻译： 公开了一种用于将浸没液体限制在投影系统和基板的面对表面之间的空间中的流体处理结构，用于支撑基板或两者的台。 流体处理结构包括一个应答器，用于溶解浸入液体中的气泡中的至少一些气体或控制浸没液体中的气泡，使得其避免进入来自投影系统的光束的光路。

公开(公告)号：US20110292357A1

公开(公告)日：2011-12-01

申请号：US13098830

申请日：2011-05-02

申请人： Ronald Van Der Ham ,  Martinus Hendrikus Antonius Leenders ,  Johannes Catharinus Hubertus Mulkens ,  Richard Moerman ,  Michel Riepen ,  Sergei Shulepov ,  Koen Steffens ,  Jan Willem Cromwijk ,  Johanna Antoinette Maria Sondag-Huethorst ,  Marco Baragona ,  Robertus Leonardus Maria In 'T Groen ,  Ralph Theodorus Hubertus Maessen ,  Jacob Marinus Jan Den Toonder ,  Milica Kovacevic-Milivojevic

发明人： Ronald Van Der Ham ,  Martinus Hendrikus Antonius Leenders ,  Johannes Catharinus Hubertus Mulkens ,  Richard Moerman ,  Michel Riepen ,  Sergei Shulepov ,  Koen Steffens ,  Jan Willem Cromwijk ,  Johanna Antoinette Maria Sondag-Huethorst ,  Marco Baragona ,  Robertus Leonardus Maria In 'T Groen ,  Ralph Theodorus Hubertus Maessen ,  Jacob Marinus Jan Den Toonder ,  Milica Kovacevic-Milivojevic

IPC分类号： G03B27/52

CPC分类号： G03F7/70925 ,  G03F7/70 ,  G03F7/70341

摘要： A fluid handling structure to confine immersion liquid in a space between a projection system and a facing surface of a substrate, of a table to support the substrate, or both, is disclosed. The fluid handling structure includes a transponder to dissolve at least some of the gas in a bubble in the immersion liquid or to control a bubble in the immersion liquid so that it avoids entering an optical path of a beam from the projection system.

摘要翻译： 公开了一种用于将浸没液体限制在投影系统和基板的面对表面之间的空间中的流体处理结构，用于支撑基板的台面或两者。 流体处理结构包括一个应答器，用于溶解浸入液体中的气泡中的至少一些气体或控制浸没液体中的气泡，使得其避免进入来自投影系统的光束的光路。