公开(公告)号：US20150136583A1

公开(公告)日：2015-05-21

申请号：US14404365

申请日：2013-06-11

Applicant: NOIVION S.R.L.

Inventor： Libuse Skocdopolova

IPC: H01J37/32 ,  C23C14/34

CPC classification number: H01J37/3244 ,  C23C14/34 ,  H01J37/077 ,  H01J37/18 ,  H01J37/301 ,  H01J37/3053 ,  H01J37/315 ,  H01J37/34 ,  H01J2237/3137

Abstract: A device (2; 2I; 2II; 2IV; 2V; 2VI; 2VII; 2VIII) for generating plasma and for directing an electron beam towards a target (3); the device (2; 2I; 2II; 2IV; 2V; 2VI; 2VII; 2VIII) comprises a hollow element (5); an activation group (21), which is designed to impose a difference in potential between the hollow element (5) and another element which is separate from it, in such a way as to direct the electron beam towards said separate element; and a de Laval nozzle (23), having at least one tapered portion (13), which is tapered towards the separate element and is designed to accelerate a gas flow towards the separate element.

Abstract translation: 用于产生等离子体并用于将电子束引向目标（3）的装置（2; 2I; 2II; 2IV; 2V; 2VI; 2VII; 2VIII） 所述装置（2; 2I; 2II; 2IV; 2V; 2VI; 2VII; 2VIII）包括中空元件（5）; 激活组（21），其被设计成在中空元件（5）和与其分离的另一元件之间施加电位差，以将电子束引向所述分离元件; 和脱拉瓦尔喷嘴（23），其具有至少一个渐缩部分（13），该渐缩部分（13）朝着分离的元件逐渐变细，并且被设计成加速朝着分离元件的气流。