Abstract:
A device (2; 2I; 2II; 2IV; 2V; 2VI; 2VII; 2VIII) for generating plasma and for directing an electron beam towards a target (3); the device (2; 2I; 2II; 2IV; 2V; 2VI; 2VII; 2VIII) comprises a hollow element (5); an activation group (21), which is designed to impose a difference in potential between the hollow element (5) and another element which is separate from it, in such a way as to direct the electron beam towards said separate element; and a de Laval nozzle (23), having at least one tapered portion (13), which is tapered towards the separate element and is designed to accelerate a gas flow towards the separate element.
Abstract:
An apparatus for melting an electrically conductive metallic material comprises an auxiliary ion plasma electron emitter configured to produce a focused electron field including a cross-sectional profile having a first shape. The apparatus further comprises a steering system configured to direct the focused electron field to impinge the focused electron field on at least a portion of the electrically conductive metallic material to at least one of melt or heat any solidified portions of the electrically conductive metallic material, any solid condensate within the electrically conductive metallic material, and/or regions of a solidifying ingot.
Abstract:
The invention relates to a device for producing an electron beam, comprising a housing (12), which delimits a space (13) that can be evacuated and has an electron beam outlet opening; an inlet (16) for feeding a process gas into the space (13) that can be evacuated; a planar cathode (14) and an anode (15), which are arranged in the space (13) that can be evacuated and between which a glow-discharge plasma can be produced by means of an applied electrical voltage, wherein ions can be accelerated from the glow-discharge plasma onto the surface of the cathode (14). The cathode has a first part (14a) made of a first material, which forms a centrally arranged first surface region of the cathode (14), and a second part (14b) made of a second material, which forms a second surface region of the cathode (14) that encloses the first surface region. The first material can be heated by the impingement with accelerated ions to a temperature at which electrons escape the first material predominantly due to thermionic emission.
Abstract:
One embodiment of the present invention is a method for characterizing an electron beam treatment apparatus that includes: (a) e-beam treating one or more of a predetermined type of wafer or substrate utilizing one or more sets of electron beam treatment parameters; (b) making post-electron beam treatment measurements of intensity of a probe beam reflected from the surface of the one or more wafers in which thermal and/or plasma waves have been induced; and (c) developing data from the post-electron beam treatment measurements that provide insight into performance of the electron beam treatment apparatus.
Abstract:
An inductively coupled high-frequency electron source is disclosed having a plasma chamber, which is open at least at a first end, the total surface of the open regions of the plasma chamber defined by Ao, and having a gas inlet for a gas to be ionized, as well as a high-frequency coil. The interior wall of the plasma chamber is formed at least partially by conductive regions which are connected with a current source, the total surface of the conductive regions defined by Ac, and the ratio of the surface amounts Ao to Ac not exceeding a defined maximal value.
Abstract:
An electron generating apparatus for an ion source for example, which is capable of prolonging service life and facilitating the exchange of its filament has been proposed. The electron generating apparatus includes an electron generating chamber having a discharging gas supply hole and electron extracting hole, a pair of conductive filament support members mounted in the chamber through an insulating plate, and a filament detachably fixed on the filament support members. At least one of the filament support members is provided with an overhang to cover at least part of a region between the lower ends of the filament.
Abstract:
A generator for pulsed electron beams of the type including a vacuum chamber for performing high voltage discharges, cathode and anode electrodes, for irradiating a sample with accelerated charge carriers, provided in the vacuum chamber, and a first high voltage capacitor connected between the cathode and anode electrodes to serve as the voltage source for the high voltage discharge between the electrodes. The generator is further provided with an arrangement for generating an auxiliary discharge which initiates the discharge process between the cathode and the anode electrodes, which arrangement includes a trigger electrode and a second high voltage capacitor which can be connected between the cathode electrode and the trigger electrode as an energy source for the auxiliary discharge; the distance between the cathode electrode and the trigger electrode being such that when the second or trigger capacitor is conductively connected between the trigger and cathode electrodes, a sparkover is produced therebetween, causing a trigger plasma to be formed which initiates the high voltage discharge. Moreover, the cathode electrode is provided with a central bore through which the trigger plasma can exit into the discharge chamber formed between the cathode and anode electrodes; and the anode is a metal network or net which is highly transparent to electrons and through which fly the electrons accelerated by the electric field existing between the cathode and anode electrodes due to the voltage of the first or main capacitor. Preferably the sample carrier, which is disposed on the side of the anode electrode facing away from the cathode electrode, is mounted so that it is adjustable along the axis of the electrode system.
Abstract:
A device for the simultaneous operation of a number of gas discharge electron guns in which electron beams produced by the guns have different intensities due to different diameters of discharge spaces and/or due to a different anode-cathode distance.