公开(公告)号：US20160155606A1

公开(公告)日：2016-06-02

申请号：US15014516

申请日：2016-02-03

Applicant: B-NANO LTD.

Inventor： Dov SHACHAL

IPC: H01J37/285 ,  H01J37/28

CPC classification number: H01J37/28 ,  H01J37/06 ,  H01J37/20 ,  H01J37/285 ,  H01J37/301 ,  H01J2237/006 ,  H01J2237/0458 ,  H01J2237/15 ,  H01J2237/164 ,  H01J2237/182 ,  H01J2237/2002 ,  H01J2237/2006 ,  H01J2237/2605 ,  H01J2237/28 ,  H01J2237/2801 ,  H01J2237/2806 ,  H01J2237/2807

Abstract: An interface, a scanning electron microscope and a method for observing an object that is positioned in a non-vacuum environment. The method includes: passing at least one electron beam that is generated in a vacuum environment through at least one aperture out of an aperture array and through at least one ultra thin membrane that seals the at least one aperture; wherein the at least one electron beam is directed towards the object; wherein the at least one ultra thin membrane withstands a pressure difference between the vacuum environment and the non-vacuum environment; and detecting particles generated in response to an interaction between the at least one electron beam and the object.

公开(公告)号：US08779358B2

公开(公告)日：2014-07-15

申请号：US13449392

申请日：2012-04-18

Applicant: Dov Shachal

Inventor： Dov Shachal

IPC: G01N23/00

CPC classification number: H01J37/285 ,  H01J37/06 ,  H01J37/20 ,  H01J37/28 ,  H01J37/301 ,  H01J2237/006 ,  H01J2237/0458 ,  H01J2237/15 ,  H01J2237/164 ,  H01J2237/182 ,  H01J2237/2002 ,  H01J2237/2006 ,  H01J2237/2605 ,  H01J2237/28 ,  H01J2237/2801 ,  H01J2237/2806 ,  H01J2237/2807

Abstract: An interface, a scanning electron microscope and a method for observing an object that is positioned in a non-vacuum environment. The method includes: passing at least one electron beam that is generated in a vacuum environment through at least one aperture out of an aperture array and through at least one ultra thin membrane that seals the at least one aperture; wherein the at least one electron beam is directed towards the object; wherein the at least one ultra thin membrane withstands a pressure difference between the vacuum environment and the non-vacuum environment; and detecting particles generated in response to an interaction between the at least one electron beam and the object.

Abstract translation: 接口，扫描电子显微镜和用于观察位于非真空环境中的物体的方法。 该方法包括：使在真空环境中产生的至少一个电子束通过孔阵列中的至少一个孔并通过至少一个密封所述至少一个孔的超薄膜; 其中所述至少一个电子束被引向所述物体; 其中所述至少一个超薄膜承受真空环境和非真空环境之间的压力差; 以及检测响应于所述至少一个电子束和所述物体之间的相互作用而产生的微粒。

公开(公告)号：US08586949B2

公开(公告)日：2013-11-19

申请号：US13295249

申请日：2011-11-14

Applicant: Laura Dinu-Gürtler ,  Willem Henk Urbanus ,  Marco Jan-Jaco Wieland ,  Stijn Willem Herman Karel Steenbrink

Inventor： Laura Dinu-Gürtler ,  Willem Henk Urbanus ,  Marco Jan-Jaco Wieland ,  Stijn Willem Herman Karel Steenbrink

IPC: H01J37/147 ,  H01J37/10 ,  G03B27/26 ,  G21K5/04

CPC classification number: H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/09 ,  H01J37/16 ,  H01J37/18 ,  H01J37/301 ,  H01J37/3177 ,  H01J2237/0435 ,  H01J2237/0453 ,  H01J2237/188

Abstract: A charged particle lithography system for transferring a pattern onto the surface of a target, comprising a main vacuum chamber, a source chamber and an intermediate chamber, both located in the main vacuum chamber, a beam generator for generating a charged particle beam, the beam generator located in the source chamber, and a first aperture array element for generating a plurality of charged particle beamlets from the beam, the first aperture array element located in the intermediate chamber. The system is adapted for maintaining a first pressure in the main vacuum chamber, a second pressure in the intermediate chamber, and a third pressure in the source chamber, and wherein the first pressure is lower than an ambient pressure, the second pressure is lower than the first pressure, and the third pressure is lower than the second pressure.

Abstract translation: 一种用于将图案转印到目标表面上的带电粒子光刻系统，包括位于主真空室中的主真空室，源室和中间室，用于产生带电粒子束的束发生器， 位于源室中的发生器，以及用于从所述梁产生多个带电粒子子束的第一孔阵列元件，位于中间室中的第一孔阵列元件。 该系统适于维持主真空室中的第一压力，中间室中的第二压力和源室中的第三压力，并且其中第一压力低于环境压力，第二压力低于 第一压力和第三压力低于第二压力。

公开(公告)号：US20120241608A1

公开(公告)日：2012-09-27

申请号：US13449392

申请日：2012-04-18

Applicant: Dov Shachal

Inventor： Dov Shachal

IPC: H01J37/28

CPC classification number: H01J37/285 ,  H01J37/06 ,  H01J37/20 ,  H01J37/28 ,  H01J37/301 ,  H01J2237/006 ,  H01J2237/0458 ,  H01J2237/15 ,  H01J2237/164 ,  H01J2237/182 ,  H01J2237/2002 ,  H01J2237/2006 ,  H01J2237/2605 ,  H01J2237/28 ,  H01J2237/2801 ,  H01J2237/2806 ,  H01J2237/2807

Abstract: An interface, a scanning electron microscope and a method for observing an object that is positioned in a non-vacuum environment. The method includes: passing at least one electron beam that is generated in a vacuum environment through at least one aperture out of an aperture array and through at least one ultra thin membrane that seals the at least one aperture; wherein the at least one electron beam is directed towards the object; wherein the at least one ultra thin membrane withstands a pressure difference between the vacuum environment and the non-vacuum environment; and detecting particles generated in response to an interaction between the at least one electron beam and the object.

Abstract translation: 接口，扫描电子显微镜和用于观察位于非真空环境中的物体的方法。 该方法包括：使在真空环境中产生的至少一个电子束通过孔阵列中的至少一个孔并通过至少一个密封所述至少一个孔的超薄膜; 其中所述至少一个电子束被引向所述物体; 其中所述至少一个超薄膜承受真空环境和非真空环境之间的压力差; 以及检测响应于所述至少一个电子束和所述物体之间的相互作用而产生的微粒。

公开(公告)号：US20070176102A1

公开(公告)日：2007-08-02

申请号：US11700993

申请日：2007-01-31

Applicant: Hendrik Nicolaas Slingerland ,  William Ralph Knowles

Inventor： Hendrik Nicolaas Slingerland ,  William Ralph Knowles

IPC: G21K7/00

CPC classification number: H01J37/18 ,  H01J37/301 ,  H01J37/3056 ,  H01J2237/182 ,  H01J2237/2608 ,  H01J2237/28

Abstract: The invention relates to a particle-optical apparatus with a predetermined final vacuum pressure. To that end a vacuum chamber of said apparatus is via a first restriction connected to a volume where vapour or gas is present at a known pressure and via a second restriction to a vacuum pump. By making the ratio of the two conductances, associated with said restrictions, a calibrated ratio, the final pressure of the vacuum chamber is a predetermined final pressure. This eliminates the need for e.g. vacuum gauges and control systems, resulting in a more compact design of such apparatus.

Abstract translation: 本发明涉及具有预定最终真空压力的粒子光学装置。 为此，所述装置的真空室经由与已知压力下存在蒸气或气体并通​​过第二限制到真空泵的体积连接的第一限制。 通过使与所述限制相关联的两个电导率的比率为校准比率，真空室的最终压力是预定的最终压力。 这消除了对例如 真空计和控制系统，从而使这种设备更加紧凑的设计。

公开(公告)号：US06797953B2

公开(公告)日：2004-09-28

申请号：US10081247

申请日：2002-02-22

Applicant: Robert L. Gerlach ,  Paul P. Tesch ,  Walter Skoczylas

Inventor： Robert L. Gerlach ,  Paul P. Tesch ,  Walter Skoczylas

IPC: G01N2300

CPC classification number: H01J37/16 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/301 ,  H01J37/3177

Abstract: A charged particle beam system uses multiple electron columns to increase throughput. One or more multiple electron emitters are in one or more vacuum sealable gun chambers to allow the gun chamber to be replaced with electrons guns having emitters that have been previously conditioned so that the system does not need to be out of service to condition the newly installed emitters.

Abstract translation: 带电粒子束系统使用多个电子柱来增加产量。 一个或多个多个电子发射器在一个或多个可真空密封的枪室中，以允许枪室更换为具有先前调节的发射器的电子枪，使得系统不需要停止使用以调节新安装 发射器。

公开(公告)号：US20030168595A1

公开(公告)日：2003-09-11

申请号：US10343638

申请日：2003-02-03

Inventor： Gerasimos Daniel Danilatos

IPC: G21K007/00 ,  G01N023/00

CPC classification number: H01J37/301 ,  H01J2237/188 ,  H01J2237/2002 ,  H01J2237/2605 ,  H01J2237/2608

Abstract: The invention provides for a scanning electron or ion beam instrument capable of transferring the beam from a high vacuum chamber (8) into a high pressure chamber (5) via aperture (1) and aperture (2). The beam is deflected and scanned by coils (3) generally positioned between apertures (1) and (2). The amplitude of deflection of the beam over a specimen placed inside chamber (5) is substantially larger than the diameter of aperture (1). Leaking gas through aperture (1) is removed via port (7) by appropriate pumping apparatus. The size of aperture (1) is such that the pressure in chamber (6) combined with the supersonic jet and shock waves naturally forming therein do not result in catastrophic electron beam loss in chamber (6). The addition of appropriate detection means result in an instrument characterised by superior performance over prior art by way of better field of view at low magnification, better vacuum system and improved detection and imaging capabilities.

Abstract translation: 本发明提供一种扫描电子或离子束仪器，其能够通过孔（1）和孔（2）将束从高真空室（8）传送到高压室（5）中。 光束被通常位于孔（1）和（2）之间的线圈（3）偏转和扫描。 放置在室（5）内部的样品上的束的偏转幅度基本上大于孔（1）的直径。 通过孔（1）泄漏气体通过适当的泵送装置通过端口（7）去除。 孔（1）的尺寸使得室（6）中与其中自然形成的超音速射流和冲击波结合的压力不会导致腔室（6）中的电子束损失。 通过添加适当的检测装置，可以通过在低放大倍数，更好的真空系统以及改善的检测和成像能力的更好的视场方面，以超过现有技术的性能为特征。

公开(公告)号：US06396064B1

公开(公告)日：2002-05-28

申请号：US09555099

申请日：2000-05-24

Applicant: Gerasimos Daniel Danilatos

Inventor： Gerasimos Daniel Danilatos

IPC: H01J4924

CPC classification number: H01J37/18 ,  F04F5/20 ,  F04F5/465 ,  H01J37/301 ,  H01J2237/188 ,  H01J2237/2605

Abstract: An aperture (5) connects a first chamber (1) with a second chamber (2), and is surrounded by an annular nozzle (7) formed by inner and outer walls (6, 8), which connects the first chamber (1) with a third chamber (3). A supersonic annular gas jet (9) is ejected by the annular nozzle (7) into the first chamber (1), creating a Venturi pumping action at the core of the jet in the vicinity of the aperture (5). The second chamber (2) may thus be maintained at a substantially lower pressure than the first chamber (1). Inner wall (6) and outer wall (8) may be relatively movable for varying gas flow, and the first chamber (1) may include baffles or skimmers to modify gas flow, e.g., to create a high density molecular beam. An electron or ion beam (4) may be transferred from the second chamber (2) to the first chamber (1), e.g., as part of an environmental scanning electron microscope.

Abstract translation: 孔（5）将第一室（1）与第二室（2）连接，并由内壁和外壁（6,8）形成的环形喷嘴（7）包围，所述环形喷嘴将第一室（1） 与第三室（3）。 超音速环形气体喷射（9）被环形喷嘴（7）喷射到第一腔室（1）中，在孔口（5）附近的射流核心产生文丘里泵送作用。 因此，第二室（2）可以保持在比第一室（1）基本上更低的压力。 内壁（6）和外壁（8）可以相对移动以改变气体流动，并且第一室（1）可以包括挡板或撇渣器以改变气流，例如产生高密度分子束。 电子或离子束（4）可以从第二室（2）转移到第一室（1），例如作为环境扫描电子显微镜的一部分。

公开(公告)号：US20010052577A1

公开(公告)日：2001-12-20

申请号：US09789943

申请日：2001-02-28

Inventor： Yuichi Aki ,  Takao Kondo ,  Minoru Takeda ,  Masanobu Yamamoto ,  Shin Masuhara ,  Toshiyuki Kashiwagi

IPC: C23F001/00 ,  G21G005/00

CPC classification number: G11B7/261 ,  G11B23/0057 ,  H01J37/301 ,  H01J2237/188

Abstract: There is provided an electron beam irradiation apparatus, an electron beam irradiation method, an original disc, a stamper, and a recording medium, capable of effectively avoiding scattering of an electron beam and avoiding provision of a large scale vacuum chamber. An electron beam irradiation apparatus includes a support section (4) for supporting an electron beam irradiation subject (3) to be irradiated with an electron beam (2), and an electron beam irradiation head (6) opposed to the electron beam irradiation subject via a minute space, the electron beam irradiation head (6) having an electron beam emission hole (5) for irradiating the electron beam irradiation subject (3) with the electron beam (2). In the electron beam irradiation head (6), an electron beam path (20) communicating with the electron beam emission hole (5) is provided, and in addition one or more ring shaped gas suction grooves (61) and (62) opened from a surface of the electron beam irradiation head facing the electron beam irradiation subject is formed around the electron beam emission hole (5). Vacuum pumps are coupled to the electron beam path (20) and the ring shaped gas suction grooves (61) and (62), and the electron beam path is held in a high vacuum state.

Abstract translation: 提供能够有效地避免电子束散射并避免提供大规模真空室的电子束照射装置，电子束照射方法，原盘，压模和记录介质。 一种电子束照射装置，包括：用于支撑照射电子束（2）的电子束照射对象（3）的支撑部（4），和与电子束照射对象相对的电子束照射头 电子束照射头（6）具有用于用电子束（2）照射电子束照射对象（3）的电子束发射孔（5）。 在电子束照射头（6）中，设置与电子束发射孔（5）连通的电子束路径（20），另外还有一个以上的环形吸气槽（61）和（62）从 在电子束发射孔（5）周围形成面向电子束照射对象的电子束照射头的表面。 真空泵与电子束通路（20）和环状吸气槽（61）和（62）连接，电子束路保持在高真空状态。

公开(公告)号：US4327273A

公开(公告)日：1982-04-27

申请号：US131857

申请日：1980-03-19

Applicant: Hisanao Kita ,  Yoshinori Karatsu ,  Takamitsu Nakazaki ,  Yoji Akutsu

Inventor： Hisanao Kita ,  Yoshinori Karatsu ,  Takamitsu Nakazaki ,  Yoji Akutsu

IPC: B23K15/00 ,  H01J37/301

CPC classification number: H01J37/301 ,  B23K15/00

Abstract: A vacuum chamber for welding in which to place a workpiece is hermetically connected to a vacuum chamber for an electron beam gun in which to place an electron beam gun, and the former is kept at a vacuum of 1.times.10.sup.-4 Torr while the latter, at a vacuum of 1.times.10.sup.-6 Torr. The distance between the electron beam gun and the surface of the workpiece is made greater than the mean free path of gas molecules and metal vapor molecules generated in treating, e.g., 1.85 m. Two focusing coils are arranged to prevent the expansion of the electron beams.

Abstract translation: 将用于放置工件的用于焊接的真空室与用于放置电子束枪的电子束枪的真空室气密连接，并且将前者保持在1×10-4乇的真空，而后者处于 真空度为1×10-6乇。 电子束枪与工件表面之间的距离大于在处理例如1.85μm时产生的气体分子和金属蒸气分子的平均自由程。 布置两个聚焦线圈以防止电子束的膨胀。