公开(公告)号：US06578369B2

公开(公告)日：2003-06-17

申请号：US09820281

申请日：2001-03-28

申请人： Pam Kunkel ,  Natraj Narayanswani ,  John C. Patrin

发明人： Pam Kunkel ,  Natraj Narayanswani ,  John C. Patrin

IPC分类号： F25D1702

CPC分类号： H01L21/67028 ,  B05B1/20 ,  B08B7/0092 ,  B24C1/003 ,  B24C5/04

摘要： Improved nozzle design that discharges more powerful, more focused fluid streams through a series of nozzle orifices distributed along a length of the nozzle. The present invention may be incorporated into a wide range of microelectronic device manufacturing processes and equipment types for which an array of more forceful, more focused process streams are desired for treating microelectronic workpieces. The present invention is particularly useful to cryogenically clean microelectronic workpieces, where the improvements allow the conventionally more troublesome smaller contaminant particles to be cleaningly removed with greater particle removal efficiency.