公开(公告)号：US20110063588A1

公开(公告)日：2011-03-17

申请号：US12870402

申请日：2010-08-27

申请人： Masahito KASHIYAMA ,  Yukihiko INAGAKI ,  Kazuya AKIYAMA ,  Noriaki YOKONO ,  Isao TANIGUCHI

发明人： Masahito KASHIYAMA ,  Yukihiko INAGAKI ,  Kazuya AKIYAMA ,  Noriaki YOKONO ,  Isao TANIGUCHI

IPC分类号： G03B27/32

CPC分类号： G03F7/2028 ,  H01L21/67173 ,  H01L21/67178 ,  H01L21/67225 ,  H01L21/67742

摘要： An edge exposure unit includes a projector, a projector holding unit, a substrate rotating unit, an outer edge detecting unit and a surface inspection processing unit. Each component of the projector holding unit operates to move the projector in an X direction and a Y direction. The projector irradiates a peripheral portion of a substrate with light transmitted from a light source for exposure through a light guide. Edge sampling processing is performed based on distribution of an amount of light received in a CCD line sensor of the outer edge detecting unit. Surface inspection processing is performed based on distribution of an amount of light received in a CCD line sensor of the surface inspection processing unit.

摘要翻译： 边缘曝光单元包括投影仪，投影仪保持单元，基板旋转单元，外缘检测单元和表面检查处理单元。 投影机保持单元的每个组件操作以沿X方向和Y方向移动投影仪。 投影仪利用从光源透射的光通过光导照射用于曝光的基板的周边部分。 基于在外部边缘检测单元的CCD线传感器中接收的光量的分布来执行边缘采样处理。 基于在表面检查处理单元的CCD线传感器中接收的光量的分布进行表面检查处理。

公开(公告)号：US6053058A

公开(公告)日：2000-04-25

申请号：US938900

申请日：1997-09-26

申请人： Toyohide Hayashi ,  Hiroaki Sugimoto ,  Masaya Asai ,  Noriaki Yokono

发明人： Toyohide Hayashi ,  Hiroaki Sugimoto ,  Masaya Asai ,  Noriaki Yokono

IPC分类号： G01N1/22 ,  G01N1/26 ,  G01N1/00

CPC分类号： G01N1/26 ,  G01N1/2273

摘要： An atmosphere concentration monitoring system includes multiple measurement ports for collecting atmospheric gas, a port selector for switching the multiple measurement ports, a concentration measurement unit for sampling the atmospheric gas through the selected measurement port and measuring the concentration of a specific substance contained in the sampled atmospheric gas. A different set of measurement conditions are established for each of the measurement ports. The port selector and the concentration measurement unit are controlled according to the different sets of measurement conditions. A life determination device includes a flow rate determination unit for measuring a flow rate of the atmospheric gas passing through the atmosphere processing unit. A throughput of the atmosphere processing unit is determined by integrating, with respect to time, a product of the flow rate and a difference between the upstream and downstream concentrations. The life of the atmosphere processing unit is determined as a function of the throughput.

摘要翻译： 气氛浓度监测系统包括多个用于采集大气气体的测量端口，用于切换多个测量端口的端口选择器，用于通过所选择的测量端口对大气气体进行采样的浓度测量单元，并测量采样中包含的特定物质的浓度 大气气体 为每个测量端口建立不同的测量条件集。 端口选择器和浓度测量单元根据不同的测量条件进行控制。 寿命确定装置包括用于测量通过大气处理单元的气氛气体的流量的流量确定单元。 通过将流量的乘积和上游和下游浓度的差积分相对于时间来确定大气处理单元的通过量。 大气处理单元的寿命被确定为吞吐量的函数。

公开(公告)号：US08477301B2

公开(公告)日：2013-07-02

申请号：US12870402

申请日：2010-08-27

申请人： Masahito Kashiyama ,  Yukihiko Inagaki ,  Kazuya Akiyama ,  Noriaki Yokono ,  Isao Taniguchi

发明人： Masahito Kashiyama ,  Yukihiko Inagaki ,  Kazuya Akiyama ,  Noriaki Yokono ,  Isao Taniguchi

IPC分类号： G01N21/00

CPC分类号： G03F7/2028 ,  H01L21/67173 ,  H01L21/67178 ,  H01L21/67225 ,  H01L21/67742

摘要： An edge exposure unit includes a projector, a projector holding unit, a substrate rotating unit, an outer edge detecting unit and a surface inspection processing unit. Each component of the projector holding unit operates to move the projector in an X direction and a Y direction. The projector irradiates a peripheral portion of a substrate with light transmitted from a light source for exposure through a light guide. Edge sampling processing is performed based on distribution of an amount of light received in a CCD line sensor of the outer edge detecting unit. Surface inspection processing is performed based on distribution of an amount of light received in a CCD line sensor of the surface inspection processing unit.

摘要翻译： 边缘曝光单元包括投影仪，投影仪保持单元，基板旋转单元，外缘检测单元和表面检查处理单元。 投影机保持单元的每个组件操作以沿X方向和Y方向移动投影仪。 投影仪利用从光源透射的光通过光导照射用于曝光的基板的周边部分。 基于在外部边缘检测单元的CCD线传感器中接收的光量的分布来执行边缘采样处理。 基于在表面检查处理单元的CCD线传感器中接收的光量的分布进行表面检查处理。

公开(公告)号：US06963789B2

公开(公告)日：2005-11-08

申请号：US10253010

申请日：2002-09-23

申请人： Tamihiro Bun ,  Kinya Murata ,  Kenji Hashinoki ,  Kenji Kamei ,  Noriaki Yokono ,  Kenji Sugimoto ,  Tsuyoshi Mitsuhashi

发明人： Tamihiro Bun ,  Kinya Murata ,  Kenji Hashinoki ,  Kenji Kamei ,  Noriaki Yokono ,  Kenji Sugimoto ,  Tsuyoshi Mitsuhashi

IPC分类号： H01L21/66 ,  H01L21/00 ,  G06F19/00

CPC分类号： H01L21/67253

摘要： A controller is connected to a substrate processing apparatus and an exposure apparatus. A pilot substrate subjected to a series of processing as preprocessing is transported to an inspection unit. An inspection result determination part compares inspection results received from the inspection unit with substrate condition data so that a condition change instruction part changes the processing condition of each processing unit when no requirement is satisfied. This operation is so repeated that a processing control part executes actual processing according to recipe data when the inspection results satisfy the requirement. Thus, the efficiency a step of changing the processing condition of each processing part in response to the inspection results in the inspection part is improved in preprocessing executed in the substrate processing apparatus.

摘要翻译： 控制器连接到基板处理装置和曝光装置。 经过一系列处理作为预处理的先导基板被输送到检查单元。 检查结果确定部分将从检查单元接收的检查结果与基板条件数据进行比较，使得条件改变指示部分在不要求满足时改变每个处理单元的处理条件。 该操作如此重复，使得当检查结果满足要求时，处理控制部分根据配方数据执行实际处理。 因此，在基板处理装置中执行的预处理中，提高了响应于检查结果的检查结果改变各处理部的处理条件的效率。

公开(公告)号：US5436848A

公开(公告)日：1995-07-25

申请号：US47449

申请日：1993-04-15

申请人： Masami Nishida ,  Masahiro Himoto ,  Tetsuya Hamada ,  Noriaki Yokono ,  Takeo Okamoto

发明人： Masami Nishida ,  Masahiro Himoto ,  Tetsuya Hamada ,  Noriaki Yokono ,  Takeo Okamoto

IPC分类号： H01L21/00 ,  H01L21/677 ,  G06F19/00

CPC分类号： H01L21/67103 ,  H01L21/67745

摘要： A robot (12) takes a wafer (3f) out of an indexer (1) and then transports the same to a heat processing part (41). A wafer (3e), which has already introduced in the heat processing part (41) is took out thereof by the robot (5). The wafer (3f) is introduced in the heat processing part (41) after a waiting time (18a) so that an excess heat processing in the heat processing part (41) can be avoided. The wafer (3e) is transported to a processing part (43) and introduced therein by the robot (5). After the robot (5) repeats the similar processings in processing parts (13, 42, 44), it returns to the wafer transferring robot (12) to receive a next wafer. At that time, the robot (5) waits for a predetermined time thereby a cycle time is adjusted. After the waiting, the robot (5) takes out the wafer (3f), which has been introduced in the heat processing part (41), out thereof. Since the cycle time is set in common for different lots, the waiting times (18a, 18b) are set individually for each lot.

摘要翻译： 机器人（12）将晶片（3f）从分度器（1）中取出，然后将其输送到热处理部分（41）。 已经引入热处理部（41）的晶片（3e）被机器人（5）取出。 在等待时间（18a）之后，将晶片（3f）引入热处理部（41），从而可以避免热处理部（41）中的过度热处理。 将晶片（3e）输送到加工部（43）并由机器人（5）引入。 在机器人（5）重复处理部件（13,42,44）中的类似处理之后，返回到晶片传送机器人（12）以接收下一晶片。 此时，机器人（5）等待预定时间，从而调整循环时间。 在等待之后，机器人（5）将已经引入热处理部分（41）中的晶片（3f）取出。 由于循环时间对于不同的批次是共同设定的，因此为每个批次分别设置等待时间（18a，18b）。