公开(公告)号：US20120182538A1

公开(公告)日：2012-07-19

申请号：US13186034

申请日：2011-07-19

申请人： Roelof Koole ,  Vadim Yevgenyevich Banine ,  Luigi Scaccabarozzi ,  Oktay Yildirim

发明人： Roelof Koole ,  Vadim Yevgenyevich Banine ,  Luigi Scaccabarozzi ,  Oktay Yildirim

IPC分类号： G03B27/62 ,  G01N21/956

CPC分类号： G01N21/6428 ,  G01N21/94 ,  G01N21/956 ,  G03F1/84

摘要： An article such as an EUV lithography reticle is inspected to detect contaminant particles. The method comprises applying a fluorescent dye material to the article, illuminating the article with radiation at wavelengths suitable for exciting the fluorescent dye, monitoring the article for emission of second radiation by the fluorescent dye at a wavelength different from the first radiation, and generating a signal representing contamination in the event of detecting the second radiation. In one example, measures such as low-affinity coatings may be applied to the reticle to reduce affinity for the dye molecules, while the dye molecules will bind by physical or chemical adsorption to the contaminant particles. Dyes may be selected to have fluorescence behavior enhanced by hydrophobicity or hydrophilicity, and contaminant surfaces treated by buffer coatings accordingly.

摘要翻译： 检查诸如EUV光刻掩模版的物品以检测污染物颗粒。 该方法包括将荧光染料材料施加到制品上，用适于激发荧光染料的波长的辐射照射物品，监测该物品用荧光染料发射不同于第一辐射的波长的第二辐射， 在检测到第二辐射的情况下表示污染的信号。 在一个实例中，诸如低亲和性涂层的措施可以应用于掩模版以降低对染料分子的亲和性，而染料分子将通过物理或化学吸附结合到污染物颗粒。 可以选择染料以通过疏水性或亲水性增强荧光性能，并且相应地通过缓冲涂层处理污染物表面。