公开(公告)号：US06489627B1

公开(公告)日：2002-12-03

申请号：US09675929

申请日：2000-09-29

Applicant: Parson Sheng ,  Cheng-Hsun Lin ,  Joseph Guo

Inventor： Parson Sheng ,  Cheng-Hsun Lin ,  Joseph Guo

IPC: G01N2186

CPC classification number: G03F1/84 ,  G01N21/95607

Abstract: Within each of: (1) a method for inspecting a reticle; (2) an apparatus for inspecting the reticle; and (3) a method for forming a microelectronic layer while employing the method for inspecting the reticle and the apparatus for inspecting the reticle, there is employed a pair of wedges whose inclined surfaces are counter-opposed and separated by a gap. The pair of wedges whose inclined surfaces are counter-opposed and separated by the gap is employed in conjunction with an inspection light source and detector for determining an optimizing an optical characteristic of the reticle, such as an optimized optical interference characteristic of the reticle, such that the reticle may be optimally aligned within a photoexposure apparatus and there may be formed with optimal registration while employing the reticle and the photoexposure apparatus a microelectronic layer within a microelectronic fabrication.

Abstract translation: 在以下各项中：（1）检查掩模版的方法; （2）用于检查掩模版的装置; 和（3）在使用掩模版检查方法和用于检查掩模版的装置的同时形成微电子层的方法，采用一对楔形件，其倾斜表面相反并间隔开。 结合用于确定掩模版的光学特性的优化的检查光源和检测器，例如光罩的优化的光学干涉特性，与斜面相反并由间隙隔开的一对楔形楔， 在光曝光设备中掩模版可以被最佳对准，并且在微电子制造中使用掩模版和光曝光设备的微电子层之前，可以形成最佳配准。