公开(公告)号：US20060068335A1

公开(公告)日：2006-03-30

申请号：US11131890

申请日：2005-05-18

Applicant: Suzanne Coley ,  Peter Trefonas ,  Patricia Fallon ,  Gerald Wayton

Inventor： Suzanne Coley ,  Peter Trefonas ,  Patricia Fallon ,  Gerald Wayton

IPC: G03F7/00 ,  G03F7/004

CPC classification number: G03F7/091 ,  G03F7/0382 ,  G03F7/0392

Abstract: Compositions and methods are provided that can reduce reflection of exposing radiation from a substrate back into an overcoated photoresist layer and/or function as a planarizing or via-fill layer. Preferred coating composition and methods of the invention can provide enhanced resolution of a patterned overcoated photoresist layer and include use of low activation temperature thermal acid generators as well as multiple thermal treatments to process a layer of the underlying coating composition.

Abstract translation: 提供的组合物和方法可以减少从衬底暴露辐射回到外涂光致抗蚀剂层的反射和/或作为平坦化或通孔填充层的功能。 本发明优选的涂料组合物和方法可以提供图案化涂覆的光致抗蚀剂层的增强的分辨率，并且包括使用低活化温度的热酸发生剂以及多个热处理以处理下层涂料组合物的层。