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公开(公告)号：US20100055299A1
公开(公告)日：2010-03-04
申请号：US12552448
申请日：2009-09-02
CPC分类号： H05K3/1241 , H01L21/67126 , H01L21/6715 , H05K2203/0126
摘要： A method for depositing a material on a substrate includes providing an apparatus with at least one material dispenser. The method further includes positioning the pen tip at a predetermined writing gap where the predetermined writing gap is a distance of more than 75 micrometers above the substrate. The method also provides for controlling velocity of the flow of material through the outlet and dispense speed based on dispensed line height and dispensed line width parameters. An apparatus for depositing a material on a substrate is also provided which may have one or more mechanical vibrators, a pen tip with a hydrophobic surface, or multiple nozzles and pen tips on a single pump.
摘要翻译： 用于在基板上沉积材料的方法包括提供具有至少一种材料分配器的装置。 该方法还包括将笔尖定位在预定写入间隙处，其中预定写入间隙距离衬底上方大于75微米的距离。 该方法还提供了基于分配的线高度和分配的线宽度参数来控制通过出口的材料流速和分配速度的速度。 还提供了一种用于在衬底上沉积材料的设备，其可以具有一个或多个机械振动器，具有疏水表面的笔尖，或者在单个泵上具有多个喷嘴和笔尖。
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公开(公告)号：US12052828B2
公开(公告)日：2024-07-30
申请号：US12552448
申请日：2009-09-02
CPC分类号： H05K3/1241 , H01L21/67126 , H01L21/6715 , H05K2203/0126
摘要： A method for depositing a material on a substrate includes providing an apparatus with at least one material dispenser. The method further includes positioning the pen tip at a predetermined writing gap where the predetermined writing gap is a distance of more than 75 micrometers above the substrate. The method also provides for controlling velocity of the flow of material through the outlet and dispense speed based on dispensed line height and dispensed line width parameters. An apparatus for depositing a material on a substrate is also provided which may have one or more mechanical vibrators, a pen tip with a hydrophobic surface, or multiple nozzles and pen tips on a single pump.
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