公开(公告)号：US09108219B2

公开(公告)日：2015-08-18

申请号：US13810054

申请日：2011-07-12

申请人： David Grosso ,  Cédric Boissiere ,  Clément Sanchez ,  Pierre Antoine Albouy

发明人： David Grosso ,  Cédric Boissiere ,  Clément Sanchez ,  Pierre Antoine Albouy

IPC分类号： B05C3/00 ,  B05D1/18 ,  B05D3/04

CPC分类号： B05D1/18 ,  B05D3/0473 ,  B05D3/0486 ,  B05D2203/35

摘要： A process for depositing a layer on at least part of the surface of a substrate by at least partially submerging the substrate in a solution having a solvent and at least one compound intended to form the layer, then drying the substrate, the drying being at least partially carried out in an atmosphere that is isolated from the solution. The submersion in the solution and the drying of the substrate are carried out in the same controlled-atmosphere enclosure.

摘要翻译： 一种用于通过至少部分地将基底浸没在具有溶剂的溶液和至少一种用于形成该层的化合物的溶液中，然后干燥该基材，至少将该基材沉积在基材的至少部分表面上的方法，干燥至少 部分地在与溶液隔离的气氛中进行。 溶液中的浸没和基材的干燥在相同的受控气氛的封闭体中进行。

公开(公告)号：US20130171356A1

公开(公告)日：2013-07-04

申请号：US13810054

申请日：2011-07-12

申请人： David Grosso ,  Cédric Boissiere ,  Clément Sanchez ,  Pierre Antoine Albouy

发明人： David Grosso ,  Cédric Boissiere ,  Clément Sanchez ,  Pierre Antoine Albouy

IPC分类号： B05D1/18

CPC分类号： B05D1/18 ,  B05D3/0473 ,  B05D3/0486 ,  B05D2203/35

摘要： A process for depositing a layer on at least part of the surface of a substrate by at least partially submerging the substrate in a solution comprising a solvent and at least one compound intended to form the layer, then drying the substrate, this drying being at least partially carried out in an atmosphere that is isolated from the solution. The submersion in the solution and the drying of the substrate are carried out in the same controlled-atmosphere enclosure.

摘要翻译： 一种用于通过至少部分地将基底浸没在包含溶剂和至少一种用于形成该层的化合物的溶液中，然后干燥该基底的溶液中至少部分浸没在基底的至少部分表面上的方法，该干燥至少 部分地在与溶液隔离的气氛中进行。 溶液中的浸没和基材的干燥在相同的受控气氛的封闭体中进行。