公开(公告)号：US20070106075A1

公开(公告)日：2007-05-10

申请号：US11593051

申请日：2006-11-06

Applicant: Sung Kim ,  Jeong Yoon ,  Raisa Kharbash ,  Han Kim ,  Xiang Li ,  Min Lim ,  Chang Cho

Inventor： Sung Kim ,  Jeong Yoon ,  Raisa Kharbash ,  Han Kim ,  Xiang Li ,  Min Lim ,  Chang Cho

IPC: C07D413/14 ,  C07D409/14 ,  C07D403/14

CPC classification number: C07D251/24 ,  C08F2/50 ,  G03F7/029 ,  Y10S430/121

Abstract: The present invention relates to a triazine based photoactive compound containing an oxime ester group. The compound according to the present invention is a photoactive compound containing both an oxime ester group and a triazine group in one molecule, has excellent radical-generating efficiency due to effective absorption of UV radiation, particularly i-line (365 nm) radiation and can function as an effective initiator for photopolymerization of various compounds containing unsaturated groups, particularly an acryl compound.

Abstract translation: 本发明涉及含有肟酯基的三嗪系光敏化合物。 根据本发明的化合物是在一个分子中含有肟酯基和三嗪基的光敏化合物，由于UV辐射的有效吸收，特别是i线（365nm）辐射，具有极好的自由基产生效率，并且可以 作为含有不饱和基团，特别是丙烯酸化合物的各种化合物的光聚合的有效引发剂。

公开(公告)号：US08871430B2

公开(公告)日：2014-10-28

申请号：US14111166

申请日：2012-05-14

Applicant: Changho Cho ,  Won Jin Chung ,  Raisa Kharbash ,  Sunghyun Kim ,  Dongchang Choi ,  Sang Chul Lee ,  Han Soo Kim ,  Yoon Hee Heo ,  Sunhwa Kim

Inventor： Changho Cho ,  Won Jin Chung ,  Raisa Kharbash ,  Sunghyun Kim ,  Dongchang Choi ,  Sang Chul Lee ,  Han Soo Kim ,  Yoon Hee Heo ,  Sunhwa Kim

IPC: G03F7/004 ,  G03F7/028 ,  C07D209/82

CPC classification number: G03F7/0045 ,  G03F7/0007 ,  G03F7/029 ,  G03F7/032 ,  G03F7/033 ,  G03F7/0388

Abstract: The present invention relates to a photoactive compound having a novel structure and a photosensitive resin composition including the same, and the photoactive compound according to the present invention has excellent sensitivity due to efficient absorption to a UV light source by including a nitro group and a phosphonate structure, and has excellent retention rate, mechanical strength, heat resistance, chemical resistance and developing resistance by improving solubility of the photosensitive resin composition by excellent compatibility of the phosphonate structure and a binder resin. Therefore, the photosensitive resin composition according to the present invention is useful to cure a column spacer, an overcoat, a passivation material and the like of a liquid crystal display device, and is useful in view of a high temperature process property.

Abstract translation: 本发明涉及一种具有新颖结构的光敏化合物和含有它的光敏树脂组合物，本发明的光敏化合物由于通过包括硝基和膦酸盐对UV光源的有效吸收而具有优异的灵敏度 结构，并且通过优异的膦酸酯结构和粘合剂树脂的相容性改善感光性树脂组合物的溶解性，具有优异的保留率，机械强度，耐热性，耐化学性和耐显影性。 因此，根据本发明的感光性树脂组合物可用于固化液晶显示装置的柱间隔物，外涂层，钝化材料等，并且考虑到高温加工性能是有用的。

公开(公告)号：US08168369B2

公开(公告)日：2012-05-01

申请号：US13147342

申请日：2010-02-12

Applicant: Chang Ho Cho ,  Sung Hyun Kim ,  Raisa Kharbash ,  Keon Woo Lee ,  Dong Kung Oh ,  Won Jin Chung ,  Sang Kyu Kwak ,  Chang Soon Lee

Inventor： Chang Ho Cho ,  Sung Hyun Kim ,  Raisa Kharbash ,  Keon Woo Lee ,  Dong Kung Oh ,  Won Jin Chung ,  Sang Kyu Kwak ,  Chang Soon Lee

IPC: G03F7/00 ,  G03F7/004 ,  G03F7/028 ,  C07D209/82

CPC classification number: C07F9/5728 ,  C07D209/88 ,  C08F2/50 ,  G03F7/031 ,  Y10S430/106 ,  Y10S430/127

Abstract: The present invention relates to a photoactive compound of a novel structure represented by Chemical Formula 1 below In Chemical Formula 1, R1 and R2, R3, and A are as defined in the specification, and a photosensitive resin composition comprising the same. The photoactive compound of the present invention comprises a nitro group and a phosphonate structure and thus exhibits excellent sensitivity through efficient absorption for UV light, excellent compatibility between the photoactive compound and the alkali-soluble binder resin, and an improved solubility of the photosensitive resin composition. Furthermore, the photosensitive resin composition of the present invention has excellent residual film thickness and mechanical strength characteristics and heat-resistant, chemical-resistant, and development-resistant properties. Accordingly, the photosensitive resin composition of the present invention is advantageous in hardening the column spacers of liquid crystal displays, an overcoat, and passivation materials and also advantageous in a high-temperature process characteristic.

Abstract translation: 本发明涉及由化学式1化学式1表示的新结构的光敏化合物，其中R1，R2，R3，A如说明书中所定义，和含有该化合物的感光性树脂组合物。 本发明的光活性化合物包括硝基和膦酸酯结构，因此通过有效吸收UV光，光活性化合物和碱溶性粘合剂树脂之间的相容性优异，并且改善了感光性树脂组合物的溶解性而显示出极好的灵敏度 。 此外，本发明的感光性树脂组合物具有优异的残留膜厚度和机械强度特性以及耐热，耐化学腐蚀和耐开发性能。 因此，本发明的感光性树脂组合物有利于硬化液晶显示器的列间隔物，外涂层和钝化材料，并且在高温工艺特性中也是有利的。

公开(公告)号：US08198462B2

公开(公告)日：2012-06-12

申请号：US12452690

申请日：2008-07-15

Applicant: Keon-Woo Lee ,  Chang-Ho Cho ,  Kyoung-Hoon Min ,  Raisa Kharbash ,  Chang-Soon Lee ,  Sung-Hyun Kim

Inventor： Keon-Woo Lee ,  Chang-Ho Cho ,  Kyoung-Hoon Min ,  Raisa Kharbash ,  Chang-Soon Lee ,  Sung-Hyun Kim

IPC: C07D209/82

CPC classification number: C07C259/06 ,  C07C323/47 ,  G03F7/031

Abstract: The present invention relates to a dendritic photoactive compound that comprises oxime ester and a method for producing the same. Since the compound according to the present invention comprises two or more oxime ester groups and chromophores in one molecule at the same time, the solubility in respects to the organic solvent and the efficiency for producing a radical by absorbing ultraviolet rays are excellent. In addition, it can act as an effective initiator in respects to the photopolymerization of the unsaturated group, in particular, the acryl compound.

Abstract translation: 本发明涉及包含肟酯的树枝状光敏化合物及其制造方法。 由于根据本发明的化合物同时在一个分子中包含两个或更多个肟酯基和发色团，因此通过吸收紫外线而言，有机溶剂的溶解度和生成自由基的效率优异。 此外，它可以作为不饱和基团，特别是丙烯酸化合物的光聚合的有效引发剂。

公开(公告)号：US20100261815A1

公开(公告)日：2010-10-14

申请号：US12743373

申请日：2009-04-01

Applicant: Chang Ho Cho ,  Sung-Hyun Kim ,  Raisa Kharbash ,  Keon Woo Lee ,  Sang Kyu Kwak ,  Dong Kung Oh ,  Chang Soon Lee ,  Kyoung Hoon Min

Inventor： Chang Ho Cho ,  Sung-Hyun Kim ,  Raisa Kharbash ,  Keon Woo Lee ,  Sang Kyu Kwak ,  Dong Kung Oh ,  Chang Soon Lee ,  Kyoung Hoon Min

IPC: C08K5/3417 ,  C07D405/12

CPC classification number: C07D405/12 ,  G03F7/031

Abstract: A novel photoactive compound is provided. The photoactive compound has a structure represented by Formula 1: wherein R1, R2, R3, A, X, Y, n and m are as defined in the specification. The photoactive compound efficiently absorbs UV light. Accordingly, the photoactive compound has an improved ability to generate radicals and is efficiently photopolymerized with unsaturated bonds. Further provided is a photosensitive resin composition comprising the photoactive compound. The photosensitive resin composition has good sensitivity because it efficiently absorbs UV light. In addition, the photosensitive resin composition has excellent characteristics in terms of residual film ratio, mechanical strength and resistance to heat, chemicals and development. Therefore, the photosensitive resin composition is advantageously used in curing materials for column spacers, overcoats and passivation films of liquid crystal display devices. In addition, the photosensitive resin composition has excellent thermal processing characteristics.

Abstract translation: 提供了一种新的光敏化合物。 光活性化合物具有由式1表示的结构：其中R1，R2，R3，A，X，Y，n和m如说明书中所定义。 光敏化合物有效吸收紫外光。 因此，光活性化合物具有改善的产生自由基的能力，并且有效地用不饱和键光聚合。 还提供了包含光敏化合物的感光性树脂组合物。 感光性树脂组合物具有良好的灵敏度，因为它有效地吸收紫外光。 此外，感光性树脂组合物在残留膜比，机械强度和耐热性，化学品和显影方面具有优异的特性。 因此，感光性树脂组合物有利地用于液晶显示装置的柱间隔物，外涂层和钝化膜的固化材料中。 此外，感光性树脂组合物具有优异的热加工特性。

公开(公告)号：US20100112479A1

公开(公告)日：2010-05-06

申请号：US12588886

申请日：2009-10-30

Applicant: Keon Woo Lee ,  Raisa Kharbash ,  Chang Ho Cho ,  Sung Hyun Kim ,  Sang Kyu Kwak ,  Dong Kung Oh ,  Chang Soon Lee

Inventor： Keon Woo Lee ,  Raisa Kharbash ,  Chang Ho Cho ,  Sung Hyun Kim ,  Sang Kyu Kwak ,  Dong Kung Oh ,  Chang Soon Lee

IPC: G03F7/004 ,  C07D209/82

CPC classification number: C07D209/82 ,  G03F7/0007 ,  G03F7/031 ,  Y10S430/12 ,  Y10S430/121

Abstract: A photopolymerization initiator is provided. The photopolymerization initiator contains at least one unsaturated double bond and at least one oxime ester group in the molecule. The photopolymerization initiator comprises a compound represented by Formula 1 or 2: wherein R1 and R2 are each independently —CH3, —C2H5, —C3H7 or —C6H5; wherein R3, R4 and R5 are each independently —CH3, —C2H5, —C3H7 or —C6H5. Further provided is a photosensitive resin composition comprising the photopolymerization initiator. The use of the photosensitive resin composition in photolithography reduces the formation of volatile residue during post-development baking.

Abstract translation: 提供光聚合引发剂。 光聚合引发剂在分子中含有至少一个不饱和双键和至少一个肟酯基团。 光聚合引发剂包括由式1或2表示的化合物：其中R 1和R 2各自独立地是-CH 3，-C 2 H 5，-C 3 H 7或-C 6 H 5; 其中R3，R4和R5各自独立地是-CH3，-C2H5，-C3H7或-C6H5。 还提供了包含光聚合引发剂的感光性树脂组合物。 在光刻中使用感光性树脂组合物可减少后期显影烘烤时的挥发性残留物的形成。

公开(公告)号：US07449574B2

公开(公告)日：2008-11-11

申请号：US11593051

申请日：2006-11-06

Applicant: Sung Hyun Kim ,  Jeong Ae Yoon ,  Raisa Kharbash ,  Han Soo Kim ,  Xiang Li Li ,  Min Young Lim ,  Chang Ho Cho

Inventor： Sung Hyun Kim ,  Jeong Ae Yoon ,  Raisa Kharbash ,  Han Soo Kim ,  Xiang Li Li ,  Min Young Lim ,  Chang Ho Cho

IPC: C07D251/24 ,  C08F2/46 ,  G03C1/675 ,  G03C1/73

CPC classification number: C07D251/24 ,  C08F2/50 ,  G03F7/029 ,  Y10S430/121

Abstract: The present invention relates to a triazine based photoactive compound containing an oxime ester group.The compound according to the present invention is a photoactive compound containing both an oxime ester group and a triazine group in one molecule, has excellent radical-generating efficiency due to effective absorption of UV radiation, particularly i-line (365 nm) radiation and can function as an effective initiator for photopolymerization of various compounds containing unsaturated groups, particularly an acryl compound.

Abstract translation: 本发明涉及含有肟酯基的三嗪系光敏化合物。 根据本发明的化合物是在一个分子中含有肟酯基和三嗪基的光敏化合物，由于UV辐射的有效吸收，特别是i线（365nm）辐射，具有优异的自由基产生效率，并且可以 作为含有不饱和基团，特别是丙烯酸化合物的各种化合物的光聚合的有效引发剂。

公开(公告)号：US20140220491A1

公开(公告)日：2014-08-07

申请号：US14111166

申请日：2012-05-14

Applicant: Changho Cho ,  Won Jin Chung ,  Raisa Kharbash ,  Sunghyun Kim ,  Dongchang Choi ,  Sang Chul Lee ,  Han Soo Kim ,  Yoon Hee Heo ,  Sunhwa Kim

Inventor： Changho Cho ,  Won Jin Chung ,  Raisa Kharbash ,  Sunghyun Kim ,  Dongchang Choi ,  Sang Chul Lee ,  Han Soo Kim ,  Yoon Hee Heo ,  Sunhwa Kim

IPC: G03F7/004 ,  G03F7/038

CPC classification number: G03F7/0045 ,  G03F7/0007 ,  G03F7/029 ,  G03F7/032 ,  G03F7/033 ,  G03F7/0388

Abstract: The present invention relates to a photoactive compound having a novel structure and a photosensitive resin composition including the same, and the photoactive compound according to the present invention has excellent sensitivity due to efficient absorption to a UV light source by including a nitro group and a phosphonate structure, and has excellent retention rate, mechanical strength, heat resistance, chemical resistance and developing resistance by improving solubility of the photosensitive resin composition by excellent compatibility of the phosphonate structure and a binder resin. Therefore, the photosensitive resin composition according to the present invention is useful to cure a column spacer, an overcoat, a passivation material and the like of a liquid crystal display device, and is useful in view of a high temperature process property.

Abstract translation: 本发明涉及一种具有新颖结构的光敏化合物和含有它的光敏树脂组合物，本发明的光敏化合物由于通过包括硝基和膦酸盐对UV光源的有效吸收而具有优异的灵敏度 结构，并且通过优异的膦酸酯结构和粘合剂树脂的相容性改善感光性树脂组合物的溶解性，具有优异的保留率，机械强度，耐热性，耐化学性和耐显影性。 因此，根据本发明的感光性树脂组合物可用于固化液晶显示装置的柱间隔物，外涂层，钝化材料等，并且考虑到高温加工性能是有用的。

公开(公告)号：US08252507B2

公开(公告)日：2012-08-28

申请号：US12743373

申请日：2009-04-01

Applicant: Chang Ho Cho ,  Sung Hyun Kim ,  Raisa Kharbash ,  Keon Woo Lee ,  Sang Kyu Kwak ,  Dong Kung Oh ,  Chang Soon Lee ,  Kyoung Hoon Min

Inventor： Chang Ho Cho ,  Sung Hyun Kim ,  Raisa Kharbash ,  Keon Woo Lee ,  Sang Kyu Kwak ,  Dong Kung Oh ,  Chang Soon Lee ,  Kyoung Hoon Min

IPC: C07D209/82 ,  C08F2/48 ,  G03F7/028 ,  G03F7/033

CPC classification number: C07D405/12 ,  G03F7/031

Abstract: A novel photoactive compound is provided. The photoactive compound has a structure represented by Formula 1: wherein R1, R2, R3, A, X, Y, n and m are as defined in the specification. The photoactive compound efficiently absorbs UV light. Accordingly, the photoactive compound has an improved ability to generate radicals and is efficiently photopolymerized with unsaturated bonds. Further provided is a photosensitive resin composition comprising the photoactive compound. The photosensitive resin composition has good sensitivity because it efficiently absorbs UV light. In addition, the photosensitive resin composition has excellent characteristics in terms of residual film ratio, mechanical strength and resistance to heat, chemicals and development. Therefore, the photosensitive resin composition is advantageously used in curing materials for column spacers, overcoats and passivation films of liquid crystal display devices. In addition, the photosensitive resin composition has excellent thermal processing characteristics.

Abstract translation: 提供了一种新的光敏化合物。 光活性化合物具有由式1表示的结构：其中R1，R2，R3，A，X，Y，n和m如说明书中所定义。 光敏化合物有效吸收紫外光。 因此，光活性化合物具有改善的产生自由基的能力，并且有效地用不饱和键光聚合。 还提供了包含光敏化合物的感光性树脂组合物。 感光性树脂组合物具有良好的灵敏度，因为它有效地吸收紫外光。 此外，感光性树脂组合物在残留膜比，机械强度和耐热性，化学品和显影方面具有优异的特性。 因此，感光性树脂组合物有利地用于液晶显示装置的柱间隔物，外涂层和钝化膜的固化材料中。 此外，感光性树脂组合物具有优异的热加工特性。

公开(公告)号：US08182979B2

公开(公告)日：2012-05-22

申请号：US12588886

申请日：2009-10-30

Applicant: Keon Woo Lee ,  Raisa Kharbash ,  Chang Ho Cho ,  Sung Hyun Kim ,  Sang Kyu Kwak ,  Dong Kung Oh ,  Chang Soon Lee

Inventor： Keon Woo Lee ,  Raisa Kharbash ,  Chang Ho Cho ,  Sung Hyun Kim ,  Sang Kyu Kwak ,  Dong Kung Oh ,  Chang Soon Lee

IPC: C07D209/82 ,  C08F2/48 ,  G03F7/028 ,  G03F7/033

CPC classification number: C07D209/82 ,  G03F7/0007 ,  G03F7/031 ,  Y10S430/12 ,  Y10S430/121

Abstract: A photopolymerization initiator is provided. The photopolymerization initiator contains at least one unsaturated double bond and at least one oxime ester group in the molecule. The photopolymerization initiator comprises a compound represented by Formula 1 or 2: wherein R1 and R2 are each independently —CH3, —C2H5, —C3H7 or —C6H5; wherein R3, R4 and R5 are each independently —CH3, —C2H5, —C3H7 or —C6H5. Further provided is a photosensitive resin composition comprising the photopolymerization initiator. The use of the photosensitive resin composition in photolithography reduces the formation of volatile residue during post-development baking.

Abstract translation: 提供光聚合引发剂。 光聚合引发剂在分子中含有至少一个不饱和双键和至少一个肟酯基团。 光聚合引发剂包括由式1或2表示的化合物：其中R 1和R 2各自独立地是-CH 3，-C 2 H 5，-C 3 H 7或-C 6 H 5; 其中R3，R4和R5各自独立地是-CH3，-C2H5，-C3H7或-C6H5。 还提供了包含光聚合引发剂的感光性树脂组合物。 在光刻中使用感光性树脂组合物可减少后期显影烘烤时的挥发性残留物的形成。