公开(公告)号：US07027164B2

公开(公告)日：2006-04-11

申请号：US10651049

申请日：2003-08-29

申请人： Richard A. Gontin ,  Yuli Vladmirsky

发明人： Richard A. Gontin ,  Yuli Vladmirsky

IPC分类号： G01B9/02

CPC分类号： G01J9/0215 ,  G02B5/1838 ,  G03F7/706

摘要： A wavefront measurement system has a source of electromagnetic radiation. An imaging system focuses the electromagnetic radiation at an object plane. A first grating is positioned in the object plane and has a plurality of rulings with randomized height. A stage moves the first grating parallel to the rulings. A projection optical system projects an image of the first grating onto an image plane. A second grating is at the image plane. A detector behind the second grating receives a fringe pattern produced by the second grating.

摘要翻译： 波前测量系统具有电磁辐射源。 成像系统将电磁辐射聚焦在物体平面。 第一光栅位于物平面内并具有多个具有随机高度的刻线。 舞台将第一光栅平行于刻线。 投影光学系统将第一光栅的图像投影到图像平面上。 第二个光栅位于图像平面。 第二光栅后面的检测器接收由第二光栅产生的条纹图案。

公开(公告)号：US07164534B2

公开(公告)日：2007-01-16

申请号：US11183847

申请日：2005-07-19

申请人： Walter H. Augustyn ,  Richard A. Gontin

发明人： Walter H. Augustyn ,  Richard A. Gontin

IPC分类号： G02B5/18

CPC分类号： G03F7/706 ,  G02B5/1838

摘要： An electromagnetic radiation diffuser, operative at extreme ultraviolet (EUV) wavelengths, is fabricated on a substrate. The diffuser comprises a randomized structure having a peak and valley profile over which a highly reflective coating is formed. The reflective coating substantially takes the form of the peak and valley profile beneath it. An absorptive grating can be fabricated over the reflective coating. The grating spaces will diffusely reflect electromagnetic radiation because of the profile of the randomized structure beneath. The absorptive grating will absorb the electromagnetic radiation. The grating thus becomes a specialized Ronchi ruling that may be used for wavefront evaluation and other optical diagnostics in extremely short wavelength reflective lithography systems, such as EUV lithography systems.

摘要翻译： 在基板上制造在极紫外（EUV）波长下工作的电磁辐射漫射器。 扩散器包括具有峰和谷分布的随机化结构，在其上形成高反射涂层。 反射涂层基本上呈现在其下面的峰和谷轮廓的形式。 可以在反射涂层上制造吸收光栅。 由于下面的随机化结构的轮廓，光栅空间将漫反射电磁辐射。 吸收光栅将吸收电磁辐射。 因此，光栅成为专门的Ronchi规则，可用于波长极端评估和其他光学诊断技术在极短波长反射光刻系统（如EUV光刻系统）中。

公开(公告)号：US07826142B2

公开(公告)日：2010-11-02

申请号：US11117490

申请日：2005-04-29

申请人： Nora-Jean Harned ,  Richard A. Gontin ,  Robert D. Harned ,  Azat M. Latypov ,  Stanislav Y. Smirnov

发明人： Nora-Jean Harned ,  Richard A. Gontin ,  Robert D. Harned ,  Azat M. Latypov ,  Stanislav Y. Smirnov

IPC分类号： G02B3/00

CPC分类号： G02B27/0012

摘要： An embodiment of the present invention provides a method for designing optical surfaces. According to this method, m optical surfaces are defined, such that each successive optical surface receives a wavefront from a previous optical surface. Wavefront aberrations caused by each optical surface are calculated. The changes at each respective optical surface required to compensate for the wavefront aberration caused by the respective optical surfaces are then calculated. A desired optical profile for each of the m optical surfaces is determined in accordance with the calculated changes to each respective optical surface.

摘要翻译： 本发明的实施例提供了一种用于设计光学表面的方法。 根据该方法，定义m个光学表面，使得每个连续的光学表面从先前的光学表面接收波前。 计算由每个光学表面引起的波前像差。 然后计算补偿由各个光学表面引起的波前像差所需的每个相应的光学表面的变化。 根据对每个相应的光学表面的计算的改变来确定每个m个光学表面的期望的光学轮廓。

公开(公告)号：US4785169A

公开(公告)日：1988-11-15

申请号：US939905

申请日：1986-12-09

申请人： Richard A. Gontin

发明人： Richard A. Gontin

IPC分类号： G01S3/781 ,  G01S3/786 ,  G01J1/34

CPC分类号： G01S3/781 ,  G01S3/7868

摘要： A horizon sensor having a pair of adjacent infrared detectors which view the earth's horizon either statically or by scanning is provided with a second order radiance correction to reduce errors in determining the true position of the horizon due to radiance variations of the earth due to changes in latitude and seasons particularly at lower altitudes. The second order correction is empirically determined from a large number of horizon profiles, and in two illustrative examples for different types of sensors, the correction may be readily obtained from a linear function related to the peak radiance of the horizon profiles.

摘要翻译： 具有一对相邻红外检测器的水平传感器具有静态或扫描方式来观测地球的地平线，其具有二阶辐射校正，以减少由于地球的辐射变化而导致的地平线的真实位置的误差 纬度和季节特别是在较低的海拔地区。 从大量的水平分布图经验地确定二阶校正，并且在不同类型的传感器的两个说明性示例中，可以从与水平剖面的峰值辐射相关的线性函数容易地获得校正。

公开(公告)号：US07411687B2

公开(公告)日：2008-08-12

申请号：US11391378

申请日：2006-03-29

申请人： Richard A. Gontin ,  Yuli Vladimirsky

发明人： Richard A. Gontin ,  Yuli Vladimirsky

IPC分类号： G01B9/02

CPC分类号： G01J9/0215 ,  G02B5/1838 ,  G03F7/706

摘要： A wavefront measurement system has a source of electromagnetic radiation. An imaging system focuses the electromagnetic radiation at an object plane. A first grating is positioned in the object plane and has a plurality of rulings with randomized height. A stage moves the first grating parallel to the rulings. A projection optical system projects an image of the first grating onto an image plane. A second grating is at the image plane. A detector behind the second grating receives a fringe pattern produced by the second grating.

摘要翻译： 波前测量系统具有电磁辐射源。 成像系统将电磁辐射聚焦在物体平面。 第一光栅位于物平面内并具有多个具有随机高度的刻线。 舞台将第一光栅平行于刻线。 投影光学系统将第一光栅的图像投影到图像平面上。 第二个光栅位于图像平面。 第二光栅后面的检测器接收由第二光栅产生的条纹图案。

公开(公告)号：US07002747B2

公开(公告)日：2006-02-21

申请号：US10688923

申请日：2003-10-21

申请人： Walter H. Augustyn ,  Richard A Gontin

发明人： Walter H. Augustyn ,  Richard A Gontin

IPC分类号： G02B5/18

CPC分类号： G03F7/706 ,  G02B5/1838

摘要： An electromagnetic radiation diffuser, operative at extreme ultraviolet (EUV) wavelengths, is fabricated on a substrate. The diffuser comprises a randomized structure having a peak and valley profile over which a highly reflective coating is evaporated. The reflective coating substantially takes the form of the peak and valley profile beneath it. An absorptive grating is then fabricated over the reflective coating. The grating spaces will diffusely reflect electromagnetic radiation because of the profile of the randomized structure beneath. The absorptive grating will absorb the electromagnetic radiation. The grating thus becomes a specialized Ronchi ruling that may be used for wavefront evaluation and other optical diagnostics in extremely short wavelength reflective lithography systems, such as EUV lithography systems.

摘要翻译： 在基板上制造在极紫外（EUV）波长下工作的电磁辐射漫射器。 扩散器包括具有峰和谷分布的随机化结构，高反射涂层在其上蒸发。 反射涂层基本上呈现在其下面的峰和谷轮廓的形式。 然后在反射涂层上制造吸收光栅。 由于下面的随机化结构的轮廓，光栅空间将漫反射电磁辐射。 吸收光栅将吸收电磁辐射。 因此，光栅成为专门的Ronchi规则，可用于波长极端评估和其他光学诊断技术在极短波长反射光刻系统（如EUV光刻系统）中。