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1.发明授权公开(公告)号：US07826142B2
公开(公告)日：2010-11-02
申请号：US11117490
申请日：2005-04-29
申请人： Nora-Jean Harned , Richard A. Gontin , Robert D. Harned , Azat M. Latypov , Stanislav Y. Smirnov
发明人： Nora-Jean Harned , Richard A. Gontin , Robert D. Harned , Azat M. Latypov , Stanislav Y. Smirnov
IPC分类号： G02B3/00
CPC分类号： G02B27/0012
摘要： An embodiment of the present invention provides a method for designing optical surfaces. According to this method, m optical surfaces are defined, such that each successive optical surface receives a wavefront from a previous optical surface. Wavefront aberrations caused by each optical surface are calculated. The changes at each respective optical surface required to compensate for the wavefront aberration caused by the respective optical surfaces are then calculated. A desired optical profile for each of the m optical surfaces is determined in accordance with the calculated changes to each respective optical surface.
摘要翻译： 本发明的实施例提供了一种用于设计光学表面的方法。 根据该方法，定义m个光学表面，使得每个连续的光学表面从先前的光学表面接收波前。 计算由每个光学表面引起的波前像差。 然后计算补偿由各个光学表面引起的波前像差所需的每个相应的光学表面的变化。 根据对每个相应的光学表面的计算的改变来确定每个m个光学表面的期望的光学轮廓。
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公开(公告)号：US20080079950A1
公开(公告)日：2008-04-03
申请号：US11540674
申请日：2006-10-02
申请人： Nora-Jean Harned , Robert D. Harned
发明人： Nora-Jean Harned , Robert D. Harned
IPC分类号： G01B11/02
CPC分类号： G01B11/2441 , G01J2009/0223 , G01M11/005 , G01M11/025 , G01M11/0264 , G01M11/0271
摘要： The present invention is directed to a system and method for using a spatial light modulator (SLM) to perform a null test of an (aspheric) optical surface. In an embodiment, such a system includes an interferometer, an optical element, and an SLM. The interferometer provides electromagnetic radiation. The optical element conditions the electromagnetic radiation to provide a first beam of radiation and a second beam of radiation. The SLM shapes a wavefront of the first beam of radiation resulting in a shaped wavefront corresponding to an optical surface. The shaped wavefront is incident on and conditioned by the optical surface. The shape of the optical surface is analyzed based on a fringe pattern resulting from interference between the shaped wavefront mapped by the optical surface and the second beam of radiation. The system may also include an optical design module that converts a null corrector design corresponding to the optical surface into instructions for the SLM.
摘要翻译： 本发明涉及一种使用空间光调制器（SLM）来执行（非球面）光学表面的空试验的系统和方法。 在一个实施例中，这样的系统包括干涉仪，光学元件和SLM。 干涉仪提供电磁辐射。 光学元件调节电磁辐射以提供第一辐射束和第二辐射束。 SLM形成第一辐射束的波前，产生对应于光学表面的成形波前。 成形的波前入射到光学表面并由光学表面调节。 基于由光学表面映射的成形波前与第二辐射束之间的干涉导致的条纹图案来分析光学表面的形状。 该系统还可以包括光学设计模块，其将对应于光学表面的空校正器设计转换成针对SLM的指令。
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公开(公告)号：US07443514B2
公开(公告)日：2008-10-28
申请号：US11540674
申请日：2006-10-02
申请人： Nora-Jean Harned , Robert D. Harned
发明人： Nora-Jean Harned , Robert D. Harned
CPC分类号： G01B11/2441 , G01J2009/0223 , G01M11/005 , G01M11/025 , G01M11/0264 , G01M11/0271
摘要： The present invention is directed to a system and method for using a spatial light modulator (SLM) to perform a null test of an (aspheric) optical surface. In an embodiment, such a system includes an interferometer, an optical element, and an SLM. The interferometer provides electromagnetic radiation. The optical element conditions the electromagnetic radiation to provide a first beam of radiation and a second beam of radiation. The SLM shapes a wavefront of the first beam of radiation resulting in a shaped wavefront corresponding to an optical surface. The shaped wavefront is incident on and conditioned by the optical surface. The shape of the optical surface is analyzed based on a fringe pattern resulting from interference between the shaped wavefront mapped by the optical surface and the second beam of radiation. The system may also include an optical design module that converts a null corrector design corresponding to the optical surface into instructions for the SLM.
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4.发明授权Lithographic apparatus having an adjustable projection system and device manufacturing method 有权具有可调投影系统和装置制造方法的平版印刷装置公开(公告)号：US07184124B2
公开(公告)日：2007-02-27
申请号：US10975086
申请日：2004-10-28
CPC分类号： G03F7/70233 , G03F7/70266 , G03F7/70591
摘要： A system and method use a pattern generator to pattern illumination that is projected using an adjustable projection system to form one or more devices on a substrate. The adjustable projection system includes at least one active mirror, which is adjusted to compensate for errors found on a surface of the pattern generator, the substrate, and or an optical element in the lithography system. In one example, the adjustable projection system includes two concave and one convex mirrors, while in another system the adjustable projection system also includes one or two fold mirrors. At least one of the mirrors in these two examples is an active mirror, which is used for the compensating. In this arrangement, local focus and/or magnification errors can be substantially reduced or eliminated.
摘要翻译： 一种系统和方法使用图案发生器来对使用可调投影系统投影的照明进行图案化以在基板上形成一个或多个装置。 可调节投影系统包括至少一个有源反射镜，其被调节以补偿在图案发生器，基板和光刻系统中的光学元件的表面上发现的错误。 在一个示例中，可调节投影系统包括两个凹面和一个凸面镜，而在另一个系统中，可调投影系统还包括一个或两个折叠镜。 这两个示例中的至少一个反射镜是用于补偿的主动镜。 在这种布置中，可以显着地减少或消除局部焦点和/或放大误差。
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公开(公告)号：US07426076B2
公开(公告)日：2008-09-16
申请号：US11019672
申请日：2004-12-23
CPC分类号： G03F7/70275 , G02B17/002 , G02B17/008 , G02B17/0812 , G03F7/70233
摘要： A projection system for a lithographic apparatus having a plurality of mirror imaging systems. In an embodiment, the mirror imaging systems are arranged in two rows with each row being perpendicular to a scanning direction of the projection system. Each mirror imaging systems has an associated imaging field. The mirror imaging systems are arranged in a manner that precludes gaps between adjacent imaging fields in the scanning direction. Each mirror imaging system includes a concave mirror and a convex mirror arranged concentrically with the concave mirror. The concave mirrors have a first mirror portion and a second mirror portion that are independently movable. In one embodiment, each of the mirror imaging systems has an associated phase, and the mirror imaging systems in one row are positioned 180 degrees out of phase with the mirror imaging systems in the other row.
摘要翻译： 一种用于具有多个镜像成像系统的光刻设备的投影系统。 在一个实施例中，镜像成像系统布置成两行，每行垂直于投影系统的扫描方向。 每个镜像成像系统都具有相关的成像领域。 镜像成像系统以排除扫描方向上的相邻成像场之间的间隙的方式排列。 每个镜像成像系统包括与凹面镜同心地布置的凹面镜和凸面镜。 凹面镜具有可独立移动的第一反射镜部分和第二反射镜部分。 在一个实施例中，每个镜像成像系统具有相关联的相位，并且一行中的镜像成像系统与另一行中的镜像成像系统定位成180度异相。
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6.发明授权Optical system alignment system and method with high accuracy and simple operation 有权光学系统对准系统及方法精度高，操作简单公开(公告)号：US07224469B2
公开(公告)日：2007-05-29
申请号：US10938954
申请日：2004-09-13
申请人： Robert D. Harned , Nora-Jean Harned
发明人： Robert D. Harned , Nora-Jean Harned
IPC分类号： G01B9/02
CPC分类号： G01B11/272
摘要： A system for aligning of optical components includes an interferometer and a first diffractive alignment element. A housing is used for positioning a first optical element being aligned. A detector is used for detecting fringes produced by reflections off surfaces of the first optical element. A grating pattern on the first diffractive alignment element is designed to produce a retro-reflected wavefront or a wavefront transmitted or reflected in a predetermined direction when the first optical element is in alignment. The first diffractive alignment element includes a first region for alignment of the interferometer, a second region for alignment of one surface of the first optical element, and a third region for alignment of another surface of the first optical element. The first, second and third regions can be of any shape such as circular, rectangular, triangular, or the like.
摘要翻译： 用于对准光学部件的系统包括干涉仪和第一衍射对准元件。 壳体用于定位正对准的第一光学元件。 检测器用于检测由第一光学元件的表面反射产生的条纹。 第一衍射对准元件上的光栅图案被设计成当第一光学元件对准时产生沿预定方向透射或反射的反射反射波前或波阵面。 第一衍射对准元件包括用于对准干涉仪的第一区域，用于对准第一光学元件的一个表面的第二区域和用于对准第一光学元件的另一个表面的第三区域。 第一，第二和第三区域可以是任何形状，例如圆形，矩形，三角形等。
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公开(公告)号：US20060139745A1
公开(公告)日：2006-06-29
申请号：US11019672
申请日：2004-12-23
IPC分类号： G02B7/182
CPC分类号： G03F7/70275 , G02B17/002 , G02B17/008 , G02B17/0812 , G03F7/70233
摘要： A projection system for a lithographic apparatus having a plurality of mirror imaging systems. In an embodiment, the mirror imaging systems are arranged in two rows with each row being perpendicular to a scanning direction of the projection system. Each mirror imaging systems has an associated imaging field. The mirror imaging systems are arranged in a manner that precludes gaps between adjacent imaging fields in the scanning direction. Each mirror imaging system includes a concave mirror and a convex mirror arranged concentrically with the concave mirror. The concave mirrors have a first mirror portion and a second mirror portion that are independently movable. In one embodiment, each of the mirror imaging systems has an associated phase, and the mirror imaging systems in one row are positioned 180 degrees out of phase with the mirror imaging systems in the other row.
摘要翻译： 一种用于具有多个镜像成像系统的光刻设备的投影系统。 在一个实施例中，镜像成像系统布置成两行，每行垂直于投影系统的扫描方向。 每个镜像成像系统都具有相关的成像领域。 镜像成像系统以排除扫描方向上的相邻成像场之间的间隙的方式排列。 每个镜像成像系统包括与凹面镜同心地布置的凹面镜和凸面镜。 凹面镜具有可独立移动的第一反射镜部分和第二反射镜部分。 在一个实施例中，每个镜像成像系统具有相关联的相位，并且一行中的镜像成像系统与另一行中的镜像成像系统定位成180度异相。
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8.发明申请Lithographic apparatus having an adjustable projection system and device manufacturing method 有权具有可调投影系统和装置制造方法的平版印刷装置公开(公告)号：US20060092393A1
公开(公告)日：2006-05-04
申请号：US10975086
申请日：2004-10-28
申请人： Robert Harmed , Cheng-Qun Gui , Nora-Jean Harned
发明人： Robert Harmed , Cheng-Qun Gui , Nora-Jean Harned
IPC分类号： G03B27/42
CPC分类号： G03F7/70233 , G03F7/70266 , G03F7/70591
摘要： A system and method use a pattern generator to pattern illumination that is projected using an adjustable projection system to form one or more devices on a substrate. The adjustable projection system includes at least one active mirror, which is adjusted to compensate for errors found on a surface of the pattern generator, the substrate, and or an optical element in the lithography system. In one example, the adjustable projection system includes two concave and one convex mirrors, while in another system the adjustable projection system also includes one or two fold mirrors. At least one of the mirrors in these two examples is an active mirror, which is used for the compensating. In this arrangement, local focus and/or magnification errors can be substantially reduced or eliminated.
摘要翻译： 一种系统和方法使用图案发生器来对使用可调投影系统投影的照明进行图案化以在基板上形成一个或多个装置。 可调节投影系统包括至少一个有源反射镜，其被调节以补偿在图案发生器，基板和光刻系统中的光学元件的表面上发现的错误。 在一个示例中，可调节投影系统包括两个凹面和一个凸面镜，而在另一个系统中，可调投影系统还包括一个或两个折叠镜。 这两个示例中的至少一个反射镜是用于补偿的主动镜。 在这种布置中，可以显着地减少或消除局部焦点和/或放大误差。
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9.发明申请Optical system alignment system and method with high accuracy and simple operation 有权光学系统对准系统及方法精度高，操作简单公开(公告)号：US20050206908A1
公开(公告)日：2005-09-22
申请号：US10938954
申请日：2004-09-13
申请人： Robert Harned , Nora-Jean Harned
发明人： Robert Harned , Nora-Jean Harned
CPC分类号： G01B11/272
摘要： A system for aligning of optical components includes an interferometer and a first diffractive alignment element. A housing is used for positioning a first optical element being aligned. A detector is used for detecting fringes produced by reflections off surfaces of the first optical element. A grating pattern on the first diffractive alignment element is designed to produce a retro-reflected wavefront or a wavefront transmitted or reflected in a predetermined direction when the first optical element is in alignment. The first diffractive alignment element includes a first region for alignment of the interferometer, a second region for alignment of one surface of the first optical element, and a third region for alignment of another surface of the first optical element. The first, second and third regions can be of any shape such as circular, rectangular, triangular, or the like.
摘要翻译： 用于对准光学部件的系统包括干涉仪和第一衍射对准元件。 壳体用于定位正对准的第一光学元件。 检测器用于检测由第一光学元件的表面反射产生的条纹。 第一衍射对准元件上的光栅图案被设计成当第一光学元件对准时产生沿预定方向透射或反射的反射反射波前或波阵面。 第一衍射对准元件包括用于对准干涉仪的第一区域，用于对准第一光学元件的一个表面的第二区域和用于对准第一光学元件的另一个表面的第三区域。 第一，第二和第三区域可以是任何形状，例如圆形，矩形，三角形等。
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公开(公告)号：US20120171600A1
公开(公告)日：2012-07-05
申请号：US13378811
申请日：2010-07-16
申请人： Eric Brian Catey , Nora-Jean Harned , Yevgeniy Konstantinovich Shmarev , Robert Albert Tharaldsen , Richard David Jacobs
发明人： Eric Brian Catey , Nora-Jean Harned , Yevgeniy Konstantinovich Shmarev , Robert Albert Tharaldsen , Richard David Jacobs
CPC分类号： G03F1/84 , G03F7/7065
摘要： Disclosed are systems and methods for time differential reticle inspection. Contamination is detected by, for example, determining a difference between a first signature of at least a portion of a reticle and a second signature, produced subsequent to the first signature, of the portion of the reticle.
摘要翻译： 公开了用于时差标线检查的系统和方法。 通过例如确定掩模版的至少一部分的第一签名与第一签名之后产生的第二签名之间的差异来检测污染物。
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