摘要:
Disclosed is a method for the detection and quantification of defects in transparent substrates and, more particularly, in glass sheets. The method comprises providing a transparent planar substrate having a top surface and a bottom surface. The surface topography of at least a portion of the top surface of the provide transparent planar substrate is measured to obtain a three dimensional top surface profile having a sub-nanometer level of precision. From the three dimensional surface profile measurement, the existence of one or more surface variations in the three dimensional surface profile having an amplitude greater than a predetermined tolerance can be identified and/or quantified.
摘要:
An apparatus (2) and method, for measuring process-induced features in a transparent sheet (10). The apparatus includes a light source (100), an imaging device (80), and a support structure (30) disposed between the light source and the imaging device. The support structure is configured and arranged to support the transparent sheet so that measurement error induced by the support structure is viewed by the imaging device as extending along or parallel to a first axis (46, 54) that is oblique to a second axis (22, 24) along or parallel to which the process-induced features in the transparent sheet extend when viewed by the imaging device.