公开(公告)号：US06730175B2

公开(公告)日：2004-05-04

申请号：US10055634

申请日：2002-01-22

申请人： Joseph Yudovsky ,  Salvador P. Umotoy ,  Shamouil Shamouilian ,  Ron Rose ,  Rita Dukes ,  Xiaoxiong Yuan

发明人： Joseph Yudovsky ,  Salvador P. Umotoy ,  Shamouil Shamouilian ,  Ron Rose ,  Rita Dukes ,  Xiaoxiong Yuan

IPC分类号： H01L2100

CPC分类号： C23C16/45521 ,  C23C16/4581 ,  C23C16/4586 ,  H01J2237/2001 ,  H01L21/67092

摘要： A substrate support assembly for supporting a substrate during processing is provided. In one embodiment, a support assembly includes a ceramic body having an embedded heating element and a base plate. The base plate and the ceramic body define a channel therebetween adapted to supply purge gas to a perimeter of a substrate disposed on the support assembly. The base plate is fastened to the body by brazing, adhering, fastening, press fitting or by mating engaging portions of a retention device such as a bayonet fitting.

摘要翻译： 提供了一种用于在处理期间支撑基板的基板支撑组件。 在一个实施例中，支撑组件包括具有嵌入式加热元件和基板的陶瓷体。 基板和陶瓷体在它们之间限定了一个通道，用于将净化气体供应到设置在支撑组件上的基板的周边。 基板通过钎焊，粘合，紧固，压配合或通过配合诸如卡口配件的保持装置的接合部分而紧固到主体。

公开(公告)号：US06494955B1

公开(公告)日：2002-12-17

申请号：US09596854

申请日：2000-06-19

申请人： Lawrence Chung-Lai Lei ,  Sal Umotoy ,  Xiaoxiong Yuan ,  Anzhong Chang ,  Hongbee Teoh ,  Anh N. Nguyen ,  Ron Rose

发明人： Lawrence Chung-Lai Lei ,  Sal Umotoy ,  Xiaoxiong Yuan ,  Anzhong Chang ,  Hongbee Teoh ,  Anh N. Nguyen ,  Ron Rose

IPC分类号： H01L21205

CPC分类号： C23C16/45521 ,  C23C16/4581 ,  C23C16/4586 ,  H01L21/67017 ,  H01L21/68721 ,  H01L21/68735 ,  H01L21/6875 ,  H01L21/68785 ,  H01L21/68792

摘要： A substrate support assembly for supporting a substrate during processing is provided. In one embodiment, a support assembly includes a top ceramic plate having a first side, a bottom ceramic plate having a first side and an embedded electrode, the first side of the bottom plate fused to the first side of the top plate defining a channel therebetween. In another embodiment, a support assembly includes a first plate having a first side and second side. A ring is disposed on the first side. A stepped surface is formed on the first side radially inward of the ring. A second plate is connected to the second side of the first plate.

摘要翻译： 提供了一种用于在处理期间支撑基板的基板支撑组件。 在一个实施例中，支撑组件包括具有第一侧的顶部陶瓷板，具有第一侧和嵌入电极的底部陶瓷板，底板的与顶板的第一侧熔合的第一侧在其间限定通道 。 在另一个实施例中，支撑组件包括具有第一侧面和第二侧面的第一板。 环设在第一侧。 在环的径向内侧的第一侧上形成台阶面。 第二板连接到第一板的第二侧。