Apparatus and method for washing substrate
    1.
    发明授权
    Apparatus and method for washing substrate 失效
    洗涤基材的设备和方法

    公开(公告)号:US6059891A

    公开(公告)日:2000-05-09

    申请号:US120551

    申请日:1998-07-22

    摘要: An apparatus for washing a substrate comprises a spin chuck for holding and rotating a substrate, washing brush mechanism for supplying a washing liquid onto a surface of the substrate held on the spin chuck, and applying a physical force to contaminants present on a surface of the substrate so as to remove contaminants, a supporting arm for supporting the washing brush mechanism, an arm driving mechanism for driving the supporting arm to move the washing means along the surface from a central portion toward a peripheral portion of the substrate, and a control device for controlling the operation of at least one of the washing means, the spin chuck and the arm driving mechanism so as to control the physical force acting on the contaminants present on the surface of the substrate depending on the state of the contaminants.

    摘要翻译: 用于洗涤基板的装置包括用于保持和旋转基板的旋转卡盘,用于将洗涤液供给到保持在旋转卡盘上的基板的表面上的洗涤刷机构,并且对存在于旋转卡盘的表面上的污染物施加物理力 基板,以去除污染物,用于支撑洗涤刷机构的支撑臂,用于驱动支撑臂以使洗涤装置沿基板的中心部分朝向基板的周边部分的表面移动的臂驱动机构,以及控制装置 用于控制洗涤装置,旋转卡盘和臂驱动机构中的至少一个的操作,以便根据污染物的状态来控制作用在基板表面上的污染物的物理力。