公开(公告)号：US20070011875A1

公开(公告)日：2007-01-18

申请号：US10568341

申请日：2005-06-27

申请人： Masahiko Kubota ,  Takumi Suzuki ,  Tamaki Sato ,  Ryoji Kani ,  Maki Hatta ,  Kazuhiro Asai ,  Shoji Shiba ,  Hiroe Ishikura ,  Akihiko Okano

发明人： Masahiko Kubota ,  Takumi Suzuki ,  Tamaki Sato ,  Ryoji Kani ,  Maki Hatta ,  Kazuhiro Asai ,  Shoji Shiba ,  Hiroe Ishikura ,  Akihiko Okano

IPC分类号： B21D53/76

CPC分类号： B41J2/1603 ,  B41J2/1404 ,  B41J2/1628 ,  B41J2/1629 ,  B41J2/1631 ,  B41J2/1632 ,  B41J2/1634 ,  B41J2/1639 ,  B41J2/1645 ,  B41J2202/11 ,  G03F7/095 ,  Y10T29/49401

摘要： A method for manufacturing a minute structure comprises a step of forming an ionizing radiation decomposing type positive type resist layer including a methyl isopropenyl ketone as a first positive type photosensitive material layer, a step of forming an ionizing radiation decomposing type positive type resist layer including a photosensitive material of a copolymer as a second positive type photosensitive material layer to be sensitized by an ionizing radiation of a second wavelength range on the first positive type photosensitive material layer, a step of forming a desired pattern in the above-mentioned second positive type photosensitive material layer, and development using a developing solution, and then, a step of forming a desired pattern in the above-mentioned first positive type photosensitive material layer to form a convex shape pattern.

摘要翻译： 微细结构体的制造方法包括形成电离辐射分解型正型抗蚀剂层的步骤，该电离辐射分解型正型抗蚀剂层包括甲基异丙烯基酮作为第一正型感光材料层，形成电离辐射分解型正型抗蚀剂层的步骤包括 作为通过第一正型感光材料层上的第二波长范围的电离辐射致敏的作为第二正型感光材料层的共聚物的感光材料，在上述第二正型感光材料层中形成所需图案的步骤 材料层和使用显影溶液的显影，然后，在上述第一正型感光材料层中形成所需图案以形成凸形图案的步骤。