摘要:
A method of manufacturing a display device includes forming a gate electrode on a substrate, a gate insulating layer on the gate electrode, and an active layer on the gate insulating layer, the gate electrode made of extrinsic polycrystalline silicon, the active layer made of intrinsic polycrystalline silicon; forming an etch stopper on the active layer; forming source and drain electrodes spaced apart from each other on the etch stopper; forming an ohmic contact layer each between a side of the active layer and the source electrode and between an opposing side of the active layer and the drain electrode; forming a gate line connected to the gate electrode; and forming a data line crossing the gate line.
摘要:
A method of manufacturing a display device includes forming a gate electrode on a substrate, a gate insulating layer on the gate electrode, and an active layer on the gate insulating layer, the gate electrode made of extrinsic polycrystalline silicon, the active layer made of intrinsic polycrystalline silicon; forming an etch stopper on the active layer; forming source and drain electrodes spaced apart from each other on the etch stopper; forming an ohmic contact layer each between a side of the active layer and the source electrode and between an opposing side of the active layer and the drain electrode; forming a gate line connected to the gate electrode; and forming a data line crossing the gate line.
摘要:
A light emitting device and a method of manufacturing the same are provided. The light emitting device comprises a substrate, a gate electrode positioned on the substrate, a first insulating layer positioned on the substrate comprising the gate electrode, an amorphous silicon layer positioned on the first insulating layer so that a predetermined area thereof corresponds to the gate electrode, ohmic layers that positioned on a predetermined area of the amorphous silicon layer, the ohmic layers defining a source area and a drain area, a source electrode or a drain electrode electrically connected to any one of the ohmic layers and a cathode that is electrically connected to the other one of the ohmic layers, a second insulating layer positioned on the substrate comprising the source electrode or the drain electrode and the cathode, the second insulating layer comprising an opening exposing a portion of the cathode, an emitting layer positioned within the opening, and an anode positioned on the substrate comprising the emitting layer.
摘要:
A multi-domain liquid crystal display device includes first and second substrates facing each other and a liquid crystal layer between the first and second substrates. A plurality of gate bus lines are arranged in a first direction on the first substrate and a plurality of data bus lines are arranged in a second direction on the first substrate to define a pixel region. A pixel electrode is electrically charged through the data bus line in the pixel region. A common-auxiliary electrode surrounds the pixel electrode on a same layer whereon the gate bus line is formed.
摘要:
Multi-domain liquid crystal display including a first substrates and a second substrate, a liquid crystal layer between the first and second substrates, a plurality of gatelines and datalines on the first substrate crossed each other at fixed intervals, a pixel electrode in each of pixel regions formed between the gatelines and the datalines, a supplementary electrode around each of the pixel electrodes in the same layer with the pixel electrodes, at least one field induction window in each of the pixel regions, and an optical orientation film formed at least one of the first and second substrates.
摘要:
An organic light emitting display and a method of fabricating the same are provided. The organic light emitting display includes: a substrate having a plurality of pixel regions; a thin film transistor formed at each pixel region of the substrate and including a semiconductor layer, a gate electrode, and source and drain electrodes; a color filter layer formed on the transistor at each pixel region; a first electrode patterned to be in contact with one of the source and drain electrodes of the thin film transistor through a via-hole in the color filter layer; a pixel defining layer having an opening formed to expose a portion of the first electrode; an emission layer formed on the exposed first electrode; and a second electrode formed on the emission layer over the substrate. Therefore, it is possible to simplify the process by forming the color filter layers between the thin film transistor and the first electrode, without a passivation layer, increase process stability by increasing alignment margin between upper and lower substrates when the color filter layer is adhered, and facilitate top and bottom emission.
摘要:
An in-plane switching mode liquid crystal display device comprises first and second substrates, a plurality of gate and data bus lines defining pixel regions and arranged on the first substrate, a plurality of data electrodes on same plane of the data bus lines these some parts are overlapped with adjacent gate bus line, a passivation layer on the data electrodes, a plurality of common electrodes on the passivation layer these some parts are overlapped with adjacent data electrodes, and a liquid crystal layer between the first and second substrates.
摘要:
An in-plane switching mode liquid crystal display device includes first and second substrates. A plurality of gate and data bus lines define pixel regions and arranged on the first substrate. A plurality of thin film transistors are adjacent respective cross points of the gate and data bus lines. A plurality of gate electrodes are connected to said gate bus lines. A gate insulator is on the gate electrodes and a first metal layer includes a plurality of first electrodes on the gate insulator. A passivation layer is on the first metal layer. A transparent second metal layer includes a plurality of second electrodes on the passivation layer, the first and second electrodes applying plane electric fields.
摘要:
A thin film transistor is fabricated by introducing a dopant into an indium tin oxide layer or a gate insulating layer by an ion shower doping technique. An a-Si semiconductor layer is then deposited on the surface of the substrate and subjected to a single exposure of laser light. The laser exposure or annealing diffuses dopant into the semiconductor layer and activates the dopant to form an ohmic layer of n-type or p-type conductivity polysilicon, and an intrinsic polysilicon layer. A metal layer and an indium tin oxide layer are formed to the side of a gate electrode to maintain an electrical connection even if a break is formed in the data bus line.
摘要:
A method of manufacturing a display device includes forming a gate electrode on a substrate, a gate insulating layer on the gate electrode, and an active layer on the gate insulating layer, the gate electrode made of extrinsic polycrystalline silicon, the active layer made of intrinsic polycrystalline silicon; forming an etch stopper on the active layer; forming source and drain electrodes spaced apart from each other on the etch stopper; forming an ohmic contact layer each between a side of the active layer and the source electrode and between an opposing side of the active layer and the drain electrode; forming a gate line connected to the gate electrode; and forming a data line crossing the gate line.