Method for processing multi-component liquid mixtures and device for carrying out said method
    1.
    发明申请
    Method for processing multi-component liquid mixtures and device for carrying out said method 失效
    用于处理多组分液体混合物的方法和用于执行所述方法的装置

    公开(公告)号:US20050061652A1

    公开(公告)日:2005-03-24

    申请号:US10500206

    申请日:2002-12-27

    摘要: The present group of inventions relates to processing of multi-component liquid mixtures (MCLM) employing reforming process, preferably for vacuum distillation of hydrocarbon mixtures and can be applied in petroleum refining and chemical industries. The group of invention comprises the method for processing of multi-component liquid mixtures and the plant for its implementation The claimed method of MCLM separation comprises pressurized feeding of hydrocarbon liquid mixture to an ejector nozzle with its further discharging to a vacuum chamber. The novel feature of the method is creation of additional counterpressure jointly with the ejector providing for concentration of power in the vacuum chamber to form a pressure surge. The claimed plant for MCLM processing comprises a feeding pump, a head delivery main, a discharge main, control instrumentation and an evacuating device comprising a horizontal vacuum chamber. The novel feature of the plant is embodiment of the evacuating device as a hydraulic/gas ejector, integrated into the front end wall of the vacuum chamber, the length of which exceeds its cavity diameter by the factor 7 to 10, this plant further comprising a counterpressure regulator connected through a pipeline to the rear end wall of the vacuum chamber, and a vacuum pressure gauge connected to the vacuum chamber in the latter's front section.

    摘要翻译: 本发明组合涉及使用重整过程的多组分液体混合物(MCLM)的加工,优选用于烃混合物的真空蒸馏,并可应用于石油炼制和化学工业。 本发明的组合包括多组分液体混合物的处理方法和用于其实施的设备。所要求的MCLM分离方法包括将碳氢化合物液体混合物加压进料到喷射器喷嘴,并进一步向真空室排出。 该方法的新颖特征是与喷射器联合地产生额外的反压力,提供真空室中的功率集中以形成压力浪涌。 所要求的用于MCLM处理的设备包括供给泵,头部输送主体,排出主体,控制仪器和包括水平真空室的抽空装置。 该设备的新颖特征是作为液压/气体喷射器的排气装置的实施例,其集成到真空室的前端壁中,其长度超过其空腔直径乘以因子7至10,该设备还包括 反压力调节器通过管道连接到真空室的后端壁,以及真空压力表连接到后者前部的真空室。