Integrated circuit structure and method of forming the same
    1.
    发明授权
    Integrated circuit structure and method of forming the same 有权
    集成电路结构及其形成方法

    公开(公告)号:US08736015B2

    公开(公告)日:2014-05-27

    申请号:US13246495

    申请日:2011-09-27

    IPC分类号: H01L29/06

    CPC分类号: H01L27/0251

    摘要: An embodiment is an integrated circuit (IC) structure. The structure comprises a deep n well in a substrate, a first pickup device in the deep n well, a first signal device in the deep n well, a dissipation device in the substrate, a second signal device in the substrate, a first electrical path between the first pickup device and the dissipation device, and a second electrical path between the first signal device and the second signal device. The dissipation device is outside of the deep n well, and the second signal device is outside of the deep n well. A highest point of the first electrical path is lower than a highest point of the second electrical path.

    摘要翻译: 一个实施例是集成电路(IC)结构。 该结构包括衬底中的深n阱,深n阱中的第一拾取装置,深n阱中的第一信号装置,衬底中的耗散装置,衬底中的第二信号装置,第一电路 在第一拾取装置和耗散装置之间,以及在第一信号装置和第二信号装置之间的第二电路径。 耗散装置在深n井外,第二信号装置在深n井外。 第一电路的最高点低于第二电路的最高点。

    Integrated Circuit Structure and Method of Forming the Same
    2.
    发明申请
    Integrated Circuit Structure and Method of Forming the Same 有权
    集成电路结构及其形成方法

    公开(公告)号:US20130075856A1

    公开(公告)日:2013-03-28

    申请号:US13246495

    申请日:2011-09-27

    IPC分类号: H01L29/06

    CPC分类号: H01L27/0251

    摘要: An embodiment is an integrated circuit (IC) structure. The structure comprises a deep n well in a substrate, a first pickup device in the deep n well, a first signal device in the deep n well, a dissipation device in the substrate, a second signal device in the substrate, a first electrical path between the first pickup device and the dissipation device, and a second electrical path between the first signal device and the second signal device. The dissipation device is outside of the deep n well, and the second signal device is outside of the deep n well. A highest point of the first electrical path is lower than a highest point of the second electrical path.

    摘要翻译: 一个实施例是集成电路(IC)结构。 该结构包括衬底中的深n阱,深n阱中的第一拾取装置,深n阱中的第一信号装置,衬底中的耗散装置,衬底中的第二信号装置,第一电路 在第一拾取装置和耗散装置之间,以及在第一信号装置和第二信号装置之间的第二电路径。 耗散装置在深n井外,第二信号装置在深n井外。 第一电路的最高点低于第二电路的最高点。