摘要:
A method and apparatus are provided for implementing Advanced Process Control (APC) for enhanced electrical, magnetic, or physical properties process output control using a sequential segmented interleaving algorithm. The sequential segmented interleaving algorithm includes two tuning equations running in parallel. A deposition time is calculated after a production run based upon the relationship between the electrical, magnetic, or physical properties process output and deposition time process input. A deposition rate offset value is calculated after a calibration run based upon the relationship between a calibration deposition thickness process output and an updated deposition time process input calculated after a last production run.
摘要:
A method and apparatus are provided for implementing Advanced Process Control (APC) for enhanced electrical, magnetic, or physical properties process output control using a sequential segmented interleaving algorithm. The sequential segmented interleaving algorithm includes two tuning equations running in parallel. A deposition time is calculated after a production run based upon the relationship between the electrical, magnetic, or physical properties process output and deposition time process input. A deposition rate offset value is calculated after a calibration run based upon the relationship between a calibration deposition thickness process output and an updated deposition time process input calculated after a last production run.