公开(公告)号：US07077533B2

公开(公告)日：2006-07-18

申请号：US10477772

申请日：2002-05-28

Applicant: Martin Weiser ,  Udo Dinger ,  Siegfried Stacklies ,  Markus Haidl

Inventor： Martin Weiser ,  Udo Dinger ,  Siegfried Stacklies ,  Markus Haidl

IPC: G02B5/08

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  G03F1/24 ,  G03F7/2008 ,  G03F7/70958 ,  G21K1/06

Abstract: A device serves for reflecting electromagnetic waves, in particular in a length range less than 200 nm. It has a mirror carrier made of a material with at least approximately vanishing thermal expansion and at least one reflective layer applied on said mirror carrier. An intermediate layer made of a material which is formed such that its surface roughness is not significantly increased after beam processing methods is fitted between the mirror carrier and the reflective layer.

Abstract translation: 装置用于反射电磁波，特别是在小于200nm的长度范围内。 它具有由至少近乎消失的热膨胀的材料制成的反射镜载体，并且至少一个反射层施加在所述反射镜载体上。 由在反射镜载体和反射层之间装配光束处理方法之后形成为使得其表面粗糙度不显着增加的材料制成的中间层。

公开(公告)号：US06951500B2

公开(公告)日：2005-10-04

申请号：US10418635

申请日：2003-04-18

Applicant: Siegfried Stacklies

Inventor： Siegfried Stacklies

IPC: B24B7/24 ,  B24B27/04 ,  B24B41/04 ,  B24B1/00

CPC classification number: B24B27/04 ,  B24B7/24 ,  B24B41/042

Abstract: A workpiece-surface processing head has at least one processing tool which comes into contact with the surface to be processed and whose longitudinal axis is oriented essentially perpendicularly to the surface to be processed. The processing tool, for processing the workpieces, can be traversed by means of at least one drive device in a direction (X; Y) running at least approximately perpendicularly to its longitudinal axis.

Abstract translation: 工件表面处理头具有与被处理表面接触的至少一个处理工具，并且其纵轴基本上垂直于待处理的表面定向。 用于处理工件的加工工具可以通过至少一个驱动装置沿至少大致垂直于其纵向轴线运动的方向（X; Y）穿过。

公开(公告)号：US20050177270A1

公开(公告)日：2005-08-11

申请号：US10874070

申请日：2004-06-22

Applicant: Siegfried Stacklies

Inventor： Siegfried Stacklies

IPC: B24B13/06 ,  G05B19/18 ,  G05B19/404 ,  G06F19/00

CPC classification number: G05B19/404 ,  B24B13/06 ,  B29D11/00019 ,  G05B2219/36251 ,  G05B2219/37576 ,  G05B2219/45157

Abstract: Program-controlled NC data generating method The invention relates to a program-controlled NC data generating method for controlling a CNC wet-grinding machine for machining workpieces made of optical materials to produce aspherical forms, the data of the aspherical forms to be ground being overlaid with correction data.

Abstract translation: 程控NC数据生成方法本发明涉及用于控制用于加工由光学材料制成的工件的CNC湿磨机以产生非球面形式的程序控制的NC数据生成方法，要被研磨的非球面形状的数据被覆盖 具有校正数据。

公开(公告)号：US06733369B1

公开(公告)日：2004-05-11

申请号：US10261455

申请日：2002-09-30

Applicant: Siegfried Stacklies ,  Yaolong Chen

Inventor： Siegfried Stacklies ,  Yaolong Chen

IPC: B24B100

CPC classification number: B24B13/06 ,  B23Q1/52 ,  B23Q1/5406

Abstract: An apparatus for polishing or lapping an aspherical surface of a work piece comprises a tool rotatable about an axis, the working surface area of the tool being smaller than the work piece, and an arrangement by means of which the tool and the work piece are adjustable relative to each other in all three directions in space, by means of which the orientation of the tool relative to the work piece is adjustable about at least two axes, and by means of which the work piece is rotatable about an axis.

Abstract translation: 用于抛光或研磨工件的非球面的装置包括可围绕轴线旋转的工具，工具的工作表面区域小于工件，以及用于工具和工件可调节的装置 相对于彼此在空间中的所有三个方向上相对于工件的工具相对于工件的取向可围绕至少两个轴线调节，借助于该工件可以使工件绕轴线旋转。

公开(公告)号：US07481543B1

公开(公告)日：2009-01-27

申请号：US11523396

申请日：2006-09-18

Applicant: Udo Dinger ,  Frank Eisert ,  Siegfried Stacklies ,  Martin Weiser ,  Guenther Seitz

Inventor： Udo Dinger ,  Frank Eisert ,  Siegfried Stacklies ,  Martin Weiser ,  Guenther Seitz

IPC: G02B5/10

CPC classification number: B24B13/06 ,  B24B51/00

Abstract: A mirror for use in a projection exposure apparatus is described. The mirror has a main surface extending beyond an outline of an optical surface of the main surface. The optical surface has a roughness of less than 1 nm rms, and the outline of the optical surface includes a portion where the main surface extends beyond the optical surface by less than 0.2 mm. Manufacturing the mirror may involve polishing the optical surface in regions of the main surface extending beyond the optical surface and removing material of the substrate carrying a portion of the surface extending beyond the optical surface.

Abstract translation: 描述了用于投影曝光装置的反射镜。 反射镜具有延伸超过主表面的光学表面轮廓的主表面。 光学表面具有小于1nm的粗糙度，并且光学表面的轮廓包括主表面延伸超过光学表面小于0.2mm的部分。 制造反射镜可以包括在主表面延伸超过光学表面的区域中抛光光学表面，并去除承载延伸超过光学表面的表面的一部分的基板的材料。

公开(公告)号：US20070162178A1

公开(公告)日：2007-07-12

申请号：US11566871

申请日：2006-12-05

Applicant: Siegfried Stacklies

Inventor： Siegfried Stacklies

IPC: G06F19/00

CPC classification number: B29D11/00019 ,  B24B13/06 ,  G05B19/401 ,  G05B2219/36251 ,  G05B2219/37576 ,  G05B2219/45157

Abstract: The invention relates to an aspherical optical element and method for producing same based on numerical control data for controlling a surface processing machine such as a CNC wet-grinding machine for processing workpieces made of optical materials to produce aspherical forms, the data of the aspherical forms to be formed being overlaid with correction data.

Abstract translation: 本发明涉及一种非球面光学元件及其制造方法，该数学控制数据用于控制用于处理由光学材料制成的工件的CNC湿磨机等表面处理机械，以产生非球面形状，非球面形状的数据 被形成为与校正数据重叠。

公开(公告)号：US07164964B2

公开(公告)日：2007-01-16

申请号：US10874070

申请日：2004-06-22

Applicant: Siegfried Stacklies

Inventor： Siegfried Stacklies

IPC: G06F19/00

CPC classification number: G05B19/404 ,  B24B13/06 ,  B29D11/00019 ,  G05B2219/36251 ,  G05B2219/37576 ,  G05B2219/45157

Abstract: The invention relates to a program-controlled NC data generating method for controlling a CNC wet-grinding machine for machining workpieces made of optical materials to produce aspherical forms, the data of the aspherical forms to be ground being overlaid with correction data.

Abstract translation: 本发明涉及一种用于控制用于加工由光学材料制成的工件以产生非球面形状的CNC湿磨机的程序控制NC数据产生方法，将要被研磨的非球面形式的数据与校正数据重叠。

公开(公告)号：US07118449B1

公开(公告)日：2006-10-10

申请号：US10943952

申请日：2004-09-20

Applicant: Udo Dinger ,  Frank Eisert ,  Siegfried Stacklies ,  Martin Weiser ,  Guenther Seitz

Inventor： Udo Dinger ,  Frank Eisert ,  Siegfried Stacklies ,  Martin Weiser ,  Guenther Seitz

IPC: B24B49/00 ,  B24B51/00 ,  B24B1/00

CPC classification number: B24B13/06 ,  B24B51/00

Abstract: A method of manufacturing an optical element having an optical surface extending close to a periphery of a substrate comprises: providing a substrate having a main surface extending beyond a periphery of the optical surface and also performing a polishing of the optical surface in regions of the main surface extending beyond the optical surface. Thereafter, material of the substrate carrying a portion of the surface extending beyond the optical surface is removed.

Abstract translation: 一种制造具有靠近基板周边延伸的光学表面的光学元件的方法包括：提供具有延伸超过光学表面的周边的主表面的基板，并且还在主体的区域中执行光学表面的抛光 表面延伸超出光学表面。 此后，去除承载延伸超过光学表面的表面的一部分的基板的材料。