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公开(公告)号：US08815061B2
公开(公告)日：2014-08-26
申请号：US13618348
申请日：2012-09-14
摘要： An electropolishing fixture with a plunger mechanism. The plunger mechanism can establish contact between a device and an anode mandrel during an electropolishing process while the device is immersed in an electrolytic bath.
摘要翻译： 具有柱塞机构的电抛光夹具。 柱塞机构可以在电解抛光过程中在器件浸入电解槽中之间建立装置与阳极心轴之间的接触。
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公开(公告)号：US20140076737A1
公开(公告)日：2014-03-20
申请号：US13618348
申请日：2012-09-14
摘要： An electropolishing fixture with a plunger mechanism. The plunger mechanism can establish contact between a device and an anode mandrel during an electropolishing process while the device is immersed in an electrolytic bath.
摘要翻译： 具有柱塞机构的电抛光夹具。 柱塞机构可以在电解抛光过程中在器件浸入电解槽中之间建立装置与阳极心轴之间的接触。
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3.发明授权公开(公告)号：US08617379B2
公开(公告)日：2013-12-31
申请号：US13271501
申请日：2011-10-12
申请人： Sophia L. Wong , William E. Webler
发明人： Sophia L. Wong , William E. Webler
摘要： A substantially anhydrous electropolishing electrolyte solution that includes at least one sulfate salt. The substantially anhydrous electropolishing electrolyte solutions described herein do not use water as a solvent; instead, such electropolishing electrolyte solutions use anhydrous alcohols and/or glycols as a solvent. For example, an electropolishing electrolyte solution, as described herein, may include an alcohol, at least one mineral acid, and at least one sulfate salt. The at least one sulfate salt can act as a source of sulfate ions to replenish sulfate ions consumed in the electropolishing process. Anhydrous sulfate salts can also act as water scavengers by reacting with water to form sulfate salt hydrates. Methods of electropolishing metal articles using such electropolishing electrolyte solutions are disclosed herein as well.
摘要翻译： 一种包含至少一种硫酸盐的基本上无水的电解抛光电解质溶液。 本文所述的基本无水的电解抛光电解质溶液不使用水作为溶剂; 相反，这种电解抛光电解质溶液使用无水醇和/或二醇作为溶剂。 例如，如本文所述的电解抛光电解质溶液可以包括醇，至少一种无机酸和至少一种硫酸盐。 所述至少一种硫酸盐可以作为硫酸根离子的来源来补充在电解抛光过程中消耗的硫酸根离子。 无水硫酸盐也可以通过与水反应形成硫酸盐水合物作为除水剂。 使用这种电抛光电解质溶液电解抛光金属制品的方法也在本文中公开。
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4.发明申请公开(公告)号：US20130092557A1
公开(公告)日：2013-04-18
申请号：US13271860
申请日：2011-10-12
IPC分类号： C25F3/16
摘要： Substantially anhydrous electropolishing electrolyte solutions. The substantially anhydrous electropolishing electrolyte solutions described herein do not use water as a solvent; instead, such electropolishing electrolyte solutions use anhydrous alcohols and/or glycols as a solvent. For example, an electropolishing electrolyte solution, as described herein, may include an alcohol, at least one mineral acid, and at least one water sequestering agent. Suitable examples of water sequestering agent include, but are not limited to, polyfunctional alcohols. Methods of electropolishing metal articles using such electropolishing electrolyte solutions are disclosed herein as well.
摘要翻译： 基本无水电抛光电解液。 本文所述的基本无水的电解抛光电解质溶液不使用水作为溶剂; 相反，这种电解抛光电解质溶液使用无水醇和/或二醇作为溶剂。 例如，如本文所述的电解抛光电解质溶液可以包括醇，至少一种无机酸和至少一种水螯合剂。 水螯合剂的合适实例包括但不限于多官能醇。 使用这种电抛光电解质溶液电解抛光金属制品的方法也在本文中公开。
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5.发明授权公开(公告)号：US08617380B2
公开(公告)日：2013-12-31
申请号：US13271860
申请日：2011-10-12
摘要： Substantially anhydrous electropolishing electrolyte solutions. The substantially anhydrous electropolishing electrolyte solutions described herein do not use water as a solvent; instead, such electropolishing electrolyte solutions use anhydrous alcohols and/or glycols as a solvent. For example, an electropolishing electrolyte solution, as described herein, may include an alcohol, at least one mineral acid, and at least one water sequestering agent. Suitable examples of water sequestering agent include, but are not limited to, polyfunctional alcohols. Methods of electropolishing metal articles using such electropolishing electrolyte solutions are disclosed herein as well.
摘要翻译： 基本无水电抛光电解液。 本文所述的基本无水的电解抛光电解质溶液不使用水作为溶剂; 相反，这种电解抛光电解质溶液使用无水醇和/或二醇作为溶剂。 例如，如本文所述的电解抛光电解质溶液可以包括醇，至少一种无机酸和至少一种水螯合剂。 水螯合剂的合适实例包括但不限于多官能醇。 使用这种电抛光电解质溶液电解抛光金属制品的方法也在本文中公开。
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6.发明申请公开(公告)号：US20090165898A1
公开(公告)日：2009-07-02
申请号：US12324732
申请日：2008-11-26
CPC分类号： B23P17/00 , A61L31/022 , A61L31/14 , A61L2400/16 , C08L2201/12 , C22C14/00 , C22C19/007 , C22C19/03 , C22F1/10 , Y10T29/49863
摘要： Superelastic and/or shape memory nickel-titanium alloys having an increased fatigue life that is superior to known nickel-titanium alloys are disclosed. The nickel-titanium alloys have a minimum fatigue life that may be at least about 10 million strain cycles at a strain of at least about 0.75. The minimum fatigue life may be due, at least in part, to the nickel-titanium alloy having at least one of an oxygen concentration of less than about 200 ppm, a carbon concentration of less than about 200 ppm, the absence of oxide-based and/or carbide-based inclusions having a size greater than about 5 microns (μm), the presence of an R-phase, or combinations of the foregoing. Articles manufactured from such fatigue-resistant nickel-titanium alloys can be more durable because they are more resistant to repetitive strain and crack propagation.
摘要翻译： 公开了具有优于已知镍 - 钛合金的疲劳寿命增加的超弹性和/或形状记忆镍钛合金。 镍钛合金具有最小的疲劳寿命，其在至少约0.75的应变下可能为至少约1000万个应变循环。 最小的疲劳寿命可能至少部分地归因于具有小于约200ppm的氧浓度，小于约200ppm的碳浓度，低于约200ppm的氧浓度的氧 - 和/或具有大于约5微米（mum）的尺寸的碳化物基夹杂物，R相的存在或前述的组合。 由这种耐疲劳镍钛合金制成的制品可以更耐用，因为它们更能抵抗重复的应变和裂纹扩展。
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公开(公告)号：US09145619B2
公开(公告)日：2015-09-29
申请号：US13617877
申请日：2012-09-14
申请人： Anthony S. Andreacchi , Randolph von Oepen , Sophia L. Wong , William E. Webler , Christoph Diederichs , Kevin J. Ehrenreich , Denis Tauz
发明人： Anthony S. Andreacchi , Randolph von Oepen , Sophia L. Wong , William E. Webler , Christoph Diederichs , Kevin J. Ehrenreich , Denis Tauz
摘要： Systems and methods for electropolishing devices are disclosed. The electropolishing system includes electropolishing fixtures configured to reposition the devices during the electropolishing process.
摘要翻译： 公开了电抛光装置的系统和方法。 电抛光系统包括电抛光灯具，其配置为在电抛光过程期间重新定位器件。
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公开(公告)号：US20140076719A1
公开(公告)日：2014-03-20
申请号：US13617877
申请日：2012-09-14
申请人： Anthony S. Andreacchi , Randolph von Oepen , Sophia L. Wong , William E. Webler , Christoph Diederichs , Kevin J. Ehrenreich , Denis Tauz
发明人： Anthony S. Andreacchi , Randolph von Oepen , Sophia L. Wong , William E. Webler , Christoph Diederichs , Kevin J. Ehrenreich , Denis Tauz
摘要： Systems and methods for electropolishing devices are disclosed. The electropolishing system includes electropolishing fixtures configured to reposition the devices during the electropolishing process.
摘要翻译： 公开了电抛光装置的系统和方法。 电抛光系统包括电抛光灯具，其配置为在电抛光过程期间重新定位器件。
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9.发明申请公开(公告)号：US20130092556A1
公开(公告)日：2013-04-18
申请号：US13271501
申请日：2011-10-12
申请人： Sophia L. Wong , William E. Webler
发明人： Sophia L. Wong , William E. Webler
IPC分类号： C25F3/16
摘要： A substantially anhydrous electropolishing electrolyte solution that includes at least one sulfate salt. The substantially anhydrous electropolishing electrolyte solutions described herein do not use water as a solvent; instead, such electropolishing electrolyte solutions use anhydrous alcohols and/or glycols as a solvent. For example, an electropolishing electrolyte solution, as described herein, may include an alcohol, at least one mineral acid, and at least one sulfate salt. The at least one sulfate salt can act as a source of sulfate ions to replenish sulfate ions consumed in the electropolishing process. Anhydrous sulfate salts can also act as water scavengers by reacting with water to form sulfate salt hydrates. Methods of electropolishing metal articles using such electropolishing electrolyte solutions are disclosed herein as well.
摘要翻译： 一种包含至少一种硫酸盐的基本上无水的电解抛光电解质溶液。 本文所述的基本无水的电解抛光电解质溶液不使用水作为溶剂; 相反，这种电解抛光电解质溶液使用无水醇和/或二醇作为溶剂。 例如，如本文所述的电解抛光电解质溶液可以包括醇，至少一种无机酸和至少一种硫酸盐。 所述至少一种硫酸盐可以作为硫酸根离子的来源来补充在电解抛光过程中消耗的硫酸根离子。 无水硫酸盐也可以通过与水反应形成硫酸盐水合物作为除水剂。 使用这种电抛光电解质溶液电解抛光金属制品的方法也在本文中公开。
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10.发明授权Electropolishing solution containing phosphorous pentoxide and methods of use thereof 有权含有五氧化二磷的电解抛光液及其使用方法公开(公告)号：US08613849B2
公开(公告)日：2013-12-24
申请号：US13271504
申请日：2011-10-12
摘要： Substantially anhydrous electropolishing electrolyte solutions. The substantially anhydrous electropolishing electrolyte solutions described herein do not use water as a solvent; instead, such electropolishing electrolyte solutions use anhydrous alcohols and/or glycols as a solvent. For example, an electropolishing electrolyte solution, as described herein, may include an alcohol, at least one mineral acid, and phosphorous pentoxide (“P2O5”). Methods of electropolishing metal articles using such electropolishing electrolyte solutions are disclosed herein as well.
摘要翻译： 基本无水电抛光电解液。 本文所述的基本无水的电解抛光电解质溶液不使用水作为溶剂; 相反，这种电解抛光电解质溶液使用无水醇和/或二醇作为溶剂。 例如，如本文所述的电解抛光电解质溶液可以包括醇，至少一种无机酸和五氧化二磷（“P 2 O 5”）。 使用这种电抛光电解质溶液电解抛光金属制品的方法也在本文中公开。
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