公开(公告)号：US20060093730A1

公开(公告)日：2006-05-04

申请号：US10980966

申请日：2004-11-03

申请人： See-Eng Phan ,  Ralf Hofmann ,  Tong Zhang ,  Yehuda Demayo ,  Sreekrishnan Sankaranarayanan ,  Chiukin Lai

发明人： See-Eng Phan ,  Ralf Hofmann ,  Tong Zhang ,  Yehuda Demayo ,  Sreekrishnan Sankaranarayanan ,  Chiukin Lai

IPC分类号： C23C16/52 ,  C23C16/00

CPC分类号： B08B7/0035 ,  B08B7/00 ,  H01J37/32935

摘要： A method of detecting a property of an energized gas in a process chamber involves providing a substrate having a hydride precursor in the chamber. The substrate is exposed to an energized gas comprising hydrogen in the chamber to form a hydride compound in the precursor layer. A sheet resistance of the layer is measured to determine the property of the energized gas, such as at least one of the processing uniformity and cleaning ability of the energized gas. One or more process parameters can be selected in relation to the measured sheet resistance to improve the energized gas processing uniformity and cleaning ability.

摘要翻译： 在处理室中检测通电气体的性质的方法包括在腔室中提供具有氢化物前体的衬底。 将衬底暴露于腔室中包含氢气的带电气体，以在前体层中形成氢化物化合物。 测量层的薄层电阻以确定赋能气体的性质，例如通电气体的加工均匀性和清洁能力中的至少一种。 可以相对于测量的薄层电阻选择一个或多个工艺参数，以提高赋能气体处理的均匀性和清洁能力。