公开(公告)号：US20100275176A1

公开(公告)日：2010-10-28

申请号：US12794614

申请日：2010-06-04

申请人： Daniel Abrams ,  Danping Peng ,  Stanley Osher

发明人： Daniel Abrams ,  Danping Peng ,  Stanley Osher

IPC分类号： G06F17/50

CPC分类号： G03F1/36

摘要： Photomask patterns are represented using contours defined by level-set functions. Given target pattern, contours are optimized such that defined photomask, when used in photolithographic process, prints wafer pattern faithful to target pattern. Optimization utilizes “merit function” for encoding aspects of photolithographic process, preferences relating to resulting pattern (e.g. restriction to rectilinear patterns), robustness against process variations, as well as restrictions imposed relating to practical and economic manufacturability of photomasks.

公开(公告)号：US20070184357A1

公开(公告)日：2007-08-09

申请号：US11531673

申请日：2006-09-13

申请人： Daniel Abrams ,  Stanley Osher ,  Danping Peng

发明人： Daniel Abrams ,  Stanley Osher ,  Danping Peng

IPC分类号： G06F17/50 ,  G03F1/00

CPC分类号： G03F1/36

摘要： Photomask patterns are represented using contours defined by mask functions. Given target pattern, contours are optimized such that defined photomask, when used in photolithographic process, prints wafer pattern faithful to target pattern. Optimization utilizes “merit function” for encoding aspects of photolithographic process, preferences relating to resulting pattern (e.g. restriction to rectilinear patterns), robustness against process variations, as well as restrictions imposed relating to practical and economic manufacturability of photomasks.

摘要翻译： 光掩模图案使用由掩模功能定义的轮廓来表示。 给定目标图案，轮廓被优化，使得定义的光掩模在光刻工艺中使用时，将晶片图案忠实地印刷到目标图案上。 优化利用“优点功能”来编码光刻工艺的方面，与所产生的图案有关的偏好（例如对直线图案的限制），对工艺变化的鲁棒性以及与光掩模的实际和经济可制造性有关的限制。

公开(公告)号：US20070011645A1

公开(公告)日：2007-01-11

申请号：US11209268

申请日：2005-08-22

申请人： Daniel Abrams ,  Danping Peng ,  Stanley Osher

发明人： Daniel Abrams ,  Danping Peng ,  Stanley Osher

IPC分类号： G06F17/50

CPC分类号： G03F1/36

摘要： Photomask patterns are represented using contours defined by level-set functions. Given target pattern, contours are optimized such that defined photomask, when used in photolithographic process, prints wafer pattern faithful to target pattern. Optimization utilizes “merit function” for encoding aspects of photolithographic process, preferences relating to resulting pattern (e.g. restriction to rectilinear patterns), robustness against process variations, as well as restrictions imposed relating to practical and economic manufacturability of photomasks.

摘要翻译： 光掩模图案使用由级别集函数定义的轮廓来表示。 给定目标图案，轮廓被优化，使得定义的光掩模在光刻工艺中使用时，将晶片图案忠实地印刷到目标图案上。 优化利用“优点功能”来编码光刻工艺的方面，与所产生的图案有关的偏好（例如对直线图案的限制），对工艺变化的鲁棒性以及与光掩模的实际和经济可制造性有关的限制。

公开(公告)号：US08731313B2

公开(公告)日：2014-05-20

申请号：US12727183

申请日：2010-03-18

申请人： Pradeep Thiyanaratnam ,  Stanley Osher

发明人： Pradeep Thiyanaratnam ,  Stanley Osher

IPC分类号： G06K9/46

CPC分类号： G06T9/00 ,  G06T9/001

摘要： This invention relates to a method and apparatus for accurate compression and decompression of data. More specifically, this invention relates to a method and apparatus for compressing three dimensional spatial points (so called “point cloud”) and decompressing such data to produce an accurate point cloud. In one embodiment of the present invention, a level set based method is used to reconstruct a surface to approximate the surface of the point cloud. This reconstructed surface is defined implicitly as the zero level set of a function, which can be computed on a regular three-dimensional rectangular grid. Furthermore, the three-dimensional grid may be rearranged into a two-dimensional grid where the data are compressed and stored in a form of gradient. In order to recover the point cloud, the three-dimensional grid is rebuilt from the two-dimensional data and an interpolating algorithm on the implicit function is utilized to compute the points on the surface.

摘要翻译： 本发明涉及一种用于数据精确压缩和解压缩的方法和装置。 更具体地说，本发明涉及一种用于压缩三维空间点（所谓的“点云”）并解压缩这些数据以产生准确点云的方法和装置。 在本发明的一个实施例中，使用基于水平集的方法来重构表面以接近点云的表面。 这个重建表面被隐式地定义为函数的零级集合，其可以在规则的三维矩形网格上计算。 此外，三维网格可以重新排列成二维网格，其中数据被压缩并以梯度的形式存储。 为了恢复点云，从二维数据重建三维网格，并利用隐式函数的内插算法来计算表面上的点。

公开(公告)号：US08300971B2

公开(公告)日：2012-10-30

申请号：US12729147

申请日：2010-03-22

申请人： Stanley Osher ,  Bin Dong ,  Barry Lynn Merriman

发明人： Stanley Osher ,  Bin Dong ,  Barry Lynn Merriman

IPC分类号： G06K9/40 ,  G06K9/32 ,  G06K15/02

CPC分类号： G01N15/14 ,  G06T5/002 ,  G06T5/003 ,  G06T5/20 ,  G06T2207/10056 ,  G06T2207/30024

摘要： This invention relates to a method and apparatus for image processing, and more particularly, this invention relates to a method and apparatus for processing image data generated by bioanalytical devices, such as DNA sequencers. An object of the present invention is to remove artifacts such as noise, blur, background, non-uniform illumination, lack of registration, and extract pixel signals back to DNA-beads in a way that de-mixes pixels that contain contributions from nearby beads. In one aspect of the present invention, a system for optimizing an image comprises means for receiving an initial image which includes a plurality of microparticles with different intensities; a computing device, comprising a processor executing instructions to perform: generating an initial function denoting each microparticle's location and intensity in the initial image; determining an image processing operator adapted to determine an extent of point spread and blurriness in the initial image; computing an optimum function denoting each microparticle's location and intensity in an optimizing image; and producing the optimizing image with enhanced accuracy and density of the microparticles.

摘要翻译： 本发明涉及一种用于图像处理的方法和装置，更具体地说，本发明涉及一种用于处理由诸如DNA定序器的生物分析装置生成的图像数据的方法和装置。 本发明的一个目的是去除诸如噪声，模糊，背景，不均匀的照明，缺乏配准的伪影，并且以像素包含附近珠粒的像素的方式将像素信号提取回DNA珠子 。 在本发明的一个方面，一种用于优化图像的系统包括用于接收包括具有不同强度的多个微粒的初始图像的装置; 计算设备，包括执行执行指令的处理器：产生表示初始图像中的每个微粒的位置和强度的初始函数; 确定适于确定初始图像中的点扩展和模糊程度的图像处理算子; 计算优化图像中表示每个微粒的位置和强度的最佳函数; 并且以提高的微粒的精度和密度生产优化图像。

公开(公告)号：US20100239178A1

公开(公告)日：2010-09-23

申请号：US12727183

申请日：2010-03-18

申请人： Stanley Osher ,  Pradeep Thiyanaratnam

发明人： Stanley Osher ,  Pradeep Thiyanaratnam

IPC分类号： G06K9/36

CPC分类号： G06T9/00 ,  G06T9/001

摘要： This invention relates to a method and apparatus for accurate compression and decompression of data. More specifically, this invention relates to a method and apparatus for compressing three dimensional spatial points (so called “point cloud”) and decompressing such data to produce an accurate point cloud. In one embodiment of the present invention, a level set based method is used to reconstruct a surface to approximate the surface of the point cloud. This reconstructed surface is defined implicitly as the zero level set of a function, which can be computed on a regular three-dimensional rectangular grid. Furthermore, the three-dimensional grid may be rearranged into a two-dimensional grid where the data are compressed and stored in a form of gradient. In order to recover the point cloud, the three-dimensional grid is rebuilt from the two-dimensional data and an interpolating algorithm on the implicit function is utilized to compute the points on the surface.

摘要翻译： 本发明涉及一种用于数据精确压缩和解压缩的方法和装置。 更具体地说，本发明涉及一种用于压缩三维空间点（所谓的“点云”）并解压缩这些数据以产生准确点云的方法和装置。 在本发明的一个实施例中，使用基于水平集的方法来重构表面以接近点云的表面。 这个重建表面被隐式地定义为函数的零级集合，其可以在规则的三维矩形网格上计算。 此外，三维网格可以重新排列成二维网格，其中数据被压缩并以梯度的形式存储。 为了恢复点云，从二维数据重建三维网格，并利用隐式函数的内插算法来计算表面上的点。

公开(公告)号：US07441227B2

公开(公告)日：2008-10-21

申请号：US11549846

申请日：2006-10-16

申请人： Daniel Abrams ,  Danping Peng ,  Stanley Osher

发明人： Daniel Abrams ,  Danping Peng ,  Stanley Osher

IPC分类号： G06F17/50

CPC分类号： G03F1/36

摘要： Photomask patterns are represented using contours defined by level-set functions. Given target pattern, contours are optimized such that defined photomask, when used in photolithographic process, prints wafer pattern faithful to target pattern. Optimization utilizes “merit function” for encoding aspects of photolithographic process, preferences relating to resulting pattern (e.g. restriction to rectilinear patterns), robustness against process variations, as well as restrictions imposed relating to practical and economic manufacturability of photomasks.

摘要翻译： 光掩模图案使用由级别集函数定义的轮廓来表示。 给定目标图案，轮廓被优化，使得定义的光掩模在光刻工艺中使用时，将晶片图案忠实地印刷到目标图案上。 优化利用“优点功能”来编码光刻工艺的方面，与所产生的图案有关的偏好（例如对直线图案的限制），对工艺变化的鲁棒性以及与光掩模的实际和经济可制造性有关的限制。

公开(公告)号：US20070198966A1

公开(公告)日：2007-08-23

申请号：US11549846

申请日：2006-10-16

申请人： Daniel Abrams ,  Danping Peng ,  Stanley Osher

发明人： Daniel Abrams ,  Danping Peng ,  Stanley Osher

IPC分类号： G06F17/50

CPC分类号： G03F1/36

摘要： Photomask patterns are represented using contours defined by level-set functions. Given target pattern, contours are optimized such that defined photomask, when used in photolithographic process, prints wafer pattern faithful to target pattern. Optimization utilizes “merit function” for encoding aspects of photolithographic process, preferences relating to resulting pattern (e.g. restriction to rectilinear patterns), robustness against process variations, as well as restrictions imposed relating to practical and economic manufacturability of photomasks.

公开(公告)号：US20070136716A1

公开(公告)日：2007-06-14

申请号：US11674130

申请日：2007-02-12

申请人： Daniel Abrams ,  Danping Peng ,  Stanley Osher

发明人： Daniel Abrams ,  Danping Peng ,  Stanley Osher

IPC分类号： G06F17/50

CPC分类号： G03F1/36

摘要： Photomask patterns are represented using contours defined by level-set functions. Given target pattern, contours are optimized such that defined photomask, when used in photolithographic process, prints wafer pattern faithful to target pattern. Optimization utilizes “merit function” for encoding aspects of photolithographic process, preferences relating to resulting pattern (e.g. restriction to rectilinear patterns), robustness against process variations, as well as restrictions imposed relating to practical and economic manufacturability of photomasks.

摘要翻译： 光掩模图案使用由级别集函数定义的轮廓来表示。 给定目标图案，轮廓被优化，使得定义的光掩模在光刻工艺中使用时，将晶片图案忠实地印刷到目标图案上。 优化利用“优点功能”来编码光刻工艺的方面，与所产生的图案有关的偏好（例如对直线图案的限制），对工艺变化的鲁棒性以及与光掩模的实际和经济可制造性有关的限制。

公开(公告)号：US07124394B1

公开(公告)日：2006-10-17

申请号：US10408928

申请日：2003-04-06

申请人： Daniel Abrams ,  Danping Peng ,  Stanley Osher

发明人： Daniel Abrams ,  Danping Peng ,  Stanley Osher

IPC分类号： G06F17/50

CPC分类号： G03F1/36

摘要： Photomask patterns are represented using contours defined by level-set functions. Given target pattern, contours are optimized such that defined photomask, when used in photolithographic process, prints wafer pattern faithful to target pattern. Optimization utilizes “merit function” for encoding aspects of photolithographic process, preferences relating to resulting pattern (e.g. restriction to rectilinear patterns), robustness against process variations, as well as restrictions imposed relating to practical and economic manufacturability of photomasks.

摘要翻译： 光掩模图案使用由级别集函数定义的轮廓来表示。 给定目标图案，轮廓被优化，使得定义的光掩模在光刻工艺中使用时，将晶片图案忠实地印刷到目标图案上。 优化利用“优点功能”来编码光刻工艺的方面，与所产生的图案有关的偏好（例如对直线图案的限制），对工艺变化的鲁棒性以及与光掩模的实际和经济可制造性有关的限制。