公开(公告)号：US5994023A

公开(公告)日：1999-11-30

申请号：US897672

申请日：1997-07-21

申请人： Marc Van Damme ,  Joan Vermeersch ,  Stefan Van Steenkiste ,  Etienne Schacht

发明人： Marc Van Damme ,  Joan Vermeersch ,  Stefan Van Steenkiste ,  Etienne Schacht

IPC分类号： B41C1/10 ,  G03F7/004 ,  G03F7/039 ,  G03F7/021 ,  G03F7/09

CPC分类号： B41C1/1008 ,  G03F7/0045 ,  G03F7/039 ,  B41C2210/02 ,  B41C2210/06 ,  B41C2210/22 ,  B41C2210/24 ,  Y10S430/145

摘要： According to the present invention there is provided a polymer not comprising maleic acid derivatives having acid labile groups pendant from the polymer backbone, characterized in that said pendant groups are represented by--L--(C.dbd.O)--O--(C.dbd.O)--O--C--R.sup.1 R.sup.2 R.sup.3,wherein L represents a divalent linking group bonded to the polymer backbone, R.sup.1 represents an alkyl group of which the linking C atom comprises at least one hydrogen and R.sup.2 and R.sup.3 each independently represent a hydrogen or an alkyl group or R.sup.1 and R.sup.2 or R.sup.2 and R.sup.3 form together a ring compound still with the proviso that the linking C atom of R.sup.1 comprises at least one hydrogen.According to the present invention there is further provided a novel photosensitive composition comprising a latent Bronsted acid and a polymer having acid labile groups pendant from the polymer backbone as described above.

摘要翻译： 根据本发明，提供了不包含从聚合物主链悬挂的具有酸不稳定基团的马来酸衍生物的聚合物，其特征在于所述侧基由-L-（C = O）-O-（C = O） -OC-R 1 R 2 R 3，其中L表示与聚合物骨架结合的二价连接基团，R 1表示连接C原子包含至少一个氢的烷基，R 2和R 3各自独立地表示氢或烷基或R 1和 R 2或R 2和R 3一起形成环化合物，条件是R 1的连接C原子包含至少一个氢。 根据本发明，还提供了一种新颖的光敏组合物，其包含潜在的布朗斯台德酸和如上所述从聚合物主链悬挂的具有酸不稳定基团的聚合物。