Thiosilicate phosphor compositions and deposition methods using barium-silicon vacuum deposition sources for deposition of thiosilicate phosphor films
    1.
    发明授权
    Thiosilicate phosphor compositions and deposition methods using barium-silicon vacuum deposition sources for deposition of thiosilicate phosphor films 有权
    硫硅酸盐荧光粉组合物和使用钡硅真空沉积源沉积硫硅酸盐荧光膜的沉积方法

    公开(公告)号:US07556721B2

    公开(公告)日:2009-07-07

    申请号:US11260927

    申请日:2005-10-29

    IPC分类号: C23C14/34 C23C16/00

    摘要: The present invention relates to novel thiosilicate phosphor compositions. The invention is further a physical vapor deposition method for the deposition of rare earth activated thiosilicate phosphor compositions comprising providing at least one or more source materials where the source materials may comprise a barium silicon alloy, an intermetallic barium silicon compound, a protected barium metal and combinations thereof; providing an activator species; and effecting deposition of the one or more source materials and activator species as a thin film phosphor composition on a selected substrate. The method allows for the deposition of blue thin film electroluminescent phosphors with high luminance and colors required for TV applications.

    摘要翻译: 本发明涉及新的硫硅酸盐荧光体组合物。 本发明还涉及用于沉积稀土活化的硫硅酸盐荧光体组合物的物理气相沉积方法,其包括提供至少一种或多种源材料,其中源材料可以包含钡硅合金,金属间钡硅化合物,受保护的钡金属和 其组合; 提供活化剂种类; 并且将一种或多种源材料和活化剂物质作为薄膜磷光体组合物沉积在所选择的基底上。 该方法允许沉积具有用于电视应用所需的高亮度和颜色的蓝色薄膜电致发光荧光体。