公开(公告)号：US5539568A

公开(公告)日：1996-07-23

申请号：US478157

申请日：1995-06-07

Applicant: Tsen-Hwang Lin ,  Shane R. Palmer ,  Steven C. Gustafson ,  Jay M. Brown

Inventor： Tsen-Hwang Lin ,  Shane R. Palmer ,  Steven C. Gustafson ,  Jay M. Brown

IPC: G02B26/06 ,  G03F1/26 ,  G03F7/20 ,  G02F1/11

CPC classification number: G03F7/70291 ,  G02B26/06 ,  G03F7/2002 ,  G03F7/70191 ,  G03F7/70283 ,  G03F7/70566 ,  G03F1/26

Abstract: A phase shift illuminator (700) is comprised of a light source (704) and a phase modulator (716), typically a flexure beam micromirror array, which transversely modulates the incident light beam. When a flexure beam micromirror array is used as the phase modulator (716) a polarizing beam splitter (712) and a quarter-wave plate (714) are used to separate the incident and reflected light beams. The phase modulated light beam (720) from the optical illuminator may be used in optical lithography by passing the light beam through a lithography mask (724), typically after the light beam is phase modulated, and focusing the light beam onto a target wafer (726).

Abstract translation: 相移照明器（700）包括光源（704）和相位调制器（716），通常是弯曲光束微镜阵列，其横向地调制入射光束。 当使用挠曲束微镜阵列作为相位调制器（716）时，偏振分束器（712）和四分之一波片（714）被用于分离入射光和反射光束。 来自光学照明器的相位调制光束（720）可以通过使光束通过光刻掩模（724），通常在光束被相位调制之后将光束聚焦到目标晶片（724）上而用于光学光刻 726）。

公开(公告)号：US5539567A

公开(公告)日：1996-07-23

申请号：US260389

申请日：1994-06-16

Applicant: Tsen-Hwang Lin ,  Shane R. Palmer ,  Steven C. Gustafson ,  Jay M. Brown

Inventor： Tsen-Hwang Lin ,  Shane R. Palmer ,  Steven C. Gustafson ,  Jay M. Brown

IPC: G02B26/06 ,  G03F1/26 ,  G03F7/20 ,  G02F1/09

CPC classification number: G03F7/70291 ,  G02B26/06 ,  G03F7/2002 ,  G03F7/70191 ,  G03F7/70283 ,  G03F7/70566 ,  G03F1/26

Abstract: A phase shift illuminator (700) is comprised of a light source (704) and a phase modulator (716), typically a flexure beam micromirror array, which transversely modulates the incident light beam. When a flexure beam micromirror array is used as the phase modulator (716) a polarizing beam splitter (712) and a quarter-wave plate (714) are used to separate the incident and reflected light beams. The phase modulated light beam (720) from the optical illuminator may be used in optical lithography by passing the light beam through a lithography mask (724), typically after the light beam is phase modulated, and focusing the light beam onto a target wafer (726).

Abstract translation: 相移照明器（700）包括光源（704）和相位调制器（716），通常是弯曲光束微镜阵列，其横向地调制入射光束。 当使用挠曲束微镜阵列作为相位调制器（716）时，偏振分束器（712）和四分之一波片（714）被用于分离入射光和反射光束。 来自光学照明器的相位调制光束（720）可以通过使光束通过光刻掩模（724），通常在光束被相位调制之后将光束聚焦到目标晶片（724）上而用于光学光刻 726）。