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    Method and apparatus for reducing thermal gradients within a substrate support
    1.
    发明授权
    Method and apparatus for reducing thermal gradients within a substrate support 有权
    用于降低衬底支撑体内的热梯度的方法和装置

    公开(公告)号：US06469283B1

    公开(公告)日：2002-10-22

    申请号：US09262788

    申请日：1999-03-04

    申请人： Vincent E. Burkhart ,  Steven Sansoni ,  Michael N. Sugarman ,  Anthony Chan

    发明人： Vincent E. Burkhart ,  Steven Sansoni ,  Michael N. Sugarman ,  Anthony Chan

    IPC分类号： H05B302

    CPC分类号： H01L21/67248 ,  H01L21/67103

    摘要： A method and apparatus for reducing the thermal gradients within substrate support such as a ceramic wafer support pedestal. Specifically, the present invention is a heater controller that limits the amount of power that is applied to a resistive heater embedded within a ceramic pedestal. The heater controller comprises the necessary circuitry for limiting the amount of power applied to one or more zones with respect to a single other zone. Said heater controller also contains the necessary circuitry to detect faulty or misconnected wires between heater controller and the zones to be heated.

    摘要翻译： 一种用于降低衬底支撑件内的热梯度的方法和装置，例如陶瓷晶片支撑座。 具体地说，本发明是一种加热器控制器，其限制了施加到嵌入陶瓷基座内的电阻加热器的功率量。 加热器控制器包括用于限制相对于单个其他区域施加到一个或多个区域的功率量的必要电路。 所述加热器控制器还包含检测加热器控制器和待加热区域之间的错误或错误连接的必要电路。