公开(公告)号：US20070069127A1

公开(公告)日：2007-03-29

申请号：US11478615

申请日：2006-07-03

申请人： Hirohito Okuda ,  Takashi Hirol ,  Hiroshi Makino

发明人： Hirohito Okuda ,  Takashi Hirol ,  Hiroshi Makino

IPC分类号： G21K7/00

CPC分类号： H01J37/21 ,  G01R31/307 ,  H01J37/244 ,  H01J37/29 ,  H01J2237/216 ,  H01J2237/2443 ,  H01J2237/2446 ,  H01J2237/262

摘要： An apparatus and method for electron beam inspection with projection electron microscopy, is constructed so as to allow correction of changes in focus offsets due to changes in the electrically charged state particularly during inspection. The apparatus includes: a focus measure sensor unit; a focus measure calculation unit which calculates focus measure from the multiple image signals converted by the focus measure sensor unit; a focus position calculation unit which calculates the height of a confocal plane conjugate to the plane of convergence of a planar electron beam by an objective lens, on the basis of the calculated focus measure, and then calculates the focus position of the objective lens on the basis of the calculated height of the confocal plane; and a focus position correction unit which corrects the focus position of the objective lens according to the calculated focus position of the objective lens.

摘要翻译： 用投影电子显微镜进行电子束检查的装置和方法被构造成允许校正由于带电状态的变化引起的焦点偏移变化，特别是在检查期间。 该装置包括：焦距测量传感器单元; 焦点测量计算单元，其从由所述焦点测量传感器单元转换的多个图像信号计算焦点测量; 焦点位置计算单元，基于计算出的焦点测量，计算由物镜与平面电子束的会聚平面共轭的高度，然后计算物镜的聚焦位置 共焦平面计算高度的基础; 以及聚焦位置校正单元，其根据计算出的物镜的聚焦位置校正物镜的聚焦位置。