公开(公告)号：US5372914A

公开(公告)日：1994-12-13

申请号：US36254

申请日：1993-03-24

申请人： Takuya Naito ,  Osamu Sasaki ,  Tsukasa Tada ,  Naoko Kihara ,  Toru Ushirogouchi ,  Satoshi Saito ,  Takashi Jonai ,  Hirokazu Niki

发明人： Takuya Naito ,  Osamu Sasaki ,  Tsukasa Tada ,  Naoko Kihara ,  Toru Ushirogouchi ,  Satoshi Saito ,  Takashi Jonai ,  Hirokazu Niki

IPC分类号： G03F7/004 ,  G03F7/09 ,  G03C5/00

CPC分类号： G03F7/0045 ,  G03F7/094 ,  Y10S430/122

摘要： On a substrate a protective layer is formed which can suppress the diffusion of a contaminant from the substrate. On the protective layer, thus formed, a resin layer is formed. The resin layer comprises a photosensitive composition containing a compound which has a substituent group capable of being decomposed or cross-linked in the presence of an acid, and a compound which can generate an acid when exposed to light. The resin layer is pattern-exposed to light and then baked at a predetermined temperature. The resin layer is developed, whereby the exposed portions of the resin layer are removed or left, thus forming a pattern comprising lines and spaces each having a predetermined width. Each of the lines of the pattern has a cross-section having neither sloped profile nor undercut profile, and the pattern therefore has an improved resolution.

摘要翻译： 在基板上形成保护层，其可以抑制污染物从基板的扩散。 在形成的保护层上形成树脂层。 树脂层包含含有在酸存在下具有能够分解或交联的取代基的化合物的光敏组合物和在暴露于光时可产生酸的化合物。 将树脂层图案曝光，然后在预定温度下烘烤。 树脂层被显影，由此树脂层的暴露部分被去除或留下，从而形成包括具有预定宽度的线和间隔的图案。 图案的每条线具有既不具有倾斜轮廓也不具有底切轮廓的横截面，因此，该花纹具有改进的分辨率。