公开(公告)号：US20060131265A1

公开(公告)日：2006-06-22

申请号：US11015116

申请日：2004-12-17

Applicant: Victor Samper ,  Dong-Kee Yi ,  Tanu Kustandi

Inventor： Victor Samper ,  Dong-Kee Yi ,  Tanu Kustandi

IPC: C23F1/00 ,  B44C1/22 ,  C03C25/68

CPC classification number: B81C99/0095 ,  H01L21/0337 ,  H01L21/3086

Abstract: The present invention provides a method of forming a branched structure which comprises applying colloidal-sized particles over structures. The coated structures are then etched such that the structures are etched through the colloidal particles to form branched structures. The etch may be a reactive ion etch. The structures may be microstructures formed as high aspect ratio microstructures. The colloidal-sized particles may be applied as a colloidal solution and a polyelectrolyte (PE) layer may be applied to the microstructures prior to the colloidal solution to promote adsorption of the colloidal particles.

Abstract translation: 本发明提供一种形成支化结构的方法，其包括在结构上施加胶体尺寸的颗粒。 然后蚀刻涂覆的结构，使得结构被蚀刻通过胶体颗粒以形成分支结构。 蚀刻可以是反应离子蚀刻。 该结构可以是高纵横比微结构形成的微结构。 可以将胶体尺寸的颗粒作为胶体溶液施用，并且可以在胶体溶液之前将微电极施加到微结构上以促进胶体颗粒的吸附。