公开(公告)号：US4251384A

公开(公告)日：1981-02-17

申请号：US843599

申请日：1977-10-19

申请人： Terence R. Rooney

发明人： Terence R. Rooney

IPC分类号： C23F3/03 ,  C11D7/32 ,  C11D7/34 ,  C11D7/36

CPC分类号： C23F3/03

摘要： Aluminium polishing solutions containing phosphoric, nitric and sulphuric acids provide etched finishes if the proportion of sulphuric acid is increased. The invention inhibits such etching by addition to the bath of an aromatic ring compound in which at least 2 hetero atoms are conjugated with the ring such as benztriazole.

摘要翻译： 含有磷酸，硝酸和硫酸的铝抛光液如果硫酸的比例增加，则会提供蚀刻的表面处理。 本发明通过加入其中至少2个杂原子与环共轭的芳族环化合物如苯并三唑来抑制这种蚀刻。

公开(公告)号：USRE31395E

公开(公告)日：1983-09-27

申请号：US312482

申请日：1981-10-19

申请人： Terence R. Rooney

发明人： Terence R. Rooney

IPC分类号： C23F3/03

CPC分类号： C23F3/03

摘要： Aluminium polishing solutions containing phosphoric, nitric and sulphuric acids provide etched finishes if the proportion of sulphuric acid is increased. The invention inhibits such etching by addition to the bath of an aromatic ring compound, in which at least 2 hetero atoms are conjugated with the ring such as benztriazole. .Iadd.

公开(公告)号：US4116699A

公开(公告)日：1978-09-26

申请号：US733508

申请日：1976-10-18

申请人： Terence R. Rooney

发明人： Terence R. Rooney

IPC分类号： C23F3/03 ,  C09K13/06

CPC分类号： C23F3/03

摘要： Aluminium polishing solutions containing phosphoric, nitric and sulphuric acids provide etched finishes if the proportion of sulphuric acid is increased. The invention inhibits such etching by addition to the bath of an aromatic ring compound, in which at least 2 hetero atoms are conjugated with the ring such as benztriazole.

摘要翻译： 含有磷酸，硝酸和硫酸的铝抛光液如果硫酸的比例增加，则会提供蚀刻的表面处理。 本发明通过加入至少两个杂环原子与环结合的芳环化合物的浴来抑制这种蚀刻，例如苯并三唑。