Elimination of modulated interference effects in photoelastic modulators
    1.
    发明授权
    Elimination of modulated interference effects in photoelastic modulators 失效
    消除光弹性调制器中的调制干扰效应

    公开(公告)号:US5652673A

    公开(公告)日:1997-07-29

    申请号:US266722

    申请日:1994-06-24

    IPC分类号: G02F1/01 G02F1/11 G02F1/33

    CPC分类号: G02F1/11 G02F1/0131

    摘要: Modulated interference effects arising when laser beams are modulated by photoelastic modulators are substantially eliminated by methods and apparatus that extract from the detected beam the modulated, interfering light that emanates from the optical element of the modulator.

    摘要翻译: 当通过光弹性调制器调制激光束时产生的调制干涉效应通过从检测到的光束提取从调制器的光学元件发出的调制干涉光的方法和装置基本消除。

    Birefringence measurement system
    2.
    发明授权
    Birefringence measurement system 有权
    双折射测量系统

    公开(公告)号:US06473179B1

    公开(公告)日:2002-10-29

    申请号:US09308747

    申请日:1999-05-24

    IPC分类号: G01J400

    CPC分类号: G01J4/04 G01N21/23

    摘要: A practical system and method for precisely measuring low-level birefrigence properties (retardance and fast axis orientation) of optical materials (26). The system permits multiple measurements to be taken across the area of a sample to detect and graphically display (100) variations in the birefrigence properties across the sample area. In a preferred embodiment, the system incorporates a photoelastic modulator (24) for modulating polarized light that is then directed through a sample (26). The beam (“Bi”) propagating from the sample is separated into two parts, with one part (“B1”) having a polarization direction different than the polarization direction of the other beam part (“B2”). These separate beam parts are then processed as distinct channels. Detection mechanisms (32, 50) associated with each channel detect the time varying light intensity corresponding to each of the two parts of the beam. The information is combined for calculating a precise measure of the retardance induced by the sample, as well as the sample's fast axis orientation.

    摘要翻译: 精确测量光学材料(26)的低级双折射性能(延迟和快轴取向)的实用系统和方法。 系统允许在样品区域上进行多次测量,以检测和图形显示跨样品区域的双峰性质的变化(100)。 在优选实施例中,该系统包含用于调制偏振光的光弹性调制器(24),然后将其引导通过样品(26)。 从样品传播的光束(“Bi”)被分成两部分,其中一部分(“B1”)的偏振方向与另一光束部分(“B2”)的偏振方向不同。 然后将这些单独的光束部分作为不同的通道进行处理。 与每个通道相关联的检测机构(32,50)检测对应于梁的两个部分中的每一个的时变光强度。 该信息被组合用于计算样品诱导的延迟的精确测量以及样品的快轴取向。

    Measurement of waveplate retardation using a photoelastic modulator
    3.
    发明授权
    Measurement of waveplate retardation using a photoelastic modulator 有权
    使用光弹性调制器测量波片延迟

    公开(公告)号:US06738137B2

    公开(公告)日:2004-05-18

    申请号:US10264102

    申请日:2002-10-02

    IPC分类号: G01J400

    CPC分类号: G01N21/23

    摘要: A practical system and method for measuring waveplate retardation. The system employs a photoelastic modulator in an optical setup and provides high sensitivity. The analysis is particularly appropriate for quality-control testing of waveplates. The system is also adaptable for slightly varying the retardation provided by a waveplate (or any other retarder device) in a given optical setup. To this end, the waveplate position may be precisely altered to introduce correspondingly precise adjustments of the retardation values that the waveplate provides. The system is further refined to permit one to compensate for errors in the retardation measurements just mentioned. Such errors may be attributable to static birefringence present in the optical element of the photoelastic modulator that is incorporated in the system.

    摘要翻译: 用于测量波片延迟的实用系统和方法。 该系统在光学设置中采用光弹性调制器并提供高灵敏度。 该分析特别适用于波片的质量控制测试。 该系统还适于在给定的光学设置中稍微改变由波片(或任何其它延迟器装置)提供的延迟。 为此,可以精确地改变波片位置,以相应地精确地调整波片提供的延迟值。 该系统被进一步细化以允许一个补偿刚刚提到的延迟测量中的误差。 这种错误可归因于存在于结合在系统中的光弹性调制器的光学元件中的静态双折射。

    Birefringence measurement
    4.
    发明授权
    Birefringence measurement 有权
    双折射测量

    公开(公告)号:US06697157B2

    公开(公告)日:2004-02-24

    申请号:US10245477

    申请日:2002-09-17

    IPC分类号: G01J400

    CPC分类号: G01N21/23 G01J4/04

    摘要: A practical system and method for precisely measuring low-level birefringence properties (retardance and fast axis orientation) of optical materials (26). The system permits multiple measurements to be taken across the area of a sample to detect and graphically display (100) variations in the birefringence properties across the sample area. In a preferred embodiment, the system incorporates a photoelastic modulator (24) for modulating polarized light that is then directed through a sample (26). The beam (“Bi”) propagating from the sample is separated into two parts, with one part (“B1”) having a polarization direction different than the polarization direction of the other beam part (“B2”). These separate beam parts are then processed as distinct channels. Detection mechanisms (32, 50) associated with each channel detect the time varying light intensity corresponding to each of the two parts of the beam. This information is combined for calculating a precise measure of the retardance induced by the sample, as well as the sample's fast axis orientation.

    摘要翻译: 精确测量光学材料(26)的低水平双折射性(延迟和快轴取向)的实用系统和方法。 该系统允许在样品区域上进行多次测量,以检测和图形地显示横跨样品区域的双折射性质的变化(100)。 在优选实施例中,该系统包含用于调制偏振光的光弹性调制器(24),然后将其引导通过样品(26)。 从样品传播的光束(“Bi”)被分成两部分,其中一部分(“B1”)的偏振方向与另一光束部分(“B2”)的偏振方向不同。 然后将这些单独的光束部分作为不同的通道进行处理。 与每个通道相关联的检测机构(32,50)检测对应于梁的两个部分中的每一个的时变光强度。 该信息被组合用于计算样品诱导的延迟的精确测量以及样品的快轴取向。

    Measurement of waveplate retardation using a photoelastic modulator
    5.
    发明授权
    Measurement of waveplate retardation using a photoelastic modulator 有权
    使用光弹性调制器测量波片延迟

    公开(公告)号:US06473181B1

    公开(公告)日:2002-10-29

    申请号:US09463532

    申请日:2000-01-21

    IPC分类号: G01J400

    CPC分类号: G01N21/23

    摘要: A practical system and method for measuring waveplate retardation. The system employs a photoelastic modulator (22) in an optical setup and provides high sensitivity. The analysis is particularly appropriate for quality-control testing of waveplates (26). The system is also adaptable for slightly varying the retardation provided by a waveplate (26) or any other retarder device in a given optical setup. To this end, the waveplate (26) position may be precisely altered to introduce correspondingly precise adjustments of the retardation values that the waveplate (26) provides. The system is further refined to permit one to compensate for errors in the retardation measurements just mentioned. Such errors may be attributable to static birefringence present in the optical element of the photoelastic modulator (22) that is incorporated in the system.

    摘要翻译: 用于测量波片延迟的实用系统和方法。 该系统在光学设置中采用光弹性调制器(22)并提供高灵敏度。 该分析特别适用于波片的质量控制测试(26)。 该系统还适用于在给定的光学设置中稍微改变由波片(26)或任何其它延迟器装置提供的延迟。 为此,可以精确地改变波片(26)位置,以对波片(26)提供的延迟值进行相应的精确调节。 该系统被进一步细化以允许一个补偿刚刚提到的延迟测量中的误差。 这种错误可归因于存在于光弹性调制器(22)的光学元件中的并入系统中的静态双折射。