公开(公告)号：US06552775B1

公开(公告)日：2003-04-22

申请号：US09718373

申请日：2000-11-24

申请人： Masamitsu Yanagihara ,  Tomohiro Katsume

发明人： Masamitsu Yanagihara ,  Tomohiro Katsume

IPC分类号： G03B2752

CPC分类号： G03F7/70225 ,  G03F7/70258 ,  G03F7/70275 ,  G03F7/70358 ,  G03F9/7003

摘要： An exposure apparatus and a method which make it possible to enhance the fineness of pattern in spite of the trend to enlarge the size of the photosensitive substrate and device. In this apparatus, a mask and the photosensitive substrate are allowed to synchronously scan, and the optical projecting system thereof is provided with a scanning direction adjusting means which is designed to adjust the position of scanning direction of a projected image to be projected onto the substrate, wherein a non-linear component of error is determined in advance and the result thus determined is stored as a correction value for the apparatus, thereby enabling the pattern exposure to be performed while continuously controlling the image-adjusting mechanism on the basis of the correction value.

摘要翻译： 尽管趋向于增大感光基板和装置的尺寸，但是可以提高图案细度的曝光装置和方法。 在该装置中，掩模和感光基板被允许同步扫描，并且其光学投影系统设置有扫描方向调整装置，该扫描方向调整装置被设计成调整要投影到基板上的投影图像的扫描方向的位置 其中，预先确定误差的非线性分量，并且将由此确定的结果存储为装置的校正值，从而能够在基于校正的基础上连续控制图像调整机构的同时执行图案曝光 值。