Control device for controlling mold oscillation in a continuous casting
machine
    1.
    发明授权
    Control device for controlling mold oscillation in a continuous casting machine 失效
    用于控制连续铸造机中的模具振动的控制装置

    公开(公告)号:US5350005A

    公开(公告)日:1994-09-27

    申请号:US64436

    申请日:1993-05-21

    CPC分类号: B22D11/166 B22D11/0535

    摘要: A control device for controlling mold oscillation in a continuous casting machine comprises a horizontal position detector, an open-close control device and hydraulic cylinders. The horizontal position detector is attached to a piston rod of the hydraulic cylinder for detecting an actual position of long-side copper plates of a mold. The open-close control device further comprises a reference position compensation circuit where a predetermined offset value is received. The reference position compensation circuit produces a compensation signal with which a target position of the long-side copper plates is modified. The open-close control device controls the hydraulic cylinders according to the compensation signal such that a deviation between the actual horizontal position and the target horizontal position of the long-side copper plates becomes equal to the offset value.

    摘要翻译: 用于控制连续铸造机中的模具振动的控制装置包括水平位置检测器,开关控制装置和液压缸。 水平位置检测器安装在液压缸的活塞杆上,用于检测模具的长边铜板的实际位置。 开闭控制装置还包括接收预定偏移值的基准位置补偿电路。 基准位置补偿电路产生修正了长边铜板的目标位置的补偿信号。 开闭控制装置根据补偿信号控制液压缸,使得长边铜板的实际水平位置与目标水平位置之间的偏差变得等于偏移值。

    Charged particle beam irradiating apparatus
    2.
    发明申请
    Charged particle beam irradiating apparatus 有权
    带电粒子束照射装置

    公开(公告)号:US20100072389A1

    公开(公告)日:2010-03-25

    申请号:US12382919

    申请日:2009-03-26

    IPC分类号: H01J3/26

    摘要: The present invention provides a charged particle beam irradiating apparatus capable of simply preventing unevenness or reduction in a peripheral portion of the dose distribution of a charged particle beam.A charged particle beam irradiating apparatus includes scanning electromagnets that scan a charged particle beam and a control device that controls the operations of the scanning electromagnets. In the charged particle beam irradiating apparatus, the control unit changes a scanning speed when the charged particle beam is irradiated along an irradiation line such that a peripheral portion of the dose distribution of the charged particle beam is corrected.

    摘要翻译: 本发明提供了一种能够简单地防止带电粒子束的剂量分布的周边部分的不均匀或减少的带电粒子束照射装置。 带电粒子束照射装置包括扫描带电粒子束的扫描电磁体和控制扫描电磁体的操作的控制装置。 在带电粒子束照射装置中,控制单元改变沿着照射线照射带电粒子束的扫描速度,从而校正带电粒子束的剂量分布的周边部分。

    Charged particle beam irradiating apparatus
    4.
    发明授权
    Charged particle beam irradiating apparatus 有权
    带电粒子束照射装置

    公开(公告)号:US08153989B2

    公开(公告)日:2012-04-10

    申请号:US12382919

    申请日:2009-03-26

    IPC分类号: H01J3/26

    摘要: The present invention provides a charged particle beam irradiating apparatus capable of simply preventing unevenness or reduction in a peripheral portion of the dose distribution of a charged particle beam.A charged particle beam irradiating apparatus includes scanning electromagnets that scan a charged particle beam and a control device that controls the operations of the scanning electromagnets. In the charged particle beam irradiating apparatus, the control unit changes a scanning speed when the charged particle beam is irradiated along an irradiation line such that a peripheral portion of the dose distribution of the charged particle beam is corrected.

    摘要翻译: 本发明提供了一种能够简单地防止带电粒子束的剂量分布的周边部分的不均匀或减少的带电粒子束照射装置。 带电粒子束照射装置包括扫描带电粒子束的扫描电磁体和控制扫描电磁体的操作的控制装置。 在带电粒子束照射装置中,控制单元改变沿着照射线照射带电粒子束的扫描速度,从而校正带电粒子束的剂量分布的周边部分。