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1.发明申请METHOD OF PATTERNING SELF-ORGANIZING MATERIAL, PATTERNED SUBSTRATE OF SELF-ORGANIZING MATERIAL AND METHOD OF PRODUCING THE SAME, AND PHOTOMASK USING PATTERNED SUBSTRATE OF SELF-ORGANIZING MATERIAL 审中-公开自组织材料的形成方法，自组织材料的形成基材及其制造方法，以及使用自组织材料的图案的光刻胶公开(公告)号：US20130330674A1
公开(公告)日：2013-12-12
申请号：US13898105
申请日：2013-05-20
IPC分类号： G03F7/20
CPC分类号： G03F7/20 , B82Y10/00 , B82Y40/00 , G01N21/553 , G01N21/554 , G03F7/0002 , H01L51/0022 , H01L2251/105 , Y10T428/24802
摘要： A method for performing micro fabrication includes using, as a photomask, a self-organizing material-patterned substrate which is soluble in an organic solvent. A method for emitting light includes emitting the light in a pattern of a nucleic acid which is a self-organizing material immobilized on a self-organizing material-patterned substrate. An immobilization layer containing a binding material capable of binding to a self-organizing material is formed on a substrate. Then this immobilization layer is patterned by transferring a protrusion and recess pattern formed in a mold thereto by the imprint process. The self-organizing material is supplied onto the side having the protrusion and recess pattern of the immobilization layer transferred thereto. Thus, the self-organizing material is immobilized according to the protrusion and recess pattern of the immobilization layer owning to the self-organizing ability of the material per se and the binding ability of the binding material contained in the immobilization layer.
摘要翻译： 用于执行微制造的方法包括使用可溶于有机溶剂的自组织材料图案化衬底作为光掩模。 用于发射光的方法包括以固定在自组织材料图案化衬底上的自组织材料的核酸图案发射光。 在基板上形成含有能够结合自组织材料的粘结材料的固定层。 然后通过压印处理将形成在模具中的突起和凹陷图案转印到该固定层上。 将自组织材料供给到具有转移到其上的固定层的突起和凹部图案的一侧。 因此，自组织材料根据固定层的突起和凹陷图案固定，具有材料本身的自组织能力和固定层中所含的粘合材料的结合能力。
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2.发明授权Method of patterning self-organizing material, patterned substrate of self-organizing material and method of producing the same, and photomask using patterned substrate of self-organizing material 有权图案化自组织材料的方法，自组织材料的图案化衬底及其制造方法，以及使用自组织材料的图案衬底的光掩模公开(公告)号：US09429845B2
公开(公告)日：2016-08-30
申请号：US13898105
申请日：2013-05-20
CPC分类号： G03F7/20 , B82Y10/00 , B82Y40/00 , G01N21/553 , G01N21/554 , G03F7/0002 , H01L51/0022 , H01L2251/105 , Y10T428/24802
摘要： A method for performing micro fabrication includes using, as a photomask, a self-organizing material-patterned substrate which is soluble in an organic solvent. A method for emitting light includes emitting the light in a pattern of a nucleic acid which is a self-organizing material immobilized on a self-organizing material-patterned substrate. An immobilization layer containing a binding material capable of binding to a self-organizing material is formed on a substrate. Then this immobilization layer is patterned by transferring a protrusion and recess pattern formed in a mold thereto by the imprint process. The self-organizing material is supplied onto the side having the protrusion and recess pattern of the immobilization layer transferred thereto. Thus, the self-organizing material is immobilized according to the protrusion and recess pattern of the immobilization layer owning to the self-organizing ability of the material per se and the binding ability of the binding material contained in the immobilization layer.
摘要翻译： 用于执行微制造的方法包括使用可溶于有机溶剂的自组织材料图案化衬底作为光掩模。 用于发射光的方法包括以固定在自组织材料图案化衬底上的自组织材料的核酸图案发射光。 在基板上形成含有能够结合自组织材料的粘结材料的固定层。 然后通过压印处理将形成在模具中的突起和凹陷图案转印到该固定层上。 将自组织材料供给到具有转移到其上的固定层的突起和凹部图案的一侧。 因此，自组织材料根据固定层的突起和凹陷图案固定，具有材料本身的自组织能力和固定层中所含的粘合材料的结合能力。
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3.发明申请Method of Patterning Self-Organizing Material, Patterned Substrate of Self-Organizing Material and Method of Producing the Same, and Photomask Using Patterned Substrate of Self-Organizing Material 审中-公开自组织材料的图案化方法，自组织材料的图案化基材及其制造方法以及使用自组织材料的图案化基材的光掩模公开(公告)号：US20080050659A1
公开(公告)日：2008-02-28
申请号：US11663826
申请日：2005-09-29
CPC分类号： G03F7/20 , B82Y10/00 , B82Y40/00 , G01N21/553 , G01N21/554 , G03F7/0002 , H01L51/0022 , H01L2251/105 , Y10T428/24802
摘要： It is intended to provide a method of patterning a self-organizing material whereby a self-organizing material having a self-organization ability such as a nucleic acid can be aligned and immobilized in a desired manner on a substrate by using the imprint process, a patterned substrate of a self-organizing material and a method of producing the same, and a photomask. An immobilization layer containing a binder capable of binding to a self-organizing material is formed on a substrate. Then this immobilization layer is patterned by transferring an uneven pattern formed in a mold thereto by the imprint process. The self-organizing material is supplied onto the face having the uneven pattern of the immobilization layer transferred thereto. Thus, the self-organizing material is immobilized following the uneven pattern of the immobilization layer owing to the self-organization ability of the material per se and the binding ability of the binder contained in the immobilization layer.
摘要翻译： 旨在提供一种图案化自组织材料的方法，由此具有自组织能力的自组织材料如核酸可以通过使用压印方法以所需的方式在基板上对准和固定， 自组织材料的图案化衬底及其制造方法，以及光掩模。 在基材上形成含有能够结合自组织材料的粘合剂的固定层。 然后通过压印工艺将形成在模具中的不均匀图案转印到该固定层上。 将自组织材料供给到转印有固定层的不均匀图案的面上。 因此，由于材料本身的自组织能力和固定化层中所含的粘合剂的结合能力，自组织材料被固定在固定层的不均匀图案之后。
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