公开(公告)号：US4786582A

公开(公告)日：1988-11-22

申请号：US917576

申请日：1986-10-10

申请人： Tulay Duyal

发明人： Tulay Duyal

IPC分类号： C08F8/28 ,  G03F7/021 ,  G03F7/033 ,  G03C5/18

CPC分类号： G03F7/033 ,  G03F7/0215

摘要： An organic solvent free developing composition which comprises an aqueous admixture having a pH of from about 6.8 to about 7.2 of(a) one or more components selected from the group consisting of tri-sodium, -lithium, or -potassium phosphate, or sodium, lithium or potassium carbonate; and(b) one or more components selected from the group consisting of sodium, lithium, or potassium benzoate or salicylate; and(c) one or more components selected from the group consisting of sodium, lithium, potassium, magnesium or calcium octyl, decyl or dodecyl sulfate; and(d) one or more components selected from the group consisting of mono-sodium, -lithium, or -potassium phosphates and carbonates, and(e) sufficient water to formulate an effective developer.

摘要翻译： 一种无机溶剂显影组合物，其包含（a）一种或多种选自三钠，锂或磷酸钾或钠的组分的pH为约6.8至约7.2的水混合物， 碳酸锂或碳酸钾; 和（b）选自由苯甲酸钠，锂或钾组成的组中的一种或多种组分或水杨酸盐; 和（c）选自钠，锂，钾，镁或钙的一种或多种组分辛基，癸基或十二烷基硫酸盐; 和（d）选自单钠，锂或磷酸钾和碳酸酯的一种或多种组分，和（e）足够的水以配制有效的显影剂。

公开(公告)号：US4539285A

公开(公告)日：1985-09-03

申请号：US589434

申请日：1984-03-14

申请人： Tulay Duyal ,  John E. Walls

发明人： Tulay Duyal ,  John E. Walls

IPC分类号： G03F7/016 ,  G03F7/004 ,  G03F7/021 ,  G03F7/038 ,  G03C1/60 ,  G03F7/08

CPC分类号： G03F7/0212

摘要： An improved resin coated substrate is prepared by coating a suitable substrate, such as aluminum with a composition comprising a salt having the structure A-N.sub.2.sup.+ X.sup.- wherein A is an aromatic or heterocyclic residue and X is an anion of an acid; and a binder composition comprising both an acrylic polymer and an acid containing acrylic copolymer.

摘要翻译： 通过用包含具有结构A-N2 + X-的盐的组合物涂覆合适的底物（例如铝）制备改进的树脂涂覆的基材，其中A是芳族或杂环残基，X是酸的阴离子; 以及包含丙烯酸类聚合物和含酸的丙烯酸共聚物两者的粘合剂组合物。

公开(公告)号：US4435496A

公开(公告)日：1984-03-06

申请号：US421685

申请日：1982-09-22

申请人： John E. Walls ,  Tulay Duyal

发明人： John E. Walls ,  Tulay Duyal

IPC分类号： G03C1/72 ,  C08F2/00 ,  C08F2/46 ,  C08F290/00 ,  C08F299/00 ,  C08G16/02 ,  C08G16/04 ,  C08G61/12 ,  C08G65/00 ,  C08G65/48 ,  G03F7/039 ,  G03C1/727

CPC分类号： C08G16/04 ,  C08G16/0225 ,  C08G61/128 ,  G03F7/039

摘要： Disclosed are novel photosensitive compositions containing a compound consisting essentially of repeating structural units of an alkyl aryl ether, which are end-capped with a substituent functional group containing an ethylenically unsaturated moiety, and a photosensitizing effective amount of a free radical generating compound. Through the selected exposure of films and coatings prepared from the above composition, it is possible to record information in such materials in a manner as to alter the physical and/or chemical properties of such films and coatings. This selective modification can then be simply manifested by contacting the exposed surface of the film or coating, subsequent to such exposure, with an alkaline developing solution. These compositions are useful in the graphic arts and in the manufacture of printed curcuit boards for the electronics industry.

摘要翻译： 本发明公开了一种新型光敏组合物，其含有基本上包含具有含有烯键式不饱和部分的取代官能团封端的烷基芳基醚的结构单元和光敏有效量的产生自由基的化合物的化合物。 通过从上述组合物制备的薄膜和涂料的选择曝光，可以以改变这种薄膜和涂层的物理和/或化学性质的方式在这些材料中记录信息。 然后可以简单地通过使这种曝光后的膜或涂层的暴露表面与碱性显影溶液接触来简单地表现出这种选择性改性。 这些组合物可用于图形艺术和用于电子工业的印刷电路板的制造。