公开(公告)号：US20190292406A1

公开(公告)日：2019-09-26

申请号：US16247730

申请日：2019-01-15

Applicant: SAMSUNG DISPLAY CO., LTD. ,  UB MATERIALS INC.

Inventor： Hyunjin CHO ,  Joonhwa BAE ,  Byoungkwon CHOO ,  Woojin CHO ,  Jinhyung PARK

IPC: C09G1/02 ,  H01L21/3105

Abstract: A polishing slurry includes an abrasive material, a first oxide polishing promoter, a first nitride polishing inhibitor, and a second nitride polishing inhibitor. The first oxide polishing promoter includes a polymer-based oxide polishing promoter. The first nitride polishing inhibitor includes an anionic nitride polishing inhibitor. The second nitride polishing inhibitor includes at least one selected from a cationic nitride polishing inhibitor and a non-ionic nitride polishing inhibitor.