Amorphous Silicon Oxide, Amorphous Silicon Oxynitride, and Amorphous Silicon Nitride Thin Films and Uses Thereof
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    发明申请
    Amorphous Silicon Oxide, Amorphous Silicon Oxynitride, and Amorphous Silicon Nitride Thin Films and Uses Thereof 审中-公开
    无定形氧化硅,无定形硅氧氮化物和无定形氮化硅薄膜及其用途

    公开(公告)号:US20160067387A1

    公开(公告)日:2016-03-10

    申请号:US14848107

    申请日:2015-09-08

    摘要: Amorphous SiOx (SiO2), SiONx, silicon nitride (Si3N4), surface treatments are provided, on both metal (titanium) and non-metal surfaces. Amorphous silicon-film surface treatments are shown to enhance osteoblast and osteoblast progenitor cell bioactivity, including biomineral formation and osteogenic gene panel expression, as well as enhanced surface hydroxyapatite (HA) formation. A mineralized tissue interface is provided using the amorphous silicon-based surface treatments in the presence of osteoblasts, and provides improved bone cell generation/repair and improved interface for secure attachment/bonding to bone. Methods for providing PEVCD-based silicon overlays onto surfaces are provided. Methods of increasing antioxidant enzyme (e.g., superoxide dismutase) expression at a treated surface for enhanced healing are also provided. Continuous generation and release of Si4+ ion into an in vitro or in vivo environment in the presence of osteoblasts/osteoblast progenitor cells, methods of employing same for enhancing the rate of bone healing/bone regeneration, is also described.

    摘要翻译: 在金属(钛)和非金属表面上都提供非晶态SiO x(SiO 2),SiON x,氮化硅(Si 3 N 4),表面处理。 显示非晶硅膜表面处理可增强成骨细胞和成骨细胞祖细胞的生物活性,包括生物矿物形成和成骨基因组表达,以及增强的表面羟基磷灰石(HA)形成。 在成骨细胞存在下使用无定形硅基表面处理提供矿化组织界面,并且提供改进的骨细胞产生/修复和改进的用于牢固附着/粘合到骨骼的界面。 提供了将基于PEVCD的硅覆盖层提供到表面上的方法。 还提供了在处理的表面增加抗氧化酶(例如超氧化物歧化酶)表达以增强愈合的方法。 还描述了在成骨细胞/成骨细胞祖细胞存在下将Si4 +离子连续生成和释放到体外或体内环境中,使用其提高骨愈合速度/骨再生速率的方法。