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    Hierarchical control system for molecular beam epitaxy
    2.
    发明授权
    Hierarchical control system for molecular beam epitaxy 失效
    分子束外延分层控制系统

    公开(公告)号：US5461559A

    公开(公告)日：1995-10-24

    申请号：US131536

    申请日：1993-10-04

    申请人： Jeffrey J. Heyob ,  Oliver D. Patterson ,  Steven R. LeClair ,  T. Walter Haas ,  Kenneth Currie ,  Doug Moore ,  Stephen J. Adams ,  Victor Hunt

    发明人： Jeffrey J. Heyob ,  Oliver D. Patterson ,  Steven R. LeClair ,  T. Walter Haas ,  Kenneth Currie ,  Doug Moore ,  Stephen J. Adams ,  Victor Hunt

    IPC分类号： G05B13/02 ,  G05B13/04

    CPC分类号： G05B13/029 ,  Y10S706/904

    摘要： A multi-featured control system which improves the manufacturing capability of the thin-film semiconductor growth process. This system improves repeatability and accuracy of the process, reduces the manpower requirements to operate MBE, and improves the MBE environment for scientific investigation. This system has three levels of feedback control. The first level improves the precision and tracking of the process variables, flux, and substrate temperature. The second level comprises an expert system that uses sensors to monitor the status of the product in order to tailor the process plan in real time so that the exact qualities desired are achieved. The third level features a continuously evolving neural network model of the process which is used to recommend the recipe and command inputs to achieve a desired goal. The third level is particularly useful during the development process for new materials. All three levels require models of the process which are updated during automatic process identification experiments.

    摘要翻译： 一种提高薄膜半导体生长工艺制造能力的多功能控制系统。 该系统提高了流程的重复性和准确性，降低了操作MBE的人力需求，提高了MBE环境的科学调查。 该系统具有三级反馈控制。 第一级提高了过程变量，通量和衬底温度的精度和跟踪。 第二级包括使用传感器监测产品状态以便实时定制过程计划的专家系统，从而实现所需的确切质量。 第三级具有不断发展的过程的神经网络模型，该模型用于推荐配方和命令输入以实现期望的目标。 第三级在新材料的开发过程中特别有用。 所有三个级别都需要在自动过程识别实验过程中更新过程的模型。