公开(公告)号：US20080069491A1

公开(公告)日：2008-03-20

申请号：US11932356

申请日：2007-10-31

申请人： Karl Kissa ,  Gregory McBrien ,  Glen Drake ,  William Minford

发明人： Karl Kissa ,  Gregory McBrien ,  Glen Drake ,  William Minford

IPC分类号： G02F1/035

CPC分类号： G02F1/0123 ,  G02F1/0316 ,  G02F1/0356 ,  G02F1/2255 ,  G02F2203/20

摘要： The invention relates to an electro-optic modulator structure containing an additional set of bias electrodes buried within the device for applying bias to set the operating point. Thus the RF electrodes used to modulate incoming optical signals can be operated with zero DC bias, reducing electrode corrosion by electro-migration, galvanic, and other effects that can be present in non-hermetic packages. The RF electrodes are supported by a first surface of the electro-optic substrate, while the bias electrodes are supported by a second opposite surface.

摘要翻译： 本发明涉及一种电光调制器结构，其包含埋在该装置内的附加一组偏置电极，用于施加偏压以设定工作点。 因此，用于调制输入光信号的RF电极可以用零直流偏压来操作，通过电迁移，电流以及可以存在于非密封封装中的其它效应来减少电极腐蚀。 RF电极由电光基板的第一表面支撑，而偏置电极由第二相对表面支撑。

公开(公告)号：US20080085089A1

公开(公告)日：2008-04-10

申请号：US11769070

申请日：2007-06-27

申请人： Benjamin Catching ,  Donald Friedrich ,  Charles Hulse ,  Marc Von Gunten ,  Jason Reed ,  Karl Kissa ,  Glen Drake ,  Julia Duncan ,  William Minford ,  Hiren Shah ,  Jerry Zieba ,  Jason Xu

发明人： Benjamin Catching ,  Donald Friedrich ,  Charles Hulse ,  Marc Von Gunten ,  Jason Reed ,  Karl Kissa ,  Glen Drake ,  Julia Duncan ,  William Minford ,  Hiren Shah ,  Jerry Zieba ,  Jason Xu

IPC分类号： G02B6/10 ,  B29D11/00

CPC分类号： G02F1/377 ,  G02B6/13 ,  G02B6/1342 ,  G02B2006/1204 ,  G02B2006/12097 ,  G02F2201/06 ,  G02F2201/07

摘要： The invention relates to a wafer scale process for the manufacture of optical waveguide devices, and particularly for the manufacture of ridge waveguide devices, and the improved waveguides made thereby. The present invention has found a process for achieving sub-micron control of an optical waveguiding layer thickness by providing a dimensionally stable wafer assembly into which adhesive can be introduced without altering the planar relationship between a carrier wafer and an optically transmissive wafer in wafer scale manufacture. This process permits wafer scale manufacture of optical waveguide devices including thin optically transmissive layers. A pattern of spacer pedestals is created by a deposition and etch back, or by a surface etch process to precisely reference surface information from a master surface to a carrier wafer to a thin optically transmissive wafer. The tolerance achievable in accordance with this process provides consistent yield across the wafer.

摘要翻译： 本发明涉及一种用于制造光波导器件的晶片刻度工艺，特别涉及脊波导器件的制造以及由此制成的改进的波导。 本发明已经发现了一种通过提供尺寸稳定的晶片组件来实现光学波导层厚度的亚微米控制的方法，其中可以引入粘合剂而不改变晶片规模制造中的载体晶片和光学透射晶片之间的平面关系 。 该方法允许晶圆级制造包括薄光学透射层的光波导器件。 通过沉积和回蚀，或通过表面蚀刻工艺来产生间隔基座的图案，以将表面信息从主表面精确地参考到载体晶片到薄的光学透射晶片。 根据该方法可实现的公差提供了跨晶片的一致产率。