公开(公告)号：US20080085089A1

公开(公告)日：2008-04-10

申请号：US11769070

申请日：2007-06-27

申请人： Benjamin Catching ,  Donald Friedrich ,  Charles Hulse ,  Marc Von Gunten ,  Jason Reed ,  Karl Kissa ,  Glen Drake ,  Julia Duncan ,  William Minford ,  Hiren Shah ,  Jerry Zieba ,  Jason Xu

发明人： Benjamin Catching ,  Donald Friedrich ,  Charles Hulse ,  Marc Von Gunten ,  Jason Reed ,  Karl Kissa ,  Glen Drake ,  Julia Duncan ,  William Minford ,  Hiren Shah ,  Jerry Zieba ,  Jason Xu

IPC分类号： G02B6/10 ,  B29D11/00

CPC分类号： G02F1/377 ,  G02B6/13 ,  G02B6/1342 ,  G02B2006/1204 ,  G02B2006/12097 ,  G02F2201/06 ,  G02F2201/07

摘要： The invention relates to a wafer scale process for the manufacture of optical waveguide devices, and particularly for the manufacture of ridge waveguide devices, and the improved waveguides made thereby. The present invention has found a process for achieving sub-micron control of an optical waveguiding layer thickness by providing a dimensionally stable wafer assembly into which adhesive can be introduced without altering the planar relationship between a carrier wafer and an optically transmissive wafer in wafer scale manufacture. This process permits wafer scale manufacture of optical waveguide devices including thin optically transmissive layers. A pattern of spacer pedestals is created by a deposition and etch back, or by a surface etch process to precisely reference surface information from a master surface to a carrier wafer to a thin optically transmissive wafer. The tolerance achievable in accordance with this process provides consistent yield across the wafer.

摘要翻译： 本发明涉及一种用于制造光波导器件的晶片刻度工艺，特别涉及脊波导器件的制造以及由此制成的改进的波导。 本发明已经发现了一种通过提供尺寸稳定的晶片组件来实现光学波导层厚度的亚微米控制的方法，其中可以引入粘合剂而不改变晶片规模制造中的载体晶片和光学透射晶片之间的平面关系 。 该方法允许晶圆级制造包括薄光学透射层的光波导器件。 通过沉积和回蚀，或通过表面蚀刻工艺来产生间隔基座的图案，以将表面信息从主表面精确地参考到载体晶片到薄的光学透射晶片。 根据该方法可实现的公差提供了跨晶片的一致产率。

公开(公告)号：US20050217969A1

公开(公告)日：2005-10-06

申请号：US11140839

申请日：2005-05-31

申请人： Paul Coombs ,  Donald Friedrich ,  Ken Cardell ,  Curtis Hruska ,  Charles Markantes

发明人： Paul Coombs ,  Donald Friedrich ,  Ken Cardell ,  Curtis Hruska ,  Charles Markantes

IPC分类号： G01J3/10 ,  G01J3/42 ,  G01N21/84 ,  G06K7/00 ,  G07F7/04 ,  G07F7/08

CPC分类号： G07D7/205 ,  G07D7/1205 ,  G07D7/121 ,  G07F7/086

摘要： An automated verification system for authenticating an object having an optical security feature includes an optical system, a transport staging apparatus, and an analyzing device. The optical system includes one or more light sources that are capable of generating either narrowband or broadband light beams. The transport staging apparatus cooperates with the light sources and is configured to position the object such that one or more of the light beams strike a portion of the object where the security feature should be located. The analyzing device receives the light beams reflected or transmitted from the object and is adapted to analyze the optical characteristics of the light beams at varying angles and/or wavelengths to verify the authenticity of the object.

摘要翻译： 用于认证具有光学安全特征的对象的自动验证系统包括光学系统，传输分段设备和分析设备。 光学系统包括能够产生窄带或宽带光束的一个或多个光源。 运输分段设备与光源配合，并且被配置成定位物体，使得一个或多个光束照射安全特征应位于物体的一部分。 分析装置接收从物体反射或透射的光束，并且适于以变化的角度和/或波长分析光束的光学特性以验证物体的真实性。